Heat development apparatus and method

ABSTRACT

A heat development apparatus for heat developing a heat-developable recording material from one surface side by a heating unit, while transporting the heat-developable recording material by a transportation unit, the apparatus comprising: an inversion processing mechanism for inverting the heat-developable recording material discharged from a heating region in which the heat developing is made by the heating unit, and returning it to the heating region; and a transportation route switching unit for selectively switching a route of the heat-developable recording material discharged from the heating region to a side of the inversion processing mechanism or a discharge-side transportation route.

FIELD OF THE INVENTION

The present invention relates to a heat development apparatus and methodfor performing a heat development processing on a recording layer of asheet-like heat-developable recording material. More particularly, itrelates to an improvement for implementing the heat development of aheat-developable recording material having recording layers on itsopposite sides of a base film at a low cost.

BACKGROUND OF THE INVENTION

As an image recording apparatus for recording a medical image, such as adigital radiographic system, CT, or MR, a wet system in which an imageis photographed or recorded on a silver salt photographiclight-sensitive material, and then wet processed to obtain a reproducedimage, has been conventionally used. In contrast, in recent years, arecording apparatus by a dry system using a photothermographic material(heat development recording apparatus) has attracted attention.

FIG. 7 shows a conventional example of this kind of a heat developmentrecording apparatus.

The heat development recording apparatus 100 includes: a recodingmaterial supply unit A accommodating sheet-like heat-developablerecording materials 21; an image exposure unit B for performing anexposure processing based on image data on the heat-developablerecording material 21 supplied from the recording material supply unitA; a heat development unit C for performing a heat developmentprocessing by a prescribed heating on the heat-developable recordingmaterial 21 which has gone through the exposure processing at the imageexposure unit B; a cooling unit D for cooling and discharging theheat-developable recording material 21 which has gone through the heatdevelopment processing; a power source/control unit E for supplying apower to the respective units and controlling the operations of therespective units; and a transportation unit for feeding theheat-developable recording material 21 at the recording material supplyunit A to the cooling unit D via the image exposure unit B and the heatdevelopment unit C sequentially (e.g., see, JP-A-2000-98576).

The heat-developable recording material 21 is prepared by providing arecording layer having light sensitivity and heat sensitivity on oneside of a base film. Specifically, a photothermographic material or alight-sensitive heat-sensitive recording material is used according tothe features of the recording layer.

The recording layer of the photothermographic material is a recordingmaterial which records an image thereon as a latent image by exposurewith a light beam (e.g., a laser beam), and is allowed to develop itscolor by heat development.

On the other hand, the recording layer of the light-sensitiveheat-sensitive recording material records an image as a latent imagethereon by exposure with a light beam, and then is heat developed and isallowed to develop its color, or records an image thereon by a heat mode(heat) of a laser beam, and simultaneously therewith, is allowed todevelop its color, followed by image fixing thereon through lightexposure.

In the recording material supply unit A of the examples shown, recordingmaterial accommodating cases (magazines) 15 a, 15 b, and 15 c aredisposed vertically at three stages. The respective recording paperaccommodating cases 15 a, 15 b, and 15 c are each capable ofaccommodating a large number (e.g., 150 sheets) of the sheet-likeheat-developable recording materials 21 in stacked form. Then, feedroller pairs 13 a, 13 b, and 13 c for feeding out and transporting theheat developable recording materials 21 in the cases, one by one, areprovided at the outlet side of the respective recording paperaccommodating cases 15 a, 15 b, and 15 c, respectively.

The heat-developable recording materials 21 fed out from the respectiverecording paper accommodating cases 15 a, 15 b, and 15 c by the feedroller pairs 13 a, 13 b, and 13 c, respectively are fed to the imageexposure unit B by a transportation unit provided on the top endthereof.

The image exposure unit B includes: a transportation unit 27 havingdriving rollers 31 and 33 and a guide plate 35, and transporting theheat-developable recording materials 21 supplied from the recordingmaterial supply unit A at a prescribed speed; and a beam emission means29 for performing scanning by a light beam (laser beam) 28 in adirection orthogonal to the transportation direction on theheat-developable recording materials 21 transported by thetransportation unit 27. The scanning direction by the beam emissionmeans 29 is set as a main scanning direction, and the transportationdirection of the transportation unit 27 is set as a sub-scanningdirection. Thus, the image exposure unit B performs main/sub-scanning bythe light beam 28 on the recording layer of the heat-developablerecording material 21 based on the recording image data supplied from animage information source such as CT or MR, thereby performing anexposure processing in accordance with an image to be recorded, andrecording a latent image on the recording layer of the heat-developablerecording material 21.

The heat development unit C is configured to include: a transportationunit 36 for transporting the heat-developable recording material 21subjected to the exposure processing at the image exposure unit Bthrough an arc-like path; and a heating unit 37 provided along thetransportation path by the transportation unit 36, for performing aprescribed heat processing on the recording layer of theheat-developable recording material 21 being transported by thetransportation unit 36.

The transportation unit 36 transports the heat-developable recordingmaterial 21 through the arc-like path by a plurality of presser rollers41 driven in rotation following a gear 43, and a supply roller pair 39disposed closer to the image exposure unit B.

The heating unit 37 is configured to include a plurality of plateheaters 37 a, 37 b, and 37 c arranged along the arc-like transportationpath of the transportation unit 36. The heat-developable recordingmaterial 21 is transported with the recording layer facing the side ofthe plate heaters 37 a, 37 b, and 37 c.

The foregoing heating unit 37 increases the temperature the recordinglayer of the heat-developable recording material 21 to a prescribed heatdevelopment temperature (e.g., 120° C.), thereby to develop/fix thelatent image recorded on the heat-developable recording material 21 as avisible image with a prescribed concentration.

The cooling unit D receives the heat-developable recording material 21which has gone through the development processing via a delivery roller45. Then, it cools the heat-developable recording material 21 by heatdissipation during transportation by means of an appropriate number ofcooling roller pairs 47 to an appropriate temperature such as ordinarytemperature.

The cooled heat-developable material 21 is discharged to a dischargetray 17 via an inducing path by a guide plate 49 and a transportationroller pair 51.

SUMMARY OF THE INVENTION

Incidentally, in recent years, there is a demand for immediately dryingand seeing the recorded image photographed using a heat-developablerecording material having recording layers on opposite sides of the basefilm in the medical site.

However, a conventional heat development recording apparatus is based onthe use of a heat-developable recording material having a recordinglayer on its one side. The heat development unit C adopted therein isequipped with a heating unit 37 only on the one side of theheat-developable recording material transported.

For this reason, when the heat-developable recording material havingrecording layers formed on its opposite sides is used, the recordinglayer on one side can be heated to a prescribed heat developmenttemperature, but the recording layer on the other side cannot besubjected to a heat development processing due to the insufficientheating.

Under such circumstances, a measure has been proposed that theconventional apparatus is additionally equipped with another heatingunit for heating the other side of the heat-developable recordingmaterial. However, such a measure unfavorably has incurred an increasein manufacturing cost due to an increase in size of the apparatus and anincrease in power source capacitance with the addition of the heatingunit.

The invention has been completed for the purpose of solving theforegoing problem. It is an object of the invention to provide a heatdevelopment apparatus and method capable of implementing the heatdevelopment of a heat-developable recording material having recordinglayers on the opposite sides of a base film at a low cost.

The aforesaid object is achieved by the following constitution:

-   (1) A heat development apparatus for heat developing a sheet-like    heat-developable recording material from one surface side by a    heating unit, while transporting the heat-developable recording    material by a transportation unit, the apparatus which comprises:    -   an inversion processing mechanism for inverting the        heat-developable recording material discharged from a heating        region by the heating unit and returning it to the heating        region; and    -   a transportation route switching unit for selectively switching        the route of the heat-developable recording material discharged        from the heating region by the heating unit to the inversion        processing mechanism side or the discharge-side transportation        route.-   (2) The heat development apparatus as in (1), wherein the inversion    processing mechanism includes a heat insulation unit for preventing    the temperature lowering of the heat-developable recording material.-   (3) The heat development apparatus as in (1) or (2), wherein a    recording paper accommodating case in which the heat-developable    recording paper before a heat development processing is accommodated    is utilized as a temporary storage part for allowing, the    heat-developable recording material to be inverted, to wait    temporarily.-   (4) The heat development apparatus as in any of (1) to (3), wherein    the transportation unit has been configured to be speed-adjustable.-   (5) A heat development method for heat developing a sheet-like    heat-developable recording material having recording layers on its    opposite sides, using the heat development apparatus described in    any of (1) to (4), the method which comprises:    -   inverting the heat-developable recording material which has gone        through a heat development processing on its one side by the        heating unit with the inversion processing mechanism, and        returning it to the heating region by the heating unit, also        subjecting the heat-developable recording material to a heat        development processing on its other side by means of the        operations of the transportation unit and the heating unit, and        then discharging it, thereby heat developing the recording        layers on the opposite sides of the heat-developable recording        material.-   (6) The heat development method as in (5), wherein the time required    in the inversion processing mechanism has been set such that the    inversion processing by the inversion processing mechanism and the    heat development processing on another heat-developable recording    material by the transportation unit and the heating unit are carried    out concurrently.-   (7) The heat development method as in (5) or (6), wherein for the    heat development processing of the other side of the    heat-developable recording material which has gone through the heat    development processing on its one side, the heat development is    carried out by increasing the transportation speed by the    transportation unit higher than with the heat development of the one    side, or reducing the heating amount by the heating unit smaller    than with the heat development of the one side.

By carrying out the heat development method described in (5) with theheat development apparatus according to the item (1), it is possible tocarry out a proper heat processing not resulting in insufficient heatingor the like of the recording layers on the opposite sides of theheat-developable recording material.

Further, the apparatus is only required to undergo a small scalemodification in which only an inversion processing mechanism and atransportation route switching unit are added to a conventional heatdevelopment apparatus intended for the development processing of aheat-developable recording material having a recording layer on only itsone side. Thus, the addition of a heating unit with a large powerconsumption is not required. As a result, it is possible to eliminate anincrease in manufacturing cost or the like due to the increase in sizeand the increase in power source capacitance.

Namely, from the viewpoint of the apparatus configuration, it ispossible to implement the heat development of a heat-developablerecording material having recording layers on its opposite sides at alow cost only by slightly improving a conventional apparatus.

With the heat development apparatus described in (2), theheat-developable recording material to be inverted by the inversionprocessing mechanism is prevented from being lowered in temperature bythe heat insulation unit mounted in the inversion processing mechanism.Thus, the temperature of the heat-developable recording material itselfis maintained with stability until the start of the heat developmentprocessing of the other side.

Therefore, when the heat-developable recording material which has gonethrough the heat development processing on its one side (e.g., frontsurface) is inverted by the inversion processing mechanism, andsubjected to a heat development processing on the remaining other side(e.g., rear surface), the heating unit in the heating region can carryout heating with the heating amount reduced than with the heatdevelopment processing on the front side. This enables the reduction ofpower consumption.

Further, it is possible to eliminate variations in temperature of theheat-developable recording material when the heat development of therear surface is started. For this reason, it is possible to inhibit theoccurrence of uneven heating causing uneven concentration and the like.This can implement high-concentration high-quality image recording.

Whereas, with the heat development apparatus as in (1) or (2), thelength of time required for performing an inversion processing of theheat-developable recording material in the inversion processingmechanism is properly controlled inclusive of the wait time in theinversion processing mechanism. As a result, it is possible to implementthe heat development method described in (6) such that during the periodin which the heat-developable recording material is being subjected toan inversion processing in the inversion processing mechanism,simultaneously, another heat-developable recording material is subjectedto a heat development processing. This eliminates the occurrence of auseless interruption of the heat development processing during theoperation of the inversion processing mechanism. This enables animprovement of the heat development processing efficiency on theheat-developable recording material having recording layers on itsopposite sides of the base film.

With the heat development apparatus described in (3), thealready-existing cassette is usefully utilized as the temporal storagepart for temporarily allowing the heat-developable recording material towait for the inversion processing. This eliminates the necessity ofadditionally mounting a specific tray, or the like. Thus, it is possibleto inhibit the addition of other components, resulting in asimplification of the configuration of the apparatus, and a reduction ofthe manufacturing cost.

With the heat development apparatus described in (4), as shown in (7),it becomes possible to implement a heat development method such thatwhen the heat-developable recording material which has gone through theheat development processing on one side is subjected to the heatdevelopment processing on the other side, the transportation speed bythe transportation unit is increased higher than with the heatdevelopment of the one side.

This results in an increase in speed of the processing, andsimultaneously prevents the excessive heating due to the effect of theremaining heat from the time of the heat development processing of theone side. As a result, it becomes possible to ensure high quality heatdevelopment on the heat-developable recording material having recordinglayers on its opposite sides of a base film.

BRIEF DESCRIPTION OF THE DRAWINGS

[FIG. 1] is a longitudinal cross sectional view of a first embodiment ofa heat development apparatus in accordance with the invention;

[FIGS. 2A to 2H] are explanatory diagrams of the processing procedure bya heat development method to be carried out by means of the heatdevelopment apparatus of FIG. 1;

[FIG. 3] is a longitudinal cross sectional view of a second embodimentof the heat development apparatus in accordance with the invention;

[FIG. 4] is a longitudinal cross sectional view of a third embodiment ofthe heat development apparatus in accordance with the invention;

[FIG. 5] is a longitudinal cross sectional view of a fourth embodimentof the heat development apparatus in accordance with the invention;

[FIGS. 6A to 6C] are longitudinal cross sectional views of the heatdevelopment apparatus in accordance with the invention, wherein FIG. 6Ashows a structure including a plurality of plate heaters arranged alongan arc-like transportation path; FIG. 6B, a structure of a heating drumsystem; and FIG. 6C, a belt type transportation structure including apair of endless belts interposing a photothermographic materialtherebetween;

[FIG. 7] is a graph showing emission spectra of the intensifying screen;and

[FIG. 8] is a cross sectional view showing a schematic structure of aconventional heat development recording apparatus.

[Description of Reference Numerals and Signs]  71 Heat-developablerecording material  73 Cassette (Recording paper accommodating case)  77Transportation unit  77a Lead-in guide part  77b Cylindrical rollerguide  77c Presser roller  79 Heating unit  81 Cooling unit  83Apparatus housing  85 Discharge tray 110 Inversion processing mechanism111 Material recovery line 113 Material return line 114 Send roller pair115 Send roller pair 116 Send roller pair 118 Temporary storage part 119Transportation route switching unit 120 Transportation route switchingunit 130 Discharge-side transportation route 200, 211, 221, and 231 Heatdevelopment apparatus

DETAILED DESCRIPTION OF THE INVENTION

Below, preferred embodiments of a heat development apparatus inaccordance with the invention will be described in details by referenceto the accompanying drawings.

FIGS. 1 and 2A to 2H show a first embodiment of the heat developmentapparatus in accordance with the invention. FIG. 1 is a longitudinalcross sectional view of the whole apparatus. FIGS. 2A to 2H isexplanatory diagrams of a procedure of a heat development method to becarried out by the heat development apparatus of FIG. 1.

A heat development apparatus 200 of the first embodiment is usable as aheat development unit of a heat development recording apparatus for usein medical image recording as a dry system, and includes: a recordingpaper accommodating case (cassette) 73 for accommodating sheet-likeheat-developable recording materials 71 on each of which a latent imagehas already been formed by an exposure processing; a feed mechanism 75for feeding the heat-developable recording materials 71 accommodated inthe cassette 73 one by one out of the cassette 73; a transportation unit77 for transporting the heat-developable recording materials 71 fed outof the cassette 73 by the feed mechanism 75 along a prescribed path; aheating unit 79 mounted along the transportation path, for performing aprescribed heating processing on the heat-developable recording material71 from its one side; a power/control unit 80 for controlling theoperations of each driving units and the heating unit; and an inversionprocessing mechanism 110 and a transportation route switching unit 120on the side of the end of the heating region by the heating unit 79.With this configuration, the heat development apparatus 200 performs aheat development processing on the recording layers on the oppositesides of the heat-developable recording material 71.

The transportation route switching unit 120 selectively switches theroute of the heat-developable recording material 71 transported by thetransportation unit 77 and discharged from the end of the heating regionto either side of the inversion processing mechanism 110 or thedischarge-side transportation route 130. It is configured such that aguide piece 120 a described later is switched by a solenoid.

The discharge-side transportation route 130 is equipped at the somemidpoint with a cooling unit 81 for cooling the heat-developablerecording material 71 which has gone through the heat development downto a low temperature range allowing the discharge. Whereas, an apparatuscase 83 is equipped on the top with a discharge tray 85 for mountingthereon the heat-developable recording material 71 which has gonethrough cooling.

The cooling unit 81 includes: a slow cooling unit 82 for slowing coolingthe heat-developable recording material 71 to an appropriate temperatureby heat dissipation during transportation by means of an appropriatenumber of cooling roller pairs 47; and a main cooling unit 84 forexposing the inducing path by the guide plate 49 to a cooling air, andcooling it down to the dischargeable temperature. Thus, the cooling unit81 is configured such that the cooled heat-developable recordingmaterial 71 is transported by the transportation roller pair 51 to bedischarged to the discharge tray 85.

The cassette 73 is configured such that the top at the front endaccommodated in the apparatus is reclosable by a reclosable door 73 a.

The feed mechanism 75 is composed of a take-out head 75 a for adsorbingthereon the sheet-like heat-developable recording material 71 before theheat development processing accommodated in the cassette 73 and takingit outside, and a send roller pair 75 b for sending the heat-developablerecording material 71 taken out by the take-out head 75 a to a lead-inguide part 77 a at the beginning end of the transportation unit 77.

The transportation unit 77 includes the lead-in guide part 77 a forguiding the tip of the heat-developable recording material 71 fed by thefeed mechanism 75 to a prescribed position, a cylindrical roller guide77 b of which the outer circumference of the circular arc plane servesas the transportation plane of the heat-developable recording material71, and presser rollers 77 c arranged in plural numbers along the outerperiphery of the cylindrical roller guide 77 b, for pressing theheat-developable recording material 71, and simultaneously performingheat development by a heating unit 79 included therein.

A plurality of the presser rollers 77 c are arranged at a given pitch onthe outer periphery of the cylindrical roller guide 77 b.

Each presser roller 77 c is driven in rotation by a driving mechanismnot shown, and transports the heat-developable recording material 71.

Whereas, in the case of this embodiment, the transportation unit 77 isconfigured to be speed-adjustable, and such that the heating amount bythe heating unit 79 is also controllable.

Each heating unit 79 is a halogen lamp, and mounted in such a form as tobe included in each presser roller 77 c.

Therefore, the heating region by the heating unit 79 is equal to thedistribution region H of a plurality of the presser rollers 77 c on theouter periphery of the cylindrical roller guide 77 b. The beginning endof the heating region corresponds to the mounting position Hs of theforefront presser roller 77 c, and the terminal end of the heatingregion corresponds to the mounting position H_(L) of the rearmostpresser roller 77 c.

The transportation route switching unit 120 switches the orientation ofthe guide piece 120 a rotatable as indicated by an arrow (i) in thefigure, and thereby selectively switches the route of theheat-developable recording material 71 discharged to the terminal end ofthe heating region by the transportation unit 77 to either side of theinversion processing mechanism 110 or the discharge side transportationroute 130.

The inversion processing mechanism 110 inverts the heat-developablerecording material 71 transported by the transportation unit 77, andreturns it to the beginning end Hs of the heating region.

The inversion processing mechanism 110 includes a material recovery line111 branched at the mounting position of the transportation routeswitching unit 120, a material return line 113 branched from partwayalong the material recovery line 111, for guiding the heat-developablerecording material 71 to the lead-in guide part 77 a at the beginningend of the transportation unit 77, and send roller pairs 114, 115, and116 for allowing the heat-developable recording material 71 induced byeach line to travel.

The terminal end side of the material recovery line 111 serves as atemporary storage part 118 for allowing the recovered heat-developablerecording material 71 to wait temporarily.

The send roller pair 114 provided on the beginning end side of thematerial recovery line 111 is driven in rotation so as to send theheat-developable recording material 71 to the side of the temporarystorage part 118.

The send roller pair 115 mounted at the temporary storage part 118 is apair of send rollers also counter-rotatable, and performs an operationof drawing the heat-developable recording material 71 sent toward thetemporary storage part 118 to a prescribed position and an operation ofsending out the heat-developable recording material 71 which has beenallowed to wait temporarily at the temporary storage part 118 to thematerial return line 113.

The send roller pair 116 mounted at the material return line 113 sendsthe heat-developable recording material 71 sent out from the temporarystorage part 118 to the lead-in guide part 77 a.

At the branch portion between the material recovery line 111 and thematerial return line 113, there is mounted a transportation routeswitching unit 119 for preventing the heat-developable recordingmaterial 71 sent out from the temporary storage part 118 to the materialreturn line 113 from being sent backward to the side of the materialrecovery line 111.

The transportation route switching unit 119 switches the orientation ofa guide piece 119 a rotatable as indicated by an arrow (ii) in thefigure, and thereby prevents the heat-developable recording material 71from entering toward the material recovery line 111.

With the foregoing heat development apparatus 200, the sheet-likeheat-developable recording material 71 having recording layers on itsopposite sides is subjected to a heat development processing in thefollowing manner.

First, the heat-developable recording material 71 which has gone throughthe heat development processing on its one side by the heating unit 79is inverted by the inversion processing mechanism 110, and returned tothe beginning end of the heating region by the heating unit 79. Then,the heat-developable recording material 71 is also subjected to a heatdevelopment processing on its other side again by means of theoperations of the transportation unit 77 and the heating unit 79. Thus,the recording layers on the opposite sides of the heat-developablerecording material 71 are heat developed.

Then, when the heat-developable recording material 71 which has gonethrough the heat development processing on one side is subjected to aheat development processing on its other side, the transportation speedby the transportation unit 77 is increased higher than with the heatdevelopment of the one side, or the heating amount by the heating unit79 is reduced smaller than with the heat development of the one side.This prevents the excessive heating due to the effect of the remainingheat from the time of the heat development of the one side.

Incidentally, the wait time in the inversion processing mechanism 110 iscontrolled so that the inversion processing by the inversion processingmechanism 110 and the heat development processing on anotherheat-developable recording material 71 by the transportation unit 77 andthe heating unit 79 are carried out concurrently.

The foregoing heat development method is specifically carried out in theprocedure shown in FIGS. 2A to 2H.

First, as shown in FIG. 2A, a heat development processing is carried outon the recording layer on the front surface of a first heat-developablerecording material 71A fed out from a first cassette not shown. Then,when the heat development processing on the recording layer on the frontsurface of the first heat-developable recording material 71A has beennearly completed, the feeding out of a second heat-developable recordingmaterial 71B from a second cassette 73B having the secondheat-developable recording material 71B is started in preparation forthe heat development of the recording layer on the front surface of thesecond heat-developable recording material 71B.

Then, as shown in FIG. 2B, the first heat-developable recording material71A which has gone through the heat development processing on therecording layer on its front surface is sent out to the temporal storagepart 118 of the inversion processing mechanism 110. Then, concurrentlywith the processing of sending out the first heat-developable recordingmaterial 71A to the temporal storage part 118, a heat developmentprocessing is carried out on the recording layer on the front surface ofthe second heat-developable recording material 71B.

Then, upon completion of the heat development processing on the frontsurface of the second heat-developable recording material 71B, as shownin FIG. 2C, the first heat-developable recording material 71A which hasbeen allowed to wait in the temporal storage part 118 is returned to thebeginning end of the heating region by the heating unit 79 for the heatdevelopment processing of the rear surface side. Simultaneouslytherewith, the second heat-developable recording material 71B which hasgone through the heat development processing on the recording layer onits front surface is sent to the temporal storage part 118.

Then, as shown in FIG. 2D, during the heat development of the rearsurface of the first heat-developable recording material 71A in theheating region, the second heat-developable recording material 71B whichhas gone through the heat development processing on its front surface istemporarily allowed to wait in the temporal storage part 118. On theother hand, the feeding out of a third heat-developable recordingmaterial 71C from a third cassette 73C having the third heat-developablerecording material 71C is started in preparation for the subsequent heatdevelopment processing.

Then, upon completion of the heat development on the rear surface of thefirst heat-developable recording material 71A, as shown in FIG. 2E, thethird heat-developable recording material 71C is moved to the heatingregion. Concurrently therewith, the first heat-developable recordingmaterial 71A is discharged from the terminal end of the heating regionto the discharge-side transportation route 130. Then, while starting theheat development on the front surface of the third heat-developablerecording material 71C, the second heat-developable recording material71B which has been allowed to wait in the temporal storage part 118 isreturned to the beginning end of the transportation unit 77.

Then, upon completion of the heat development on the front surface ofthe third heat-developable recording material 71C, as shown in FIG. 2F,the third heat-developable recording material 71C is moved to thetemporal storage part 118. On the other hand, the secondheat-developable recording material 71B is moved to the heating region,and the heat development processing of the rear surface of the secondheat-developable recording material 71B is started. Then, further, thefeeding out of a fourth heat-developable recording material 71D from afourth cassette 73D having the fourth heat-developable recordingmaterial 71D is started, thereby to prepare for the subsequentprocessing of another heat-developable recording material.

Then, upon completion of the heat development on the rear surface of thesecond heat-developable recording material 71B, as shown in FIG. 2G, thesecond heat-developable recording material 71B is discharged from theterminal end of the heating region to the discharge-side transportationroute 130. Concurrently therewith, the newly fed fourth heat-developablerecording material 71D is moved to the heating region, andsimultaneously therewith, the third heat-developable recording material71C which has been allowed to wait in the temporal storage part 118 isreturned to the beginning end of the transportation unit 77.

Further, upon completion of the heat development on the front surface ofthe fourth heat-developable recording material 71D, as shown in FIG. 2H,the fourth heat-developable recording material 71D is moved to thetemporal storage part 118. In addition, the third heat-developablerecording material 71C returned to the beginning end of thetransportation unit 77 is moved to the heating region, and the heatdevelopment processing of the rear surface of the third heat-developablerecording material 71C is started. Simultaneously therewith, asubsequent new heat-developable recording material 71E is fed out of afifth cassette 73E.

As described above, the operation timing is controlled so that 3 sheetsof heat-developable recording materials are constantly handled. Thus,heat development is carried out on the opposite sides of eachheat-developable recording material.

Incidentally, each heat-developable recording material is subjected to aheat development processing on its front surface. Then, it is inversionprocessed, and subjected to a heat development processing on its rearsurface. However, when the rear surface is heat developed, thetransportation speed by the transportation unit 77 is increased higherthan with the heat development of the front surface, or the heatingamount by the heating unit 79 is reduced smaller than with the heatdevelopment of the front surface. This prevents the excessive heatingdue to the effect of the remaining heat from the time of the heatdevelopment processing of the front surface.

With the heat development apparatus 200 of the first embodimentdescribed up to this point, the heat-developable recording material 71is subjected to a heat development processing on its front surface.Then, it is inversed, and subjected to a heat development processing onits rear surface. As a result, it is possible to implement the properdevelopment not causing insufficient heating on the opposite sides ofthe heat-developable recording material 71.

Further, the apparatus is only required to undergo a small scalemodification in which only an inversion processing mechanism 110 and atransportation route switching unit 120 are added to a conventional heatdevelopment apparatus intended for the development processing of aheat-developable recording material having a recording layer on only itsone side. Thus, the addition of a heating unit with a large powerconsumption is not required. As a result, it is possible to eliminate anincrease in manufacturing cost due to the increase in size of theapparatus and the increase in power source capacitance.

Namely, the apparatus is only required to undergo a slight improvementof a conventional apparatus, and it is capable of implementing the heatdevelopment of a heat-developable recording material having recordinglayers formed on its opposite sides of the base film at a low cost only.

Of course, the heat development apparatus of this embodiment is alsocapable of carrying out the development of a heat-developable recordingmaterial having a recording layer on only one side as in the prior artin the following manner. Namely, the heat development processing is setas follows: after the heat development processing of the recording layeron one side, the heat-developable recording material is not allowed topass through the inversion processing mechanism 110, but directlydischarged to the cooling unit 81.

Whereas, with the heat development apparatus 200 described up to thispoint, the length of time required for performing an inversionprocessing of the heat-developable recording material 71 in theinversion processing mechanism 110 is properly controlled inclusive ofthe wait time in the inversion processing mechanism 110. As a result, itis possible to implement an efficient heat development method such thatduring the period in which the heat-developable recording material 71 isbeing subjected to an inversion processing in the inversion processingmechanism 110, simultaneously, another heat-developable recordingmaterial 71 runs through the transportation unit 77 side to be subjectedto a heat development processing. This eliminates the occurrence of auseless interruption of the heat development processing during theoperation of the inversion processing mechanism 110. This enables animprovement of the processing efficiency of the heat developmentprocessing on the heat-developable recording material 71 havingrecording layers on its opposite sides.

Whereas, with the heat development apparatus 200, the transportationunit 77 is configured to be speed-adjustable. Therefore, it is possibleto implement a heat development method such that when theheat-developable recording material 71 which has gone through the heatdevelopment processing on its front surface is subjected to the heatdevelopment processing on its rear surface, the transportation speed bythe transportation unit 77 is increased higher than with the heatdevelopment of its front surface.

This results in an increase in speed of the processing, andsimultaneously prevents the excessive heating due to the effect of theremaining heat from the time of the heat development of the one side. Asa result, it becomes possible to ensure high quality heat development onthe heat-developable recording material 71 having recording layers onits opposite sides.

FIG. 3 shows a longitudinal cross sectional view of a second embodimentof the heat development apparatus in accordance with the invention.

A heat development apparatus 211 of the second embodiment is formed byadding a heat insulation unit 150 for preventing the temperaturelowering of the heat-developable recording material 71 to the inversionprocessing mechanism 110 shown in the first embodiment.

The heat development apparatus 211 is similar in configuration to theapparatus of the first embodiment, except that the heat insulation unit150 has been added therein. Therefore, the same components are given thesame numerals, and the description thereon will be omitted.

In the case of this embodiment, the heat insulation unit 150 isconfigured such that heat insulating members are mounted at the temporalstorage part 118 of the inversion processing mechanism 110. Thus, whenthe heat-developable recording material 71 increased in temperature bythe heat development of its front surface has been sent to the temporalstorage part 118, the heat insulation unit 150 performs heating/heatinsulation so as to prevent the temperature lowering of theheat-developable recording material 71.

Incidentally, in this embodiment, the heat insulation unit 150 isconfigured such that the heat insulating members are disposed. However,it can also be configured such that heating members such plate heatersare disposed in place of the heat insulating members. Incidentally, suchheating members are not for increasing the temperature of theheat-developable recording material 71 which has been sent to thetemporal storage part 118, but strictly for preventing the temperaturelowering with the aim of heat insulation.

With the heat development apparatus 211 thus configured, theheat-developable recording material 71 waiting by the inversionprocessing mechanism 110 is prevented from being lowered in temperaturethrough heating by the heat insulation unit 150 mounted at the inversionprocessing mechanism 110. As a result, it is possible to keep thetemperature of the heat-developable recording material 71 itself withstability until the start of the heat development processing of theother side again.

Therefore, when the heat-developable recording material 71 which hasgone through the heat development processing on its one side (e.g.,front surface) is inverted by the inversion processing mechanism 110,and subjected to a heat development processing on the remaining otherside (e.g., rear surface), the heating amount by the heating unit 79 canbe more reduced than with the heat development processing on the frontsurface, and simultaneously, the application of a rapid heatingtemperature is avoided, which can prevent wrinkles or the like fromoccurring in the sheet-like heat-developable recording material 71.

Further, it is possible to eliminate variations in temperature of theheat-developable recording material 71 when the heat development of therear surface is started. For this reason, it is possible to inhibit theoccurrence of uneven heating causing deficiencies such as unevenconcentration. This can implement high-concentration high-quality imagerecording.

FIG. 4 shows a longitudinal cross sectional view of a third embodimentof the heat development apparatus in accordance with the invention.

A heat development apparatus 221 of the third embodiment is formed byextending the material recovery line 111 of the inversion processingmechanism 110 shown in the first embodiment to the opening at the frontend of the cassette 73. Thus, the cassette 73 is made available as thetemporal storage part 118 of the inversion processing mechanism 110.

With this configuration, the already-existing cassette 73 is usefullyutilized as the temporal storage part of the heat-developable recordingmaterial 71 for the inversion processing. This eliminates the necessityof additionally mounting a specific tray, or the like as a temporalstorage part. Further, the heat-developable recording material 71 whichhas been allowed to temporarily wait in the cassette 73 can be fedtoward the transportation unit 77 by the feed mechanism 75. Therefore,the material return line 113 and the transportation route switching unit119 become unnecessary. Accordingly, it is possible to inhibit theaddition of other components, resulting in a simplification of theconfiguration of the apparatus, and a reduction of the manufacturingcost.

Incidentally, in the case of the configuration that the cassette 73 isutilized as the temporal storage part for the inversion processing as inthis embodiment, a lock mechanism for restricting the insertion andextraction of the cassette 73 to and from a housing 83 is preferablymounted at the cassette 73 and the housing 83 in order to prevent theexchange of the cassette 73 or the like from being carried out duringthe heat development processing.

FIG. 5 shows a longitudinal cross sectional view of a fourth embodimentof the heat development apparatus in accordance with the invention.

A heat development apparatus 231 of the fourth embodiment is configuredsuch that each transportation unit 77 including the heating unit 79therein is counter-rotatable. Further, it is configured such that theinversion processing mechanism 110 is not a switchback systemtransportation line as in the first to third embodiments. However, it isconfigured such that the heat-developable recording material 71 fed tothe terminal end of the transportation unit 77 is inverted by a U-shapedtransportation line 160 to be returned to the terminal end of thetransportation unit 77 again.

The heat-developable recording material 71 returned to the terminal endof the transportation unit 77 by the inversion processing mechanism 110is returned to the beginning end side of the transportation unit 77 bycounterrotation of the transportation unit 77. Thus, the heatdevelopment processing is repeated, thereby to perform heat developmenton the opposite sides of the heat-developable recording material 71.

The heat-developable recording material 71 which has gone through theheat development on its opposite sides is discharged to the dischargetray 85 equipped at the bottom side of the cassette 73 on the beginningside of the transportation unit 77.

The heat development on the opposite sides of the heat-developablerecording material 71 is also possible even by such an inversionprocessing embodiment. However, the processing efficiency thereof isdifficult to raise because of the necessity of the counterrotation ofthe heat-developable recording material 71 by the transportation unit77.

Incidentally, in the foregoing respective embodiments, a halogen lampwas adopted as each heating unit 79, and included in each presser roller77 c. However, the heating unit 79 in the heating region are not limitedto the foregoing embodiments. For example, a plurality of plate heaters38 a, 38 b, 38 c, and the like arranged along an arc-like transportationpath as shown in FIG. 6A are also available.

Alternatively, when a heating drum system shown in FIG. 6B is employed,the heating unit 79 is not required to be included in the respectivepresser rollers 77 c dispersed and arranged in plural numbers, and it isonly required to be included in the central part of the rotating drum.This enables the simplification of the configuration.

Further, the transportation unit 77 for transporting theheat-developable recording material 71 may also have a belt typetransportation configuration such that a pair of endless belts 78 a and78 b interposing the heat-developable recording material 71 therebetweenrun as shown in FIG. 6C. With such a belt type transportationconfiguration, it is possible to inhibit the occurrence of rubbing atthe surface of the heat-developable recording material 71, resulting ina reduction of stains due to rubbing on the recording surface of theheat-developable recording material 71.

In the foregoing respective embodiments, a description was given to theheat development processing using a double-sided light-sensitive film.The invention is, however, not limited to the case of such adouble-sided light-sensitive photographing method. The invention is alsoapplicable to the heat development processing for obtaininghigh-concentration and concentration inconsistency-free sharp imagerecording using a heat-developable recording material having recordinglayers formed on its opposite sides.

Below, a detailed description will be given to a photothermographicmaterial for use in the heat development recording apparatus inaccordance with the invention.

The light-sensitive material for photographing for use in thisembodiment is not the one for writing image information thereon throughscanning and exposure with a laser light, or the like, but the one forrecording images through surface exposure thereon.

It has been commonly used in the field of a wet developmentlight-sensitive material conventionally. There are known direct orindirect X-ray film, a mammograph film, or the like in the medical use,various plate-making films for printing, industrial recording films,films for photographing by common cameras, or the like. For example,patent documents disclose a double-side coating type X-rayphotothermographic material utilizing a blue fluorescent intensifyingscreen (see, e.g., Japanese Patent No. 3229344), a photothermographicmaterial using silver iodobromide tabular grains (see, e.g.,JP-A-59-142539), or a medical light-sensitive material prepared bycoating the opposite sides of a support with tabular grains having a(100) main plane and a high silver chloride content (see, e.g.,JP-A-10-282606). Further, the double-side coating photothermographicmaterials are also disclosed in other patent documents (see, e.g.,JP-A-2000-227642, JP-A-2001-22027, and JP-A-2001-109101, andJP-A-2002-90941) However, in these known examples, when fine-grainsilver halide with a grain diameter of 0.1 μm or less is used, thedeterioration of the haze is not entailed, but the sensitivity is low.Thus, the material is not capable of standing practical use forphotographying. On the other hand, when silver halide grains with agrain size of 0.3 μm or more are used, the deterioration of the imagequality due to the deterioration of the haze by the remaining silverhalide and the deterioration of the print-out is severe. Thus, thematerial is not capable of standing practical use.

The light-sensitive materials using silver iodide tabular grains areknown in the field of the wet development as silver halide grains (see,e.g., JP-A-59-119344 and JP-A-119350). However, there is no example ofits application to the photothermographic material. The reason for thisis as follows. Namely, the material is low in sensitivity, there is noeffective sensitizing means, and the technical barrier is furtherheightened in heat development.

In order to be used for such a light-sensitive material forphotographing, the material is required to have a still highersensitivity as a photothermographic material. Further, the image qualitysuch as the haze of the resulting image is also required to be at astill more higher level.

As the photothermographic material satisfying the foregoingrequirements, the following ones are useful.

1. Photothermographic Material

A photothermographic material of this embodiment has an image forminglayer containing a light-sensitive silver halide, a non-light-sensitiveorganic silver salt, a reducing agent, and a binder on at least one sideof a support. Further, it may also preferably have a surface protectivelayer on the image forming layer, or a back layer, a back protectivelayer, or the like on the opposite surface.

The configurations of these respective layers, and the preferredcomponents thereof will be described in detail.

(Compound for Substantially Reducing Visible Light Absorption Derivedfrom a Light-Sensitive Silver Halide after Heat Development)

In this embodiment, the photothermographic material preferably containsa compound for substantially reducing visible light absorption derivedfrom a light-sensitive silver halide after heat development relative tobefore heat development.

In this embodiment, a silver iodide complex forming agent is inparticular preferably used as the compound for substantially reducingvisible light absorption derived from a light-sensitive silver halideafter heat development

(Explanation of the Silver Iodide Complex Forming Agent)

A silver iodide complex forming agent in this embodiment is capable ofcontributing to the Lewis acid-base reaction in which at least one of anitrogen atom or a sulfur atom in the compound donates electrons tosilver ions as a coordinating atom (electron donor: Lewis base). Thestability of the complex is defined by the stepwise stability constantor the overall stability constant. However, it depends upon thecombination of three, i.e., silver ions, iodine ions, and the silvercomplex forming agent. As a general guideline, it is possible to obtaina large stability constant by the chelate effect resulting from thechelate ring formation in the molecule, or a means such as an increasein acid-base dissociation constant of the ligand.

The mechanism of action of the silver iodide complex forming agent inthis embodiment has not been clearly elucidated. However, presumably, byforming a stable complex with at least ternary components including aniodine ion and a silver ion, the silver iodide is made soluble. Thesilver iodide complex forming agent in this embodiment is poor incapability of making silver bromide or silver chloride soluble. However,it specifically acts on silver iodide.

The details of the mechanism whereby the image storability is improvedby the silver iodide complex forming agent in this embodiment is notapparent. However, the mechanism is based on the following fact. Atleast a part of the light-sensitive silver halide and the silver iodidecomplex forming agent in this embodiment react with each other duringheat development, thereby to form a complex, resulting in a reduction ordisappearance of the light sensitivity. Particularly, the imagestorability under light irradiation is conceivably largely improved.Whereas, simultaneously, it is also a large feature that the reductionof the turbidity of the film due to a silver halide results in a clearhigh-quality image. The turbidity of the film can be confirmed by thereduction of the ultraviolet visible absorption of the spectralabsorption spectrum.

In this embodiment, the ultraviolet visible spectrum of thelight-sensitive silver halide can be measured by a transmission processor a reflection process. When the absorption derived from othercompounds added to the photothermographic material overlaps with theabsorption of the light-sensitive silver halide, means such as thedifference spectrum, and removal of the other compounds by a solvent areused alone, or in combination, which allows the observation of theultraviolet visible absorption spectrum of the light-sensitive silverhalide.

The silver iodide complex forming agent in this embodiment is distinctlydifferent from a conventional silver ion complex forming agent in thatan iodine ion is essential for forming a stable complex. Theconventional silver ion complex forming agent performs a dissolvingactivity on a salt containing a silver ion such as an organic silversalt including silver bromide, silver chloride, silver behenate, or thelike. In contrast, the large feature of the silver iodide complexforming agent in this embodiment resides in that it does not act in theabsence of silver iodide.

The specific compounds of the silver iodide complex forming agent inthis embodiment are the same as the compounds described in details inJapanese Patent Application Nos. 2002-367661, 2002-367662, and2002-367663. The specific compound examples described in these patentapplication specifications may also be cited as the specific examples ofthe compounds of this embodiment.

In this embodiment, in order that the image storability, particularly,the image storability under light irradiation is largely improved, theabsorption intensity of the ultraviolet visible absorption spectrum ofthe light-sensitive silver halide after heat development is preferably80% or less, further preferably 40% or less, and in particularpreferably 20% or less as compared with before heat development. It ismost preferably 10% or less.

The silver iodide complex forming agent in this embodiment may beincorporated in a coating solution with any process based on a solutionform, an emulsified dispersion form, a solid fine particle dispersionform, or the like, and incorporated in the light-sensitive material.

As a well-known emulsification dispersion method, mention may be made ofa method in which an emulsified dispersion is mechanically prepared bydissolving the agent with an oil such as dibutylphthalate, tricresylphosphate, glyceryl triacetate or diethyl phthalate and with aco-solvent such as ethyl acetate or cyclohexanone.

(Explanation of Light-Sensitive Silver Halide)

1) Halogen Composition

It is important that the light-sensitive silver halides usable in thisembodiment are the ones of a composition having a silver iodide contentof as high as 40% or more and 100 mol % or less. There is no particularrestriction on the balance. The silver halides can be selected fromsilver halides such as silver chloride and silver bromide, or organicsilver salts such as silver thiocyanate and silver phosphate, but thesilver halide is in particular preferably silver bromide or silverchloride. By using such a silver halide of a composition having a highsilver iodide content, it is possible to design a preferredphotothermographic material excellent in image storability after heatdevelopment, particularly causing a remarkably less increase in fogthrough light irradiation.

Further, it is very preferable from the viewpoint of the imagestorability under light irradiation after processing that the silveriodide content is preferably 70% or more and 100 mol % or less, morepreferably 80 mol % or more and 100 mol % or less, and furtherpreferably 90 mol % or more and 100 mol % or less.

The distribution of halogen composition in a grain may be uniform, or itmay be such that the halogen composition is stepwise changed orcontinuously changed. Further, silver halide grains having a core/shellstructure can also preferably be used. For the structure, a twofold tofivefold structure is preferable. Core/shell grains having a twofold tofourfold structure are more preferably used. A core high silver iodidestructure in which the core portion has a high silver iodide content, ora shell high silver iodide structure in which the shell portion has ahigh silver iodide content is also preferably usable. Whereas,techniques of localizing silver chloride or silver bromide in the formof an epitaxial part on the surface of the grain can also preferably beused.

The silver iodide of this embodiment can assume any given β phase and γphase contents. The β phase denotes a high silver iodide structurehaving a wurtzite structure of a hexagonal system, and the γ phasedenotes a high silver iodide structure having a zinc blend structure ofa cubic system. The γ phase content herein referred to is determined bya method proposed by C. R. Berry. With this method, the content isdetermined based on the ratio of peaks resulting from the silver iodideβ phase (100), (101), and (002), and the γ phase (111) according to thepowder X-ray diffraction method. As for the details thereof, forexample, Physical Review, Volume 161, No. 3, p. 848–851, (1967) canserve as a reference.

2) Grain Size

As for the silver halide with a high silver iodide content for use inthis embodiment, a sufficiently large grain size required for achievingthe high sensitivity may be selected. In this embodiment, the meansphere equivalent diameter of the silver halide is preferably 0.3 μm ormore and 5.0 μm or less, and further preferably 0.5 μm or more and 3.0μm or less. The sphere equivalent diameter herein referred to denotesthe diameter of the sphere with the same volume as the volume of onesilver halide grain. It can be determined in the following manner. Thegrain volume is determined from the individual projection area andthickness observed by means of an electron microscope. Then, it isconverted to the sphere with the same volume as the volume.

3) Coating Amount

In general, for a photothermographic material in which the silver halidestill remains as it is even after heat development, the increase incoating amount of the silver halide results in the reduction of thetransparency of the film. This is undesirable in terms of the imagequality. Therefore, there is a demand for enhancing the sensitivity.However, the sensitivity is restricted to a low level in spite of thisdemand. However, in this embodiment, the heat development can reduce thehaze of the film due to the silver halide. Therefore, the silver halidecan be applied in a larger amount. In this invention, it is applied inan amount of preferably 0.5 mol % or more and 100 mol % or less, morepreferably 5 mol % or more and 50 mol % or less per mole of the silverof an on-light-sensitive organic silver salt.

4) Grain Formation Method

The methods for forming the light-sensitive silver halide are well knownin the art. For example, methods described in Research Disclosure No.17029, June, 1978, and U.S. Pat. No. 3,700,458 can be used.Specifically, the following method is used. Namely, a silver-supplyingcompound and a halogen-supplying compound are added into a solution ofgelatin or other polymers, thereby to prepare a light-sensitive silverhalide. Then, the resulting light-sensitive silver halide is mixed withan organic silver salt. Further, the methods described in paragraph Nos.0217 to 0224 of JP-A-11-119374, and the methods described inJP-A-11-352627 and Japanese Patent Application No. 2000-347335 are alsopreferred.

As for the methods for forming tabular grains of silver iodide, themethods described in JP-A-59-119350 and JP-A-59-119344 are preferablyused.

5) Grain Shape

As the shape of the silver halide grain in the invention, a tabulargrain is preferred. Specifically, this includes tabular octahedrongrain, tabular tetradecahedron grain and tabular twenty-hedron grain inview of the structure of the lateral planes. Preferred are tabularoctahedron grains, and tabular tetrahedron grain. The tabular octahedronreferred to herein denote a grain having a {0001}, or {1(−1)00} plane,or a grain having {0001}, {1(−2)10} or {(−1)2 (−1)0} plane, and thetabular tetradecahedron particle denotes a grains having {0001},{1(−1)00}, or {1(−1)01} or a grain having {0001}, {1(−2)10},{(−1)2(−1)0}, {1(−2)11}, or {(−1)2(−1)1} plane, a grain having {0001},{1(−1)00}, or {1(−1)0(−1)}, or a grain having {0001}, {1(−2)10},{(−1)2(−1)0}, {1(−2)1(−1)}, or {(−1)2(−1)(−1)} plane, tabulartwenty-hedron grain denotes a grain having {0001}, {1(−1)00}, {1(−1)01},or {1(−1)0(−1)}, or a grain having {0001}, {1−(−2)10}, {(−1)2(−1)0},{1(−2)1(−1)11}, {(−1)2 (−1)1], {1(−2)1(−1)}), {(−1)2(−1)(−1)}.Expression such as {0001} represents the crystal plane group having theequivalent plane indices with {0001} plane. Further, tabular grains ofother shape than described above can also be used preferably.

Decahedron, tetrahedron and octahedron of silver iodide can be preparedwith reference to JP-A Nos. 2002-081020, 2003-287835 and 2003-287836.

Referring to the tabular grain, in the invention, the projection areaequivalent diameter of the silver halide is preferably from 0.4 μm ormore and 8.0 μm or less and, more preferably, 0.5 μm or more and 3 μm orless. The projection area equivalent diameter means the diameter of acircle having an identical area with the projection area per one grainof silver halide. As the measuring method, this can be obtained bydetermining the grain area based on individual projection area observedby an microscope and converting the same into a circle having an areaidentical with the area described above.

The thickness of the light sensitive silver halide grain used in theinvention is, preferably 0.3 μm or less, more preferably, 0.2 μm or lessand, further preferably, 0.15 μm or less. The aspect ratio is preferably2 or more and 100 or less and, more preferably, 5 or more and 50 orless.

The silver halide of a composition with a high silver iodide content ofthis embodiment can assume complex forms. As the preferred form, mentionmay be made of the form of joined grains as shown in p. 164, FIG. 1 ofR. L. JENKINS et al., J. of Phot. Sci. Vol. 28 (1980). The tabulargrains as shown in FIG. 1 of the same journal may also preferably used.Silver halide grains with rounded corners can also preferably be used.The plane indices (Miller indices) of outer surface planes oflight-sensitive silver halide grains have no particular restriction.However, [100] plane showing a high spectral sensitization efficiencyupon adsorption of spectral sensitizing dyes thereon preferably occupiesa large proportion. The proportion is preferably 50% or more, morepreferably 65% or more, and furthermore preferably 80% or more. Theproportion of Miller index [100] plane can be determined by the methoddescribed in T. Tani; J. Imaging Sci., 29, 165, (1985), which utilizesthe adsorption dependency between [111] plane and [100] plane in thesensitizing dye adsorption.

6) Heavy Metal

The light-sensitive silver halide grains of this embodiment can containa metal of the Groups 3 to 14 in the Periodic Table (showing the Groups1 to 18), or a metal complex thereof. A metal of the Groups 8 to 10 inthe Periodic Table, or a metal complex thereof are preferable. Themetals of the Groups 8 to 10 in the Periodic Table or the central metalsof the metal complexes are preferably rhodium, ruthenium, and iridium.These metal complexes may be used alone, or in combination of two ormore complexes of the same kind of metals and different kinds of metals.The preferred content is preferably in the range of 1×10⁻⁹ mol to 1×10⁻³mol per mole of silver. These heavy metals, metal complexes, andaddition processes thereof are described in JP-A-7-225449,JP-A-11-65021, paragraph Nos. 0018 to 0024, and JP-A-11-119374,paragraph Nos. 0227 to 0240.

In this embodiment, a silver halide grain containing a hexacyano metalcomplex is preferred. As the hexacyano metal complexes, mention may bemade of [Fe(CN)₆]⁴⁻, [Fe(CN)₆]³⁻, [Ru(CN)₆]⁴⁻, [Os(CN)₆]⁴⁻, [Co(CN)₆]³⁻,[Rh(CN)₆]³⁻, [Ir(CN)₆]³⁻, [Cr(CN)₆]³⁻, [Re(CN)₆]³⁻, and the like.

The hexacyano-metal complex may be added by being incorporated in amixed solvent of water, and in addition, an appropriate organic solventmiscible with water (e.g., alcohols, ethers, glycols, ketones, esters,or amides), or gelatin.

The amount of hexacyano-metal complex to be added is preferably 1×10⁻⁸mol or more to 1×10⁻² mol or less, and more preferably 1×10⁻⁷ mol ormore to 1×10⁻³ mol or less per mole of silver.

Further, the metal atoms (e.g., [Fe(CN)₆]⁴⁻) which can be incorporatedin the silver halide grains usable in this embodiment, and a desaltingprocesses or a chemical sensitizing process of a silver halide emulsionare described in JP-A-11-84574, paragraph Nos. 0046 to 0050,JP-A-11-65021, paragraph Nos. 0025 to 0031, and JP-A-11-119374,paragraph Nos. 0242 to 0250.

7) Gelatin

As the gelatins to be incorporated in the light-sensitive silver halideemulsion for use in this embodiment, various gelatins may be used. Inorder to keep the dispersion state in an organic silver salt-containingcoating solution of the light-sensitive silver halide emulsionfavorable, gelatin having a low molecular weight of 500 to 60,000 ispreferably used. The low molecular weight gelatin may be used for grainformation or for dispersing after desalting treatment, but it ispreferably used for dispersing after desalting treatment.

8) Chemical Sensitization

The light-sensitive silver halide for use in this embodiment may bechemically unsensitized. However, it is preferably chemically sensitizedby at least one process of a chalcogen sensitization process, a goldsensitization process, and a reduction sensitization process. As thechalcogen sensitization processes, mention may be made of a sulfursensitization process, a selenium sensitization process, and a telluriumsensitization process.

In the sulfur sensitization, a labile sulfur compound is used. Thelabile sulfur compounds described in Chimie et Physique Photographique,written by P. Grafkides (published by Paul Momtel Co., 1987, the fifthedition), Research Disclosure, Vol. 307, No. 307105, and the like can beused.

Specifically, thiosulfates (e.g., hypo), thioureas (e.g.,diphenylthiourea, triethylthiourea,N-ethyl-N′-(4-methyl-2-thiazolyl)thiourea, andcarboxymethyltrimethylthiourea), thioamides (e.g., thioacetamide),rhodanines (e.g., diethyl rhodanine, and 5-benzylidene-N-ethylrhodanine), phosphine sulfides (e.g., trimethylphosphine sulfide),thiohydantoins, 4-oxo-oxazolidine-2-thiones, disulfides, or polysulfides(e.g., dimorpholine disulfide, cystine, lenthionine(1,2,3,5,6-pentathiopane), polythionate, known sulfur compounds such aselemental sulfur, and active gelatin may also be used. Particularly,thiosulfate, thioureas, and rhodanines are preferred.

In the selenium sensitization, a labile selenium compound is used, Thecompounds described in JP-B-43-13489, JP-B-44-15748, JP-A-4-25832,JP-A-4-109340, JP-A-4-271341, JP-A-5-40324, JP-A-5-11385, JapanesePatent Application Nos. 4-202415, 4-330495, 4-333030, 5-4203, 5-4204,5-106977, 5-236538, 5-241642, and 5-286916, and the like are usable.

Specifically, colloidal metal selenium, selenoureas (e.g.,N,N-dimethylselenourea, trifluoromethylcarbonyltrimethylselenourea, andacetyltrimethylselenourea), selenoamides (e.g., selenoacetamide andN,N-diethylphenylselenoamide), phosphineselenides (e.g.,triphenylphosphineselenide andpentafluorophenyltriphenylphosphineselenide), selenophosphates (e.g.,tri-p-tolylselenophosphate and tri-n-butylselenophosphate), selenoketones (e.g., selenobenzophenone), isoselenocyanates, selenocarboxylicacids, seleno esters, diacylselenides, and the like may be used.Further, non-labile selenium compounds described in JP-B-46-4553,JP-B-52-34492, and the like, such as selenious acid, selenocyanate,selenazoles, and selenides may also be used. Particularly, phosphineselenides, selenoureas, and selenocyanate are preferred.

In the tellurium sensitization, a labile tellurium compound is used. Thelabile tellurium compounds described in JP-A-4-224595, JP-A-4-271341,JP-A-4-333043, JP-A-5-303157, JP-A-6-27573, JP-A-6-175258,JP-A-6-180478, JP-A-6-208186, JP-A-6-208184, JP-A-6-317867,JP-A-7-140579, JP-A-7-301879, JP-A-7-301880, and the like can be used.

Specifically, phosphine tellurides (e.g., butyl-diisopropylphosphinetelluride, tributylphosphine telluride, tributoxyphosphine telluride,ethoxy-diphenylphosphine telluride), diacyl(di)tellurides (e.g.,bis(diphenylcarbamoyl)ditelluride,bis(N-phenyl-N-methylcarbamoyl)ditelluride,bis(N-phenyl-N-methylcarbamoyl)telluride,bis(N-phenyl-N-benzylcarbamoyl)telluride,bis-(ethoxycarbonyl)telluride), telluroureas (e.g.,N,N′-dimethylethylenetellurourea and N,N′-diphenylehtylenetellurourea),telluroamides, telluro esters, and the like may be used. Particularly,diacyl(di)tellurides and phosphine tellurides are preferred.Particularly, the compounds described in the literature shown inJP-A-11-65021, paragraph No. 0030, and the compounds expressed by theformulae (II), (III), and (IV) in JP-A-5-313284 are more preferred.

In particular, in the chalcogen sensitization of this embodiment, theselenium sensitization and the tellurium sensitization are preferred,and the tellurium sensitization is particularly preferred.

In the gold sensitization, the gold sensitizers described in Chimie etPhysique Photographique, written by P. Glafkides, (edited by Paul MontelCo., 1987, the 5th edition), and Research Disclosure, vol. 307, No.307105 are usable. Specifically, they are chloroauric acid, potassiumchloroaurate, potassium auric thiocyanate, gold sulfide, gold selenide,and the like. In addition to these, the gold compounds described in U.S.Pat. Nos. 2,642,361, 5,049,484, 5,049,485, 5,169,751 and 5,252,455 andBelgian Patent No. 691,857, and the like are also usable. Whereas, saltsof a noble metal such as platinum, palladium, and iridium, other thanthe gold sensitizers described in Chimie et Physique Photographique,written by P. Glafkides, (edited by Paul Montel Co., 1987, the 5thedition), and Research Disclosure, vol. 307, No. 307105, may also beused.

The gold sensitization can be used alone. However, it is preferably usedin combination with the chalcogen sensitization. Specifically, goldsulfur sensitization, gold selenium sensitization, gold telluriumsensitization, gold sulfur selenium sensitization, gold sulfur telluriumsensitization, gold selenium tellurium sensitization, and gold seleniumtellurium sensitization are preferred.

In this embodiment, any timing is acceptable for the chemicalsensitization so long as the timing is after grain formation and beforecoating. The timing may be after desalting, and (1) before spectralsensitization, (2) simultaneously with spectral sensitization, (3) afterspectral sensitization, (4) immediately before coating, or the like.

The amount of the chalcogen sensitizer for use in this embodiment variesaccording to the silver halide grains to be used, the chemical agingconditions, and the like. It is used in an amount of about 10⁻⁸ to 10⁻¹mol, and preferably 10⁻⁷ to 10⁻² mol per mole of silver halide.

Similarly, the amount of the gold sensitizer for use in this embodimentto be added varies according to various conditions. It is, as aguideline, 10⁻⁷ mol to 10⁻² mol, and more preferably 10⁻⁶ mol to 5×10⁻³mol per mole of silver halide As the environmental conditions for thechemical sensitization of the emulsion, any conditions are selectable.However, the conditions are as follows. The pAg is 8 or less, preferably7.0 or less, more preferably 6.5 or less, and particularly 6.0 or less,and the pAg is 1.5 or more, preferably 2.0 or more, and in particularpreferably 2.5 or more. The pH is 3 to 10, and preferably 4 to 9, andthe temperature is 20 to 95° C., and preferably about 25 to 80° C.

In this embodiment, in addition to the chalcogen sensitization and thegold sensitization, a reduction sensitization may also be used incombination. It is in particular preferably used in combination with thechalcogen sensitization. As the specific compounds for a reductionsensitization process, ascorbic acid, thiourea dioxide, anddimethylamineborane are preferred. In addition, stannous chloride,aminoiminomethane sulfinic acid, hydrazine derivatives, boranecompounds, silane compounds, polyamine compounds, and the like arepreferably used. The reduction sensitizer may be added in any process ofthe light-sensitive emulsion manufacturing steps of from the crystalgrowth until the preparation step immediately before coating. Whereas,the emulsion is also preferably aged with the pH held at 8 or more, orwith the pAg held at 4 or less, so that reduction sensitization isperformed. The reduction sensitization is also preferably performed byintroducing the single addition part of silver ion during grainformation.

Similarly, the amount of the reduction sensitizer to be added variesaccording to various conditions. It is, as a guideline, 10⁻⁷ mol to 10⁻¹mol, and more preferably 10⁻⁶ mol to 5×10⁻² mol per mole of silverhalide

To the silver halide emulsion for use in this embodiment, a thiosulfonicacid compound may also be added with the method described in EP-A No.293,917.

It is preferable from the viewpoint of designing a high-sensitivityphotothermographic material that the light-sensitive silver halidegrains in this embodiment has been chemically sensitized by at least oneprocess of the gold sensitization and the chalcogen sensitization.

9) Compound Capable of being One-Electron Oxidized to become aOne-Electron Oxidation Product, and Releasing One or More Electrons

The photothermographic material in this embodiment preferably contains acompound capable of being one-electron oxidized to become a one-electronoxidation product, and releasing one or more electrons. The compound canbe used alone, or in combination with the foregoing various chemicalsensitizers, which brings about an increase in sensitivity of silverhalide.

The compound capable of being one-electron oxidized to become aone-electron oxidation product, and releasing one or more electrons tobe contained in the photothermographic material of this embodiment is acompound selected from the following compounds of types 1 to 5.

(Type 1)

Compound capable of being one-electron oxidized to become a one-electronoxidation product, and subsequently undergoing a bond cleavage reactionto further release two or more electrons

(Type 2)

Compound capable of being one-electron oxidized to become a one-electronoxidation product, and subsequently undergoing a bond cleavage reactionto further release another electron, and having two or more silverhalide adsorbing groups in the same molecule;

(Type 3)

Compound capable of being one-electron oxidized to become a one-electronoxidation product, subsequently undergoing a bond formation process, andthen, further releasing one or more electrons;

(Type 4)

Compound capable of being one-electron oxidized to become a one-electronoxidation product, subsequently undergoing a ring cleavage reaction inthe molecule, and then, further releasing one or more electrons;

(Type 5)

Compound represented by X-Y, wherein X denotes a reducing group and Ydenotes a leaving group, capable of being one-electron oxidized at thereducing group represented by X to become a one-electron oxidationproduct, subsequently undergoing the cleavage reaction of the X-Y bondto release Y, thereby producing an X radical, and further releasinganother electron therefrom.

Out of the compounds of the type 1, and types 3 to 5, a “compound havinga silver halide adsorbing group in the molecule” or a “compound having apartial structure of a spectral sensitizing dye in the molecule” ispreferred. It is more preferably the “compound having a silver halideadsorbing group in the molecule”. Each compound of types 1 to 4 is morepreferably a “compound having two or more mercapto group-substitutednitrogen-containing heterocyclic groups as adsorbing groups”.

The compounds of types 1 to 4 of this embodiment are the same as thecompounds explained in details respectively in JP-A-2003-114487,JP-A-2003-114486, JP-A-2003-140287, JP-A-2003-75950, JP-A-2003-114488,JP-A-2003-25886, and JP-A-2003-33446. The specific examples of thecompounds described in the specifications of these patent applicationscan also be mentioned as specific examples of the compounds of types 1to 4 of the invention. The synthetic examples of the compounds of types1 to 4 of this embodiment are also the same as those described in thesepatents.

Specific examples of the compound of type 5 of this embodiment mayinclude the compounds, as they are, referred to as “one-photontwo-electron sensitizers” or “deprotonating electron donatingsensitizers” described in the patent publication of JP-A-9-211769(compounds PMT-1 to S-37 described in tables E and F on pages 28 through32), JP-A-9-211774 and JP-A-11-95355 (compounds INV1 to 36),JP-W-2001-500996 (compounds 1 to 74, 80 to 87, and 92 to 122), U.S. Pat.Nos. 5,747,235 and 5,747,236, EP-A Nos. 786692A1 (compounds INV1 to 35),and 893732A1, U.S. Pat. Nos. 6,054,260 and 5,994,051, and the like.

Each compound of types 1 to 5 of this embodiment may be used at any timeduring the preparation of a light-sensitive silver halide emulsion andduring a photothermographic material manufacturing step. It may be used,for example, at the time of light-sensitive silver halide grainformation, during a desalting step, during a chemical sensitizationstep, prior to coating, or during other period. Alternatively, thecompounds may also be added over a plurality of times during thesesteps. They are preferably added during the period from completion ofthe light-sensitive silver halide grain formation until prior to thedesalting step, at the time of chemical sensitization (during the periodfrom immediately before the start of chemical sensitization toimmediately after the completion thereof), or before coating, and morepreferably during the period from the time of chemical sensitizationuntil prior to mixing with non-light-sensitive organic silver salts.

Each compound of types 1 to 5 of this embodiment is preferably dissolvedin water or in a water-soluble solvent such as methanol or ethanol, or amixed solvent thereof, and added. For being dissolved in water, thecompound whose solubility increases with an increase or a decrease inpH, may be increased or decreased in pH to be dissolved in water, to beadded.

Each compound of types 1 to 5 of this embodiment is preferably used inan emulsion layer containing a light-sensitive silver halide and anon-light-sensitive organic silver salt. It is also acceptable that thecompound is added to a protective layer or an intermediate layer, inaddition to the emulsion layer containing a light-sensitive silverhalide and a non-light-sensitive organic silver salt, and allowed todisperse therein at the time of coating. Each compound of thisembodiment may be added either before or after addition of thesensitizing dye, and is incorporated into the silver halide emulsionlayer preferably in a proportion of 1×10⁻⁹ to 5×10⁻¹ mol, and morepreferably 1×10⁻⁸ to 5×10⁻² mol per mole of silver halide.

10) Adsorptive Redox Compound Having an Adsorbing Group and a ReducingGroup

In this embodiment, an adsorptive redox compound having a silveradsorbing group and a reducing group in the molecule is preferablycontained. The adsorptive redox compound of this embodiment ispreferably a compound represented by the following formula (I):A—(W)n—B  Formula (I)

[where in the formula (I), A denotes a silver halide adsorbable group(hereinafter, referred to as an adsorbing group); W denotes a divalentlinking group; n denotes 0 or 1; and B denotes a reducing group.]

In the formula (I), the adsorbing group represented by A is a groupdirectly adsorbing to a silver halide or a group promoting adsorption toa silver halide. Specifically, mention may be made of a mercapto group(or a salt thereof), a thione group (—C(═S)—), a heterocyclic groupcontaining at least one atom selected from a nitrogen atom, a sulfuratom, a selenium atom, and a tellurium atom, a sulfide group, adisulfide group, a cationic group, or an ethynyl group.

A mercapto group (or a salt thereof) as an adsorbing group denotes amercapto group (or a salt thereof) itself, and at the same time, morepreferably, denotes a heterocyclic group, an aryl group, or an alkylgroup substituted with at least one mercapto group (or salt thereof).The heterocyclic group herein denotes at least a 5-membered to7-membered, monocyclic or condensed, aromatic or nonaromaticheterocyclic group. Examples thereof may include an imidazole ringgroup, a thiazole ring group, an oxazole ring group, a benzimidazolering group, a benzothiazole ring group, a benzoxazole ring group, atriazole ring group, a thiadiazole ring group, an oxadiazole ring group,a tetrazole ring group, a purine ring group, a pyridine ring group, aquinoline ring group, an isoquinoline ring group, a pyrimidine ringgroup, and a triazine ring group. A heterocyclic group containing aquaternized nitrogen atom may also be acceptable, and in this case, itis also acceptable that a substituted mercapto group undergoesdissociation to give mesoion. When a mercapto group forms a salt, ascounter ions, mention may be made of cations of alkali metals, alkalineearth metals, and heavy metals (Li⁺, Na⁺, K⁺, Mg²⁺, Ag⁺, Zn²⁺, and thelike), ammonium ions, heterocyclic groups containing a quaternizednitrogen atom, phosphonium ions, and the like.

The mercapto group as an adsorbing group may further undergotautomerization, thereby to become a thione group.

The thione group as an adsorbing group includes a chain or cyclicthioamido group, thioureido group, thiourethane group, or dithiocarbamicacid ester group.

The heterocyclic group which contains at least one atom selected from anitrogen atom, a sulfur atom, a selenium atom, and a tellurium atom asan adsorbing group is a nitrogen-containing heterocyclic group having an—NH— group capable of forming imino silver (>NAg) as a partial structureof the heterocyclic ring, or a heterocyclic group having an “—S—” group,an “—Se—” group, a “—Te—” group or an “═N—” group capable ofcoordinating with silver ion through a coordinate bond as the partialstructure of the heterocyclic ring. Examples of the former group mayinclude a benzotriazole group, a triazole group, an indazole group, apyrazole group, a tetrazole group, a benzimidazole group, an imidazolegroup, and a purine group. Whereas, examples of the latter group mayinclude a thiophene group, a thiazole group, an oxazole group, abenzothiophene group, a benzothiazole group, a benzoxazole group, athiadiazole group, an oxadiazole group, a triazine group, a selenazolegroup, a benzoselenazole group, a tellurazole group, and abenzotellurazole group.

The sulfide groups or the disulfide groups as adsorbing groups includeall the groups having a partial structure of “—S—” or “—S—S—”.

The cationic group as an adsorbing group denotes a group containing aquaternized nitrogen atom, and specifically, a group including anammonio group or a nitrogen-containing heterocyclic group containing aquaternized nitrogen atom. Examples of the nitrogen-containingheterocyclic group containing a quaternized nitrogen atom may include apyridinio group, a quinolinio group, an isoquinolinio group, and animidazolio group.

The ethynyl group as an adsorbing group denotes a —C≡CH group, where thehydrogen atom may also be substituted.

The adsorbing group may have any given substituent.

Further, specific examples of the adsorbing group may include the onesdescribed on pages 4 through 7 in the specification of JP-A-11-95355.

The adsorbing group denoted by A in the formula (I) is preferably amercapto-substituted heterocyclic group (e.g., a 2-mercaptothiadiazolegroup, a 2-mercapto-5-aminothiadiazole group, a3-mercapto-1,2,4-triazole group, a 5-mercaptotetrazole group, a2-mercapto-1,3,4-oxadiazole group, a 2-mercaptobenzimidazole group, a1,5-dimethyl-1,2,4-triazolium-3-thiolate group, 2,4-dimercaptopyrimidinegroup, 2,4-dimercaptotriazine group, 3,5-dimercapto-1,2,4-triazolegroup, and 2,5-dimercapto-1,3-thiazole group), or a nitrogen-containingheterocyclic group having an —NH— group capable of forming imino silver(>NAg) as a partial structure of the heterocyclic ring (e.g., abenzotriazole group, a benzimidazole group, or an indazole group). Themore preferred adsorbing groups are a 2-mercaptobenzimidazole group anda 3,5-dimercapto-1,2,4-triazole group.

In the formula (I), W denotes a divalent linking group. Any linkinggroups are acceptable so long as they do not adversely affect thephotographic characteristics. For example, divalent linking groupscomprising a carbon atom, a hydrogen atom, an oxygen atom, a nitrogenatom, and a sulfur atom are available. Specifically, mention may be madeof an alkylene group having 1 to 20 carbon atoms (e.g., a methylenegroup, an ethylene group, a trimethylene group, a tetramethylene group,or a hexamethylene group), an alkenylene group having 2 to 20 carbonatoms, an alkynylene group having 2 to 20 carbon atoms, an arylene grouphaving 6 to 20 carbon atoms (e.g., a phenylene group or a naphthylenegroup), —CO—, —SO₂—, —O—, —S—, or —NR₁—, or a combination of theselinking groups, or the like. Herein, R₁ denotes a hydrogen atom, analkyl group, a heterocyclic group, or an aryl group. The linking grouprepresented by W may have any given substituent.

In the formula (I), the reducing group represented by B denotes a groupcapable of reducing a silver ion. Examples thereof may include: a formylgroup, an amino group, a triple bond group such as an acetylene group ora propargyl group, a mercapto group, and residues prepared by removingone hydrogen atom from hydroxylamines, hydroxamic acids, hydroxyureas,hydroxyurethanes, hydroxycarbazides, reductons (including reductonderivatives), anilines, phenols (including chroman-6-ols,2,3-dihydrobenzofuran-5-ols, aminophenols, sulfonamindophenols, andpolyphenols such as hydroquinones, catechols, resorcinols,benzenetriols, and bisphenol), acylhydrazines, carbamoylhydrazines,3-pyrazolidone, and the like. Of course, these may have any givensubstituents.

The reducing group represented by B in the formula (I) can be measuredfor the oxidation potential using the measurement method described inDENKI KAGAKU SOKUTEIHOU authored by Akira Fujishima (pages 150 to 208,published by GIHODO Publisher's Co.), or in JIKKEN KAGAKU KOZA (Coursesin Experimental Chemistry) 4th ed., (vol. 9, pages 282 to 344, Maruzen)edited and authored by the Chemical Society of Japan. For example, witha technique of rotating disk voltammetry, specifically, a sample isdissolved in a solution of methanol: pH6.5 Britton-Robinsonbuffer=10%:90% (% by volume), and a nitrogen gas is passed through thesolution for 10 minutes. Then, a rotating disk electrode (RDE) made ofglassy carbon is used as a working electrode, a platinum wire is used asa counter electrode, and a saturated calomel electrode is used as areference electrode. Thus, a measurement is carried out at 25° C., 1000revolutions/min, and a sweep rate of 20 mV/sec. The half-wave potential(E½) can be determined from the voltammogram obtained.

When the reducing group represented by B of the invention is measuredwith the foregoing measurement method, it has an oxidation potential ofpreferably in the range of about −0.3 V to about 1.0 V, more preferablyin the range of about −0.1 V to about 0.8 V, and in particularpreferably in the range of about 0 to about 0.7 V.

In the formula (I), the reducing group denoted by B is preferably aresidue prepared by removing one hydrogen atom from hydroxylamines,hydroxamic acids, hydroxyureas, hydroxycarbazides, reductons, phenols,acylhydrazines, carbamoylhydrazines, and 3-pyrazolidones.

Below, specific examples of the reducing group denoted by B will beshown. However, this embodiment is not limited thereto. Herein, themark * denotes the position at which the group is linked to A or W.

The compounds of the formula (I) of this embodiment may also be thecompounds each incorporating therein a ballast group or a polymer chainwhich is commonly used in an immobile photographic additive such as acoupler. As the polymers, mention may be made of the ones described in,for example, JP-A-1-100530.

The compounds of the formula (I) of this embodiment may also each be abis form or a tris form. The compounds of the formula (I) of thisembodiment have a molecular weight of preferably between 100 and 10000,more preferably between 120 and 1000, and in particular preferably 150and 500.

The adsorptive redox compound having a silver halide adsorbing group anda reducing group in the molecule of this embodiment are the same as thecompounds described in details in Japanese Patent Application Nos.2002-328531 and 2002-379844. The specific compound examples of theadsorptive redox compound having a silver halide adsorbing group and areducing group in the molecule described in these patent applicationspecifications may also be mentioned as the specific examples of thecompounds of this embodiment.

The compounds of this embodiment can be synthesized with ease accordingto known methods.

The compounds of the formula (I) of this embodiment may be singly usedalone, or may also preferably used in combination of two or more of thecompounds simultaneously. When two or more of the compounds are usedsimultaneously, these may be either added to the same layer, or added todifferent layers, and each may be added with a different method.

The compounds of the formula (I) of this embodiment are preferably addedto a silver halide emulsion layer, and more preferably added during thepreparation of the emulsion. When they are added during the preparationof the emulsion, it is possible to add them at any timing during thestep. Examples of the timing may include: during silver halide grainformation step, before the start of a desalting step, during thedesalting step, before the start of chemical aging, during chemicalaging step, and during a step prior to complete emulsion preparation.Alternatively, the compounds may also be added over a plurality of timesduring these steps. Whereas, they are preferably used in the emulsionlayer. However, they may also be added to the emulsion layer, and to theadjacent protective layer or intermediate layer together, to bedispersed therein during coating.

The preferred amount of the compounds to be added largely depends uponthe foregoing addition method or the compound species to be added.However, in general, it is 1×10⁻⁶ mol, preferably 1×10⁻⁵ to 5×10⁻¹ mol,and further preferably 1×10⁻⁴ to 1×10⁻¹ mol per mole of light-sensitivesilver halide.

The compound of the formula (I) of this embodiment may be dissolved inwater or a water-soluble solvent such as methanol or ethanol, or a mixedsolvent thereof, and added. In this step, it may be properly adjusted inpH by an acid or a base, and a surfactant may also be allowed to bepresent therein. Further, it may also be dissolved in a high boilingorganic solvent, and added in an emulsified dispersion form.Alternatively, it may also be added in a solid dispersion.

11) Sensitizing Dye

As sensitizing dyes applicable to this embodiment, the sensitizing dyescan be advantageously selected which are capable of spectrallysensitizing silver halide grains in a desirable wavelength region uponadsorbing on the silver halide grains, and have the spectralsensitivities suitable for the spectral characteristics of an exposurelight source. It is preferable that the photothermographic material ofthis embodiment has been spectrally sensitized so as to have a spectralsensitivity peak at particularly 600 nm or more and 900 nm or less, or300 nm or more and 500 nm or less. The sensitizing dyes and the additionprocesses thereof are described in the following references, or as thefollowing substances: paragraph Nos. 0103 to 0109 of JP-A-11-65021, thecompounds represented by the formula (II) in JP-A-10-186572, the dyesrepresented by the formula (I) and the paragraph No. 0106 ofJP-A-11-119374, U.S. Pat. No. 5,510,236, the dyes described in Example 5of U.S. Pat. No. 3,871,887, JP-A-2-96131, the dyes disclosed inJP-A-59-48753, on page 19, line 38 to page 20, line 35 of EP 0803764A1,Japanese Patent Application Nos. 2000-86865, 2000-102560, and2000-205399, and the like. These sensitizing dyes may be used alone, ormay also be used in combination of two or more thereof.

The amount of the sensitizing dye to be added in this embodiment can beset at a desirable amount according to the sensitivity and the fogperformance. It is preferably 10⁻⁶ to 1 mol, and more preferably 10⁻⁴ to10⁻¹ mol per mole of silver halide of the light-sensitive layer.

In this embodiment, it is possible to use a supersensitizer in order toimprove the spectral sensitization efficiency. As the supersensitizersfor use in this embodiment, mention may be made of the compoundsdescribed in EP No. 587,338, U.S. Pat. Nos. 3,877,943 and 4,873,184,JP-A-5-341432, JP-A-11-109547, JP-A-10-111543, and the like.

12) Use of Silver Halides in Combination

The light-sensitive silver halide emulsions in the photothermographicmaterial for use in this embodiment may be used alone, or in combinationof two or more thereof (e.g., the ones having different average grainsizes, the ones having different halogen compositions, the ones havingdifferent crystal habits, and the ones requiring different conditionsfor chemical sensitization). By using a plurality of kinds oflight-sensitive silver halides mutually different in sensitivity, it ispossible to adjust the gradation. As the techniques on these, mentionmay be made of JP-A-57-119341, JP-A-53-106125, JP-A-47-3929,JP-A-48-55730, JP-A-46-5187, JP-A-50-73627, and JP-A-57-150841, and thelike. As for the sensitivity difference, a difference of 0.2 logE ormore is preferably caused between respective emulsions.

13) Mixing of Silver Halide and Organic Silver Salt

It is particularly preferable that the grains of the light-sensitivesilver halide of this embodiment are formed and chemically sensitized inthe absence of a non-light-sensitive organic silver salt. This is forthe following reason. With the method in which silver halide is formedby adding a halogenating agent to an organic silver salt, sufficientsensitivity cannot be implemented in some cases.

As a method of mixing the silver halide and the organic silver salt,mention may be made of a method of mixing the light-sensitive silverhalide and organic silver salt, which have been separately prepared, ina high-speed stirrer, a ball mill, a sand mill, a colloid mill, ashaking mill, a homogenizer, or the like; a method of mixing thelight-sensitive silver halide which has been completely prepared at anytiming during the preparation of an organic silver salt, and preparingan organic silver salt; or other methods. Even with any method, it ispossible to preferably obtain the effects of this embodiment.

14) Mixing of Silver Halide to Coating Solution

The preferred timing of adding the silver halide of this embodiment intoan image forming layer coating solution is in the period of from 180minutes before to immediately before, and preferably 60 minutes beforeto 10 seconds before coating. However, the mixing process and the mixingconditions have no particular restriction so long as the effects of thisembodiment satisfactorily occur. As specific mixing processes, there area method in which the mixing is performed in a tank configured such thatthe mean residence time therein calculated from the addition flow rateand the feeding amount to a coater becomes a desirable time; a methodusing a static mixer described in Chapter 8 of Ekitai Kongo Gijutsuwritten by N. Harnby, M. F. Edwards, and A. W. Nienow, translated byKoji Takahashi, (published by Nikkan Kogyo Shinbunsha, 1989); and thelike.

(Explanation of Organic Silver Salt)

The non-light-sensitive organic silver salt usable in this embodiment isa silver salt, which is relatively stable to light, and forms a silverimage when heated to 80° or higher in the presence of a light-sensitivesilver halide exposed to light and a reducing agent. The organic silversalt may be a given organic substance containing a source capable ofreducing silver ions. Such non-light-sensitive organic silver salts aredescribed in paragraph Nos. 0048 to 0049 of JP-A-10-62899, on page 18,line 24 to page 19, line 37 of EP No. 0803764A1, EP No. 0962812A1,JP-A-11-349591, JP-A-2000-7683, JP-A-2000-72711, and the like. A silversalt of an organic acid, particularly, the silver salt of a long chainaliphatic carboxylic acid (having 10 to 30, preferably 15 to 28 carbonatoms) is preferred. Preferred examples of the organic silver saltinclude silver behenate, silver arachidinate, silver stearate, silveroleate, silver laurate, silver caproate, silver myristate, and silverpalmitate, and mixtures thereof. In this embodiment, out of theseorganic silver salts, it is preferable to use an organic acid silverhaving a silver behenate content of 50 mol % or more and 100 mol % orless. In particular, it is preferable that the silver behenate contentis 75 mol % or more 98 mol % or less.

The organic silver salt usable in this embodiment has no particularrestriction on its shape, and it may have any of needle-shaped,rod-shaped, tabular, and scaly forms.

In this embodiment, a scaly organic silver salt is preferred. In thisspecification, the scaly organic silver salt is defined as follows. Theorganic acid silver salt is observed by means of an electronicmicroscope, and the shape of the organic silver salt particle isapproximated to a rectangular parallelepiped. When the sides of therectangular parallelepiped are taken as a, b, and c in the order fromthe shortest (c may be equal to b), x is calculated from the shorternumerical values, a and b, and determined as follows.x=b/a

Thus, x is determined for each of about 200 particles in this manner,and when the average value is taken as x (average), those satisfying therelationship: x (average)≧1.5, are regarded as scaly particles.Preferably, 30≧x (average)≧1.5, and more preferably, 15≧x (average)≧1.5.In this connection, needle-shaped particles satisfy the relation: 1≧x(average)<1.5.

In a scaly particle, a can be regarded as the thickness of a tabularparticle having a plane with sides of b and c as the main plane. Theaverage of a is preferably 0.01 μm or more and 0.3 μm or less, and morepreferably 0.1 μm or more and 0.23 μm or less. The average of c/b ispreferably 1 or more and 6 or less, more preferably 1 or more and 4 orless, furthermore preferably 1 or more and 3 or less, and in particular,preferably 1 or more to 2 or less.

It is preferable that the particle size distribution of the organicsilver salt is monodispersed. Being “monodispersed” corresponds to thecase where the percentage of a value, obtained by dividing the standarddeviations of their respective lengths of a minor axis and a major axisby the lengths of the minor axis and the major axis, respectively, ispreferably 100% or less, more preferably 80% or less, and furthermorepreferably 50% or less. The shape of an organic silver salt can bedetermined from a transmission electron microscope image of the organicsilver salt dispersion. As another method for determining themonodispesibility, there is a determination method based on the standarddeviation of the volume weight average diameter of an organic silversalt. The percentage of the value obtained by dividing the standarddeviation by the volume weight average diameter (coefficient ofvariation) is preferably 100% or less, more preferably 80% or less, andfurthermore preferably 50% or less. For example, the monodispersibilitycan be determined from the particle size (volume weight averagediameter) obtianed by irradiating an organic silver salt dispersed in asolution with a laser light, and determining the autocorrelationfunction of fluctuation of scattered light on the basis of the change intime.

To the manufacturing and dispersion methods of the organic acid silverfor use in this embodiment, known methods and the like can be applied.For example, the following references can serve as references:JP-A-10-62899, EP No. 0803763A1, EP No. 0962812A1, JP-A-11-349591,JP-A-2000-7683, JP-A-2000-72711, JP-A-2001-163827, JP-A-2001-163889 to90, JP-A-11-203413, JP-A-2001-188313, JP-A-2001-83652, JP-A-2002-6442,JP-A-2002-31870, and JP-A-2001-107868.

In this embodiment, it is possible to manufacture the light-sensitivematerial by mixing an aqueous dispersion of the organic silver salt andan aqueous dispersion of the light-sensitive silver salt. For mixing, itis a method preferably used for adjusting the photographiccharacteristics that two or more kinds of aqueous dispersions of organicsilver salts and two or more kinds of aqueous dispersions oflight-sensitive silver salts are mixed.

The organic silver salt of this embodiment can be used in a desirableamount. It is used in an amount of, preferably 0.1 to 5 g/m², and morepreferably 1 to 3 g/m² in terms of the silver amount. In particular, itis preferably used in an amount of 1.2 to 2.5 g/m².

(Nucleating Agent)

The photothermographic material according to the invention preferablycontains a nucleating agent.

The nucleating agent according to the invention denotes a compoundcapable of forming a compound capable of additionally inducingdevelopment by reaction with the development product as a result ofinitial development. Heretofore, use of a nucleating agent to asuper-hard light sensitive material suitable to print making applicationhas been known. The super-hard light sensitive material has an averagegradation of 10 or more and thus is not suitable to light sensitivematerials for general photographic use and, particularly, is notsuitable to medical use requiring high diagnosis performance. Further,since the super-hard light sensitive material is rough in the grain sizeand lacks in the sharpness, it has no adaptability at all in the medicaldiagnosis application. The nucleating agent according to the inventionis quite different, in view of the effect, from existent nucleatingagents in the super-hard light sensitive material. The nucleating agentaccording to the invention does not harden gradation. The nucleatingagent of the invention is a compound capable of sufficiently causingdevelopment to the non-light sensitive organic silver salt even when thenumber of light sensitive silver halide particles is extremely small.While mechanism is not clear, it has been found that the number ofdeveloped silver particles is larger than the number of light sensitivesilver halide particles at the maximum density area when thermaldevelopment is carried out by using the nucleating agent according tothe invention and it is estimated that the nucleating agent according tothe invention has an effect of forming new development sites(development nuclei) in a portion where silver halide particles are notpresent.

The nucleating agent used in the invention is identical with thecompound described specifically in Japanese Patent Application No.2004-136053. The examples of the specific compounds described in thepatent application can also be mentioned as specific examples for thenucleating agent of this embodiment.

Preferred specific compounds among the nucleating agents described aboveare shown below but the compounds are not limitative.

The nucleating agent may be added and incorporated in the coatingsolution by any method such as in the form of solution, emulsifieddispersion, fine solid particle dispersion, etc. and contained in aphotothermographic material.

The well known emulsification dispersion method can include, forexample, a method of mechanically forming an emulsified dispersion bydissolving while using an oil such as dibutyl phthalate, tricresylphosphate, dioctyl cebacate or tri(2-ethylhexyl)phosphate or anauxiliary solvent such as ethyl acetate or cyclohexanone, and adding asurfactant such as sodium dodecyl benzene sulfonate, sodiumoleoyl-N-methyl taurinate, or sodium di(2-ethylhexyl)sulfosuccinate.

In this case, it is also preferred to add a polymer such as α methylstyrene oligomer or poly(t-butyl acryl amide) for the purpose ofcontrolling the viscosity and the refractive index of oil droplets.

Further, the fine solid particle dispersion method can include a methodof dispersing a powder of a nucleating agent in an appropriate solventsuch as water by a ball mill, colloid mill, vibration ball mill, sandmill, jet mill, roller mill or supersonic waves thereby preparing asolid dispersion. In this case, a protection colloid (for example,polyvinyl alcohol), a surfactant (for example, anionic surfactant suchas sodium triisopropyl naphthalene sulfonate (mixture of those havingdifferent substitution positions of three isopropyl groups)) may also beused. In the mills described above, beads, for example, of zirconia areused generally as the dispersion medium, and Zr or the like leachingfrom the beads may sometimes be intruded into the dispersion whiledepending on the dispersion condition, it is usually within a range from1 ppm to 1000 ppm. If the content of Zr in the photosensitive materialis 0.5 mg or less per 1 g of the silver, it causes no practical problem.

The liquid dispersion is preferably incorporated with a corrosioninhibitor (for example, sodium salt of benzoisothiazolinone).

The solid particle dispersion method is most preferred for thenucleating agent and it is desirably added as fine particles with anaverage grain size of from 0.01 μm to 10 μm, preferably, from 0.05 μm to5 μm and, more preferably, from 0.1 μm to 2 μm. In the presentapplication, other solid dispersions are preferably used also beingdispersed to the grain size within the range described above.

The nucleating agent in the invention can be added to an image forminglayer or a layer adjacent with image forming layer and it is preferablyadded to the image forming layer. The addition amount of the nucleatingagent to one mol of an organic solver salt is within a range 10⁻⁵ to 1mol and, preferably, 10⁻⁴ to 5×10⁻¹ mol. The nucleating agent may beadded alone or two or more agents may be used together.

In the photothermographic material according to the invention, the imageforming layer containing the light sensitive silver halide may have twoor more layers and, in a case of two or more of layers, they may containthe nucleating agent in any of the image forming layers. It preferablyhas at least two image forming layers, that is, an image forming layercontaining the nucleating agent and an image forming layer notcontaining the nucleating agent.

(Reducing Agent)

1) Infectious Developing Reducing Agent

The photothermographic material in the invention preferably contains ainfectious developing reducing agent. The infectious developing reducingagent may be any reducing agent so long as it has a function ofinfectious development.

Preferred infectious developing reducing agent usable in the inventionis the compound represented by the following formula (R1).

In the formula (R1), R¹¹ and R^(11′) each represents independently asecondary or tertiary alkyl group having 3 to 20 carbon atoms. R¹² andR^(12′) each represents independently a hydrogen atom or a groupconnected by way of a nitrogen, oxygen, phosphorous or sulfur atom. R¹³represents a hydrogen atom or an alkyl group having 1 to 20 carbonatoms.

The infectious developing reducing agent used in the invention isidentical with the compound described specifically in Japanese PatentApplication No. 2004-136062. Examples of the specific compoundsdescribed in the Application can also be mentioned as specific examplesof the nucleating agent in this embodiment.

Specific examples of the reducing agent represented by the formula (R1)according to the invention are shown below but the invention is notrestricted to them.

The addition amount of the reducing agent represented by the formula(R1) is preferably, from 0.01 g/m² to 5.0 g/m² and, more preferably from0.1 g/m² to 3.0 g/m². It is incorporated, preferably, by 5 mol % to 50mol % and incorporated, preferably from 10 mol % to 40 mol % based onone mol of silver in the surface having the image forming layer.

The reducing agent represented by the formula (R1) is preferablycontained in the image forming layer.

Particularly, the reducing agent represented by the formula (R1) ispreferably contained in the image forming layer containing a silverhalide emulsion at low sensitivity.

2) Reducing Agent

Other reducing agent may also be used together with the reducing agentrepresented by the formula (R1) in the invention. The reducing agentthat can be used together may be any material capable of reducing silverions into metal silver (preferably, organic material). Examples of thereducing agent are described in JP-A No. 11-65021, column Nos. 0043 to0045 and in EP-A No. 0803764, p. 7, line 34 to p. 18, line 12.

In this embodiment, preferred reducing agents for use in this embodimentare so-called hindered phenol type reducing agents having substituentsat the ortho positions of the phenolic hydroxyl group, or bisphenol typereducing agent. The compounds represented by the following formula (R)are particularly preferred.

where in the formula (R), R¹¹ and R^(11′) each independently representsan alkyl group having 1 to 20 carbon atoms; R¹² and R^(12′) eachindependently represents a hydrogen atom or a substituent substitutableon a benzene ring; L represents a —S— group or a —CHR¹³-group; R¹³represents a hydrogen atom or an alkyl group having 1 to 20 carbonatoms; and X¹ and X^(1′) each independently represents a hydrogen atomor a group substitutable on a benzene ring.

The respective substituents will be described in details.

1) R¹¹ and R^(11′)

R¹¹ and R^(11′) each independently represents a substituted orunsubstituted alkyl group having 1 to 20 carbon atoms. The substituentof the alkyl group has no particular restriction. Preferably, mentionmay be made of an aryl group, a hydroxy group, an alkoxy group, anaryloxy group, an alkylthio group, an arylthio group, an acylaminogroup, a sulfonamido group, a sulfonyl group, a phosphoryl group, anacyl group, a carbamoyl group, an ester group, a halogen atom, and thelike.

2) R¹² and R^(12′), and X¹ and X^(1′)

R¹² and R^(12′) each independently represents a hydrogen atom, or agroup substitutable on a benzene ring.

X¹ and X^(1′) also each independently represents a hydrogen atom, or agroup substitutable on a benzene ring. As the respective groupssubstitutable on a benzene ring, preferably, mention may be made of analkyl group, an aryl group, a halogen atom, an alkoxy group, and anacylamino group.

3) L

L represents a —S— group or a —CHR¹³— group. R¹³ represents a hydrogenatom or an alkyl group having 1 to 20 carbon atoms. The alkyl group mayhave a substituent. Specific examples of an unsubstituted alkyl group ofR¹³ may include: a methyl group, an ethyl group, a propyl group, a butylgroup, a heptyl group, an undecyl group, an isopropyl group, a1-ethylpentyl group, and a 2,4,4-trimethylpentyl group.

Examples of the substituent of an alkyl group may include the samegroups as for the substituent of R¹¹, and may include a halogen atom, analkoxy group, an alkylthio group, an aryloxy group, an arylthio group,an acylamino group, a sulfonamido group, a sulfonyl group, a phosphorylgroup, an oxycarbonyl group, a carbamoyl group, and a sulfamoyl group.

4) Preferred Substituents

R¹¹ and R^(11′) are preferably secondary or tertiary alkyl groups eachhaving 3 to 15 carbon atoms. Specifically, mention may be made of anisopropyl group, an isobutyl group, a t-butyl group, a t-amyl group, at-octyl group, a cyclohexyl group, a cyclopentyl group, a1-methycyclohexyl group, a 1-methylcyclopropyl group, and the like. R¹¹and R^(11′) are more preferably tertiary alkyl groups each having 4 to12 carbon atoms. Out of these, a t-butyl group, a t-amyl group, and a1-methylcyclohexyl group are further preferred, and a t-butyl group ismost preferred.

R¹² and R^(12′) are preferably alkyl groups each having 1 to 20 carbonatoms. Specific examples thereof may include: a methyl group, an ethylgroup, a propyl group, a butyl group, an isopropyl group, a t-butylgroup, a t-amyl group, a cyclohexyl group, a 1-methylcyclohexyl group, abenzyl group, a methoxymethyl group, and a methoxyethyl group. Morepreferred are a methyl group, an ethyl group, a propyl group, anisopropyl group, and a t-butyl group.

X¹ and X¹ are preferably hydrogen atoms, halogen atoms, or alkyl groups,and more preferably hydrogen atoms.

L is preferably a —CHR¹³— group.

R¹³ is preferably a hydrogen atom or an alkyl group having 1 to 15carbon atoms. The alkyl groups are preferably a methyl group, an ethylgroup, a propyl group, an isopropyl group, and a 2,4,4-trimethylpentylgroup. R¹³ is in particular preferably a hydrogen atom, a methyl group,a propyl group, or an isopropyl group.

When R¹³ is a hydrogen atom, R¹² and R^(12′) are preferably alkyl groupseach having 2 to 5 carbon atoms. An ethyl group and a propyl group aremore preferred, and an ethyl group is most preferred.

When R¹³ is a primary or secondary alkyl group having 1 to 8 carbonatoms, R¹² and R^(12′) are preferably methyl groups. The primary orsecondary alkyl group having 1 to 8 carbon atoms of R¹³ are morepreferably a methyl group, an ethyl group, a propyl group, or anisopropyl group, and further preferably a methyl group, an ethyl group,or a propyl group.

When all of R¹¹, R^(11′), R¹², and R^(12′) are methyl groups, R¹³ ispreferably a secondary alkyl group. In this case, the secondary alkylgroup of R¹³ is preferably an isopropyl group, an isobutyl group, and a1-ethylpentyl group, and more preferably an isopropyl group.

The reducing agent varies in various heat development performancesaccording to the combination of R¹¹, R^(11′), R¹², R^(12′), and R¹³. Itis possible to adjust these heat development performances by combiningtwo or more reducing agents in various mixing ratios. Therefore, thereducing agents are preferably used in combination of two or more kindsthereof according to the intended purpose.

Below, specific examples of the reducing agent of this embodimentincluding the compounds represented by the formula (R) will be shown,but the compounds of this embodiment is not limited thereto.

In particular, the compounds are preferably the compounds as shown in(R-1) to (R-20).

In this embodiment, the amount of the reducing agent to be added ispreferably 0.01 to 5.0 g/m², more preferably 0.1 to 3.0 g/m². Thereducing agent is contained in an amount of preferably 5 to 50 mol %,and further preferably 10 to 40 mol % per mole of silver in the sidehaving an image forming layer.

The reducing agent of this embodiment can be added to an image forminglayer containing an organic silver salt, and a light-sensitive silverhalide, and the adjacent layer. However, it is more preferablyincorporated in the image forming layer.

The reducing agent may be incorporated in the coating solution with anyprocess based on a solution form, an emulsified dispersion form, a solidfine particle dispersion form, or the like, and incorporated in thelight-sensitive material.

As a well-known emulsification dispersion method, mention may be made ofa method in which an emulsified dispersion is mechanically prepared bydissolving the reducing agent with an oil such as dibutylphthalate,tricresyl phosphate, glyceryl triacetate or diethyl phthalate and with aco-solvent such as ethyl acetate or cyclohexanone.

Whereas, as a solid fine particle dispersion method, mention may be madeof the following method. A reducing agent is dispersed in an appropriatesolvent such as water by means of a ball mill, a colloid mill, avibration ball mill, a sand mill, a jet mill, or a roller mill, orultrasonically, thereby to form a solid dispersion. A dispersion methodusing a sand mill is preferred. Incidentally, at this step, a protectivecolloid (e.g., polyvinyl alcohol), a surfactant (e.g., an anionicsurfactant such as sodium triisopropylnaphthalene sulfonate (a mixtureof those mutually different in substitution positions of three isopropylgroups) may also be used. An antiseptic agent (e.g., benzisothiazolinonesodium salt) can be incorporated in a water dispersion.

The solid particle dispersion method of the reducing agent isparticularly preferred. The reducing agent is preferably added in theform of fine particles with an average particle size of 0.01 μm to 10μm, preferably 0.05 μm to 5 μm, and more preferably 0.1 μm to 1 μm. Inthis application, other solid dispersions are also preferably dispersedin the form of particles having a size within this range, and used.

(Explanation of Development Accelerator)

For the photothermographic material of this embodiment, there arepreferably used, as development accelerators, the sulfonamidephenol typecompounds represented by the formula (A) described in JP-A-2000-267222and JP-A-2000-330234, the hindered phenol type compounds represented bythe formula (II) described in JP-A-2001-92075, the hydrazine typecompounds represented by the formula (I) described in JP-A-10-62895,JP-A-11-15116, and the like, and the formula (1) described in JapanesePatent Application No. 2001-074278, and the phenol type or naphtol typecompounds represented by the formula (2) described in Japanese PatentApplication No. 2000-76240. Each of these development accelerators isused in an amount in the range of 0.1 to 20 mol %, preferably in therange of 0.5 to 10 mol %, and more preferably in the range of 1 to 5 mol% based on the amount of the reducing agent. As a process forintroducing it into a light-sensitive material, mention may be made ofthe same process for the reducing agent. In particular, the developmentaccelerator is preferably added in the form of a solid dispersion or anemulsified dispersion. When it is added in the form of an emulsifieddispersion, it is preferably added in the form of an emulsifieddispersion obtained by dispersing the compound using a high boilingsolvent which is a solid at ordinary temperatures, and a low boilingco-solvent, or added in the form of a so-called oil-less emulsifieddispersion without using a high boiling solvent.

In this embodiment, out of the development accelerators, particularlypreferred are the hydrazine type compounds represented by the formula(1) described in Japanese Patent Application No. 2001-074278, and thephenol type or naphthol type compounds represented by the formula (2)described in Japanese Patent Application No. 2000-76240.

Below, preferred specific examples of the development accelerator ofthis embodiment will be shown. This embodiment is not limited to these.

(Explanation of Hydrogen Bonding Compound)

In this embodiment, when the reducing agent has an aromatic hydroxygroup (—OH) or an amino group, a non-reducible compound having a groupcapable of forming a hydrogen bond with the amino group is preferablyused in combination.

As the groups capable of forming a hydrogen bond, mention may be made ofa phosphoryl group, a sulfoxide group, a sulfonyl group, a carbonylgroup, an amido group, an ester group, an urethane group, an ureidogroup, a tertiary amino group, a nitrogen-containing aromatic group, andthe like. Out of these, preferred are a phosphoryl group, a sulfoxidegroup, an amido group (provided that it does not have an >N—H group, butis blocked like an >N—Ra (Ra is a substituent other than H)), anurethane group (provided that it does not have an >N—H group, but isblocked like an >N—Ra (Ra is a substituent other than H)), and an ureidogroup (provided that it does not have an >N—H group, but is blocked likean >N—Ra (Ra is a substituent other than H)).

In this embodiment, particularly preferred hydrogen bonding compoundsare the compounds represented by the following formula (D):

In the formula (D), R²¹ to R²³ each independently represents an alkylgroup, an aryl group, an alkoxy group, an aryloxy group, an amino group,or a heterocyclic group. These groups may be unsubstituted, or have asubstituent.

As the substituents when R²¹ to R²³ have substituents, mention may bemade of a halogen atom, an alkyl group, an aryl group, an alkoxy group,an amino group, an acyl group, an acylamino group, an alkylthio group,an arylthio group, a sulfonamido group, an acyloxy group, an oxycarbonylgroup, a carbamoyl group, a sulfamoyl group, a sulfonyl group, aphosphoryl group, and the like. A preferred substituent is an alkylgroup or an aryl group, examples of which may include: a methyl group,an ethyl group, an isopropyl group, a t-butyl group, a t-octyl group, aphenyl group, a 4-alkoxyphenyl group, and a 4-acyloxyphenyl group.

Specific examples of the alkyl group of R²¹ to R²³ may include: a methylgroup, an ethyl group, a butyl group, an octyl group, a dodecyl group,an isopropyl group, a t-butyl group, a t-amyl group, a t-octyl group, acyclohexyl group, a 1-methylcyclohexyl group, a benzyl group, aphenethyl group, and a 2-phenoxypropyl group.

Examples of an aryl group may include: a phenyl group, a cresyl group, axylyl group, a naphthyl group, a 4-t-butylphenyl group, a4-t-octylphenyl group, a 4-anisidyl group, and a 3,5-dichlorophenylgroup.

Examples of an alkoxy group may include: a methoxy group, an ethoxygroup, a butoxy group, an octyloxy group, a 2-ethylhexyloxy group, a3,5,5-trimethylhexyloxy group, a dodecyloxy group, a cyclohexyloxygroup, a 4-methylcyclohexyloxy group, and a benzyloxy group.

Examples of an aryloxy group may include: a phenoxy group, a cresyloxygroup, an isopropylphenoxy group, a 4-t-butylphenoxy group, a naphthoxygroup, and a biphenyloxy group.

Examples of an amino group may include: a dimethylamino group, adiethylamino group, a dibutylamino group, a dioctylamino group, anN-methyl-N-hexylamino group, a dicyclohexylamino group, a diphenylaminogroup, and an N-methyl-N-phenylamino group.

Each of R²¹ to R²³ is preferably an alkyl group, an aryl group, analkoxy group, or an aryloxy group. From the viewpoint of the effects ofthis embodiment, at least one of R²¹ to R²³ is preferably an alkyl groupor an aryl group, and two or more thereof are more preferably alkylgroups or aryl groups. Whereas, R²¹ to R²³ are preferably the samegroups from the viewpoint of the availability at a low cost.

Below, specific examples of the hydrogen bonding compounds including thecompound of the formula (D) in this embodiment will be shown, but thisembodiment is not limited thereto.

As the specific examples of the hydrogen bonding compound, other thanthe foregoing ones, mention may be made of those described in JapanesePatent Application Nos. 2000-192191 and 2001-194811.

The hydrogen bonding compound of this embodiment can be used in thelight-sensitive material by being incorporated into the coating solutionin solution form, in emulsified dispersion form, or in solid dispersedfine particle dispersion form in the same manner as with the reducingagent. The compound of this embodiment forms a complex by the hydrogenbond with a compound having a phenolic hydroxyl group in a solutionstate, so that it can be separated as a complex in a crystalline state,depending on the combination between the reducing agent and the compoundof the formula (A) of this embodiment.

It is particularly preferable for obtaining stable performances to usethe crystal powder thus separated in the form of a solid dispersed fineparticle dispersion. Further, methods of mixing the reducing agent withthe hydrogen bonding compound of this embodiment in a powder state, andthen causing the formation of a complex during dispersing by means of asand grinder mill, or the like with an appropriate dispersing agent canalso preferably be used.

It is preferable that the hydrogen bonding compound of this embodimentis used in an amount of preferably in the range of 1 to 200 mol %, morepreferably in the range of 10 to 150 mol %, and further preferably inthe range of 30 to 100 mol % based on the amount of the reducing agent.

(Explanation of Binder)

The binder in the organic silver salt-containing layer of thisembodiment may be any polymer. Preferred binders are transparent orsemi-transparent, and generally colorless, and include natural resins,or polymers and copolymers, synthetic resins, or polymers andcopolymers, and other media which form a film, such as gelatins,rubbers, poly(vinyl alcohol)s, hydroxyethyl celluloses, celluloseacetates, cellulose acetate butylates, poly(vinylpyrrolidone)s, casein,starch, poly(acrylic acid)s, poly(methylmethacrylic acid)s, poly(vinylchloride)s, poly(methacrylic acid)s, styrene-maleic anhydridecopolymers, styrene-acrylonitrile copolymers, styrene-butadienecopolymers, poly(vinyl acetal)s (e.g., poly(vinyl formal) and poly(vinylbutyral)), poly(ester)s, poly(urethane)s, phenoxy resins,poly(vinylidene chloride)s, poly(epoxide)s, poly(carbonate)s, poly(vinylacetate)s, poly(olefin)s, cellulose esters, and poly(amide)s. Thebinders may be coated for formation from water or an organic solvent, oran emulsion.

In this embodiment, the glass transition temperature of the binder inthe organic silver salt-containing layer is preferably 10° C. or moreand 80° C. or less, more preferably 20° C. to 70° C., and furtherpreferably 23° C. or more and 65° C. or less.

Incidentally, in this specification, the Tg is calculated with thefollowing equation.1/Tg=Σ(Xi/Tgi)

In this case, it is assumed that the polymer is formed bycopolymerization of n monomer components from i=1 to n. Xi denotes theweight ratio of the i-th monomer (ΣXi=1), and Tgi denotes the glasstransition temperature (an absolute temperature) of the homopolymer ofthe i-th monomer, provided that Σ is the sum for from i=1 to i=n.

Incidentally, for the value (Tgi) of the glass transition temperature ofthe homopolymer of each monomer, the values described in PolymerHandbook, (3rd Edition) (written by J. Brandrup and E. H. Immergut,(Willey-interscience, 1989)), have been adopted.

The binders may be used alone, or, if required, in combination of two ormore thereof. Alternatively, the one having a glass transitiontemperature of 20° C. or more and the one having a glass transitiontemperature of lower than 20° C. may also be used in combination. Whentwo or more kinds of polymers having different Tg values are blended tobe used, it is preferable that the weight average Tg thereof fallswithin the foregoing range.

In this embodiment, the performances are improved when coating isperformed with a coating solution in which 30 mass % (weight %) or moreof the solvent is water, followed by drying to form the organic silversalt-containing layer, further when the binder in the organic silversalt-containing layer is soluble or dispersible in an aqueous solvent (awater solvent), and, in particular, when the binder comprises a latex ofpolymer having an equilibrium moisture content at 25° C. and 60% RH of 2mass % or less.

The most preferable form is such that preparation has been performed soas to obtain an ionic conductivity of 2.5 mS/cm or less. For such apreparation method, mention may be made of a purification treatmentmethod using a functional membrane for separation after synthesizing apolymer.

The aqueous solvent mentioned here in which the polymer is soluble ordispersible means water or a mixture of water and a water-miscibleorganic solvent in an amount of 70 mass % or less.

Examples of the water-miscible organic solvent may include: alcohol typesolvents such as methyl alcohol, ethyl alcohol, and propyl alcohol,cellosolve type solvents such as methyl cellosolve, ethyl cellosolve,and butyl cellosolve, ethyl acetate, and dimethyl formamide.

Whereas, “the equilibrium moisture content at 25° C. and 60% RH” can beexpressed by using the weight W1 of a polymer in an equilibrium withmoisture conditioning under an atmosphere of 25° C. and 60% RH, and theweight W0 of a polymer in an absolutely dry state, as the followingequation.Equilibrium moisture content at 25° C. and 60%RH=[(W1−W0)/W0]×100(mass%)

As for the definition and the measurement method of moisture content,for example, Polymer Engineering Course 14, (Kobunshi Kougaku Kouza 14)Testing Methods of Polymer Materials, (compiled by the Society ofPolymer Science of Japan, Chijin Shokan) can serve as a reference.

The equilibrium moisture content at 25° C. and 60% RH of the binderpolymer of this embodiment is preferably 2 mass % or less, morepreferably 0.01 mass % or more and 1.5 mass % or less, and furthermorepreferably 0.02 mass % or more and 1 mass % or less.

The binder of this embodiment is in particular preferably a polymerdispersible in an aqueous solvent is particularly preferred. Examples ofthe dispersion state may include the dispersion state for a latex inwhich fine particles of a water-insoluble and hydrophobic polymer aredispersed, or the dispersion state for the one in which polymermolecules are dispersed in a molecular state or a micelle-forming state,and any of these is preferred. The average particle diameter ofdispersed particles is in the range of about 1 to 50000 nm, and morepreferably 5 to 1000 nm. The particle diameter distribution of thedispersed particles has no particular restriction. Both of dispersedparticles having a broad particle diameter distribution or dispersedparticles having a monodisperse particle diameter distribution areacceptable.

In this embodiment, as the preferred embodiments of the polymerdispersible in an aqueous solvent, hydrophobic polymers such as acrylicpolymers, poly(ester)s, rubbers (e.g., SBR resins), poly(urethane)s,poly(vinyl chloride)s, poly(vinyl acetate)s, poly(vinylidene chloride)s,and poly(olefin)s can preferably be used. These polymers may be straightchain polymers or branched chain polymers, and may be cross-linkedpolymers, so-called homopolymers in which a single kind of monomers arepolymerized, or copolymers in which two or more kinds of monomers arepolymerized. For a copolymer, it may be either of a random copolymer ora block copolymer.

Each molecular weight of these polymers is 5,000 to 1,000,000, andpreferably 10,000 to 200,000 in terms of the number average molecularweight. When a polymer having a too small molecular weight is used, themechanical strength of the resulting emulsion layer is insufficient. Toolarge molecular weight unfavorably results in poor film formingproperty.

Specific examples of a preferred latex may include the following ones.Below, they are expressed with the raw material monomers. Each numericalvalue parenthesized denotes the amount in terms of mass %, and themolecular weights are the number average molecular weights. Whenmulti-functional monomers have been used, the concept of molecularweight can not be applied, because crosslinked structures are formed.Accordingly, such a case is described as “crosslinkable” to omit thedescription of molecular weight. Tg denotes the glass transitiontemperature.

-   P-1; Latex of -MMA(70)-EA(27)-MAA(3)-(molecular weight: 37000, Tg:    61° C.)-   P-2; Latex of -MMA(70)-2EHA(20)-St(5)-AA(5)-molecular weight: 40000,    Tg: 59° C.)-   P-3; Latex of -St(50)-Bu(47)-MMA(3)-(crosslinkable, Tg: −17° C.))-   P-4; Latex of -St(68)-Bu(29)-AA(3)-(crosslinkable, Tg: 17° C.))-   P-5; Latex of -St(71)-Bu(26)-AA(3)-(crosslinkable, Tg: 24° C.)-   P-6; Latex of -St(70)-Bu(27)-IA(3)-(crosslinkable)-   P-7; Latex of -St(75)-Bu(24)-AA(1)-(crosslinkable, Tg: 29° C.)-   P-8; Latex of -St(60)-Bu(35)-DVB(3)-MAA(2)-(crosslinkable)-   P-9; Latex of -St(70)-Bu(25)-DVB(2)-AA(3)-(crosslinkable)-   P-10; Latex of -VC(50)-MMA(20)-EA(20)-AN(5)-AA(5)-(molecular weight:    80000)-   P-11; Latex of -VDC(85)-MMA(5)-EA(5)-MAA(5)-(molecular weight:    67000)-   P-12; Latex of -Et(90)-MAA(10)-(molecular weight: 12000)-   P-13; Latex of -St(70)-2EHA(27)-AA(3)-(molecular weight: 130000, Tg:    43° C.))-   P-14; Latex of -MMA(63)-EA(35)-AA(2)-(molecular weight: 33000, Tg:    47° C.)-   P-15; Latex of -St(70.5)-Bu(26.5)-AA(3)-(crosslinkable, Tg: 23° C.)-   P-16; Latex of -St(69.5)-Bu(27.5)-AA(3)-(crosslinkable, Tg: 20.5°    C.)-   P-17; Latex of -St (61.3)-isoprene (35.5)-AA(3)-(crosslinkable, Tg:    17° C.)-   P-18; Latex of -St(67)-isoprene(28)-Bu(2)-AA(3)-(crosslinkable, Tg:    27° C.)

The abbreviations of the foregoing structures denote the followingmonomers. MMA; methyl methacrylate, EA; ethyl acrylate, MAA; methacrylicacid, 2EHA; 2-ethylhexyl acrylate, St; styrene, Bu; butadiene, AA;acrylic acid, DVB; divinylbenzene, VC; vinyl chloride, AN;acrylonitrile, VDC: vinylidene chloride, Et; ethylene, and IA; itaconicacid.

The foregoing polymer latexes are also commercially available, and thefollowing polymers are available. Examples thereof may include: acrylicpolymers such as CEVIAN A-4635, 4718, and 4601 (all manufactured byDAICEL Chemical Industries, Ltd), and Nipol Lx811, 814, 821, 820, and857 (all manufactured by Nippon Zeon Co., Ltd.); poly(ester)s such asFINETEX ES650, 611, 675, and 850 (all manufactured by Dai-Nippon Ink &Chemicals, Inc., Ltd.), WD-size, and WMS (both manufactured by EastmanChemical); poly(urethane)s such as HYDRAN AP10, 20, 30, and 40 (allmanufactured by Dai-Nippon Ink & Chemicals, Inc., Ltd.); rubbers such asLACSTAR 7310K, 3307B, 4700H, and 7132C (all manufactured by Dai-NipponInk & Chemicals, Inc., Ltd.), and Nipol Lx416, 410, 438, and 2507 (allmanufactured by Nippon Zeon Co., Ltd.); (vinyl chloride)s such as G351and G576 (both manufactured by Nippon Zeon Co., Ltd.); (vinylidenechloride)s such as L502 and L513 (both manufactured by Asahi ChemicalIndustry Co., Ltd); and poly(olefin)s such as CHEMIPEARL S120 and SA100(both manufactured by Mitsui Photochemical Industries Ltd.).

These polymer latexes may be used alone, or if required, in a blend oftwo or more thereof.

As the polymer latex used in this embodiment, a latex ofstyrene-butadiene copolymer or a latex of styrene-isoprene copolymer isparticularly preferred. The weight ratio between the monomer unit ofstyrene and the monomer unit of butadiene in the styrene-butadienecopolymer is preferably 40:60 to 95:5. Further, the proportion of thestyrene monomer unit and the butadiene monomer unit in the copolymer ispreferably 60 to 99 mass %. A preferred range of the molecular weight isidentical with that described above.

The polymer latex in the invention contains acrylic acid or methacrylicacid, preferably, by 1 mass % to 6 mass % and, more preferably, 2 mass %to 5 mass % to the sum of styrene and butadiene and, more preferably,contains 2 mass % to 5 mass %.

The polymer latex of the invention preferably contains acrylic acid. Apreferred range of the molecular weight is identical with that describedabove. Further, the ratio of copolymerization in the styrene-isoprenecopolymer, etc. is identical with that in the case of styrene andbutadiene copolymer.

The styrene-butadiene copolymer latex to be used preferably in thisembodiment can include P-3 to P-9 and 15, and commercially availableproducts, LACSTAR-3307B and -7132C, Nipol Lx416, and the like. Examplesof styrene-isoprene copolymer can include P-17, P-18 described above.

To an organic silver salt-containing layer of the light-sensitivematerial of this embodiment, if required, a hydrophilic polymer such asgelatin, polyvinyl alcohol, methyl cellulose, hydroxypropyl cellulose,or carboxymethyl cellulose may also be added.

The amount of the hydrophilic polymer to be added is 30 mass % or less,and more preferably 20 mass % or less based on the total amount of thebinder in the organic silver salt-containing layer.

The organic silver salt-containing layer (i.e., image-forming layer) ofthis embodiment is preferably the one formed using a polymer latex for abinder. The amount of binder in the organic silver salt-containing layeris such that the weight ratio of total binder/organic silver salt fallswithin a range of 1/10 to 10/1, and furthermore preferably in the rangeof 1/5 to 4/1.

Further, such an organic silver salt-containing layer is also, ingeneral, the light-sensitive layer (emulsion layer) containinglight-sensitive silver halide which is a light-sensitive silver salt.The weight ratio of total binder/silver halide in such a case ispreferably in the range of 400 to 5, and more preferably 200 to 10.

The total amount of binder in the image-forming layer of this embodimentis in the range of preferably 0.2 to 30 g/m², and more preferably 1 to15 g/m². To the image-forming layer of this embodiment, a crosslinkingagent for crosslinking, a surfactant for improving the coatability, andthe like may also be added.

In this embodiment, the solvent of the coating solution of an organicsilver salt-containing layer of the light-sensitive material (herein,for simplification, solvents and dispersion media are both togetherreferred to as solvents) is preferably an aqueous solvent containingwater in an amount of 30 mass % or more. As a component except forwater, a given water-miscible organic solvent such as methyl alcohol,ethyl alcohol, isopropyl alcohol, methyl cellosolve, ethyl cellosolve,dimethylformamide, or ethyl acetate may also be used. The water contentof the solvent is more preferably 50 mass % or more, and furtherpreferably 70 mass % or more.

Specific preferred examples of the solvent composition include, otherthan water 100, water/methyl alcohol=90/10, water/methyl alcohol=70/30,water/methyl alcohol/dimethylformamide=80/15/5, water/methylalcohol/ethyl cellosolve=85/10/5, and water/methyl alcohol/isopropylalcohol=85/10/5, (each numerical value is expressed in terms of mass %).

(Explanation of Anti-Fogging Agent)

In this embodiment, as an anti-fogging agent, the compound representedby the following formula (H) is preferably contained:Q-(Y)n-C(Z₁)(Z₂)X  Formula (H)

In the formula (H), Q denotes an alkyl group, an aryl group, or aheterocyclic group, Y denotes a divalent linking group, n denotes 0 or1, Z₁ and Z₂ denote halogen atoms, and X denotes a hydrogen atom or anelectron-attracting group.

Q denotes a phenyl group substituted by an electron-attracting group inwhich preferably the Hammet's substituent constant σp takes on apositive value. With regard to the Hammett's substituent constant,Journal of Medicinal Chemistry, 1973, Vol. 16, No. 11, pp. 1207 to 1216,or the like can serve as a reference.

Examples of such an electron-attracting group may include: a halogenatom (fluorine atom (σp value: 0.06), chlorine atom (σp value: 0.23),bromine atom (σp value: 0.23), iodine atom (σp value: 0.18),trihalomethyl groups (tribromomethyl (σp value: 0.29), trichloromethyl(σp value: 0.33), and trifluoromethyl (σp value: 0.54)), a cyano group(σp value: 0.66), a nitro group (σp value: 0.78), an aliphatic-aryl orheterocyclic sulfonyl group (e.g., methanesulfonyl (σp value: 0.72)), analiphatic-aryl or heterocyclic acyl group (e.g., acetyl (σp value:0.50), benzoyl (σp value: 0.43)), an alkynyl group (e.g., C≡CH (σpvalue: 0.23)), aliphatic-aryl or heterocyclic oxycarbonyl groups (e.g.,methoxycarbonyl (σp value: 0.45) and phenoxycarbonyl (σp value: 0.44)),a carbamoyl group (σp value: 0.36), a sulfamoyl group (σp value: 0.57),a sulfoxide group, a heterocyclic group, and a phosphoryl group.

The σp value is preferably in the range from 0.2 to 2.0, and morepreferably in the range from 0.4 to 1.0.

Preferred electron-attracting groups are a carbamoyl group, analkoxycarbonyl group, an alkylsulfonyl group, an alkylphosphoryl group,a carboxyl group, an alkyl or aryl carbonyl group, and an arylsulfonylgroup. A carbamoyl group, an alkoxycarbonyl group, an alkylsulfonylgroup and an alkylphosphoryl group are particularly preferred. Acarbamoyl group is most preferred.

X is preferably an electron-attracting group, and more preferably ahalogen atom, an aliphatic-aryl or heterocyclic sulfonyl group, analiphatic-aryl or heterocyclic acyl group, an aliphatic-aryl orheterocyclic oxycarbonyl group, a carbamoyl group, or a sulfamoyl group.In particular, a halogen atom is preferred.

Out of the halogen atoms, a chlorine atom, a bromine atom, and an iodineatom are preferred, a chlorine atom and a bromine atom are morepreferred, and a bromine atom is particularly preferred.

Y preferably denotes —C(═O)—, —SO—, or —SO₂—, more preferably —C(═O)— or—SO₂—, and in particular preferably —SO₂—. n denotes 0 or 1, andpreferably 1.

Below, specific examples of the compound of the formula (H) of thisembodiment will be shown. However, this embodiment is not limitedthereto.

The compound represented by the formula (H) of this embodiment is usedin an amount of, preferably in the range of 10⁻⁴ to 0.8 mol, morepreferably in the range of 10⁻³ to 0.1 mol, and furthermore preferablyin the range of 5×10⁻³ mol to 0.05 mol per mole of non-light-sensitivesilver salt in the image-forming layer.

Particularly, when a silver halide of a composition with a high silveriodide content of this embodiment is used, the amount of the compound ofthe formula (H) to be added is important in order to obtain a sufficientanti-fogging effect. The compound is most preferably used in an amountin the range of 5×10⁻³ to 0.03 mol.

In this embodiment, as a method for incorporating the compoundrepresented by the formula (H) into a light-sensitive material, mentionmay be made of the method described in connection with the incorporationmethod of the reducing agent.

The melting point of the compound represented by the formula (H) ispreferably 200° C. or less, and further preferably 170° C. or less.

As other organic polyhalogen compounds for use in this embodiment,mention may be made of the ones disclosed in the patent described inparagraph Nos. 0111 to 0112 of JP-A-11-65021. Particularly preferred arethe organic halogen compounds represented by the formula (P) in JapanesePatent Application No. 11-87297, the organic polyhalogen compoundsrepresented by the formula (II) in JP-A-10-339934, and the organicpolyhalogen compounds described in Japanese Patent Application No.11-205330.

(Other Anti-Fogging Agents)

As other anti-fogging agent, mention maybe made of mercury (II) salt inparagraph No. 0113 of JP-A-11-65021, benzoic acids in paragraph No.0114, ibid., salicylic acid derivatives in JP-A-2000-206642, formalinscavenger compounds represented by the formula (S) in JP-A-2000-221634,triazine compounds according to claim 9 of JP-A-11-352624, the compoundsrepresented by the formula (III) in JP-A-6-11791,4-hydroxy-6-methyl-1,3,3a,7-tetrazaindene, and the like.

As anti-fogging agents, stabilizers and stabilizer precursors usable inthis embodiment, mention may be made of the ones of patent described inparagraph No. 0070 of JP-A-10-62899, and from page 20, line 57 to page21, line 7 of EP No. 0803764A1, and the compounds described inJP-A-9-281637 and JP-A-9-329864.

The photothermographic material in this embodiment may contain anazolium salt for the purpose of inhibiting fogging. As the azoliumsalts, mention may be made of the compounds represented by the formula(XI) described in JP-A-59-193447, the compounds described inJP-B-55-12581, and the compounds represented by the formula (II)described in JP-A-60-153039. The azolium salt may be added to thelight-sensitive material at any site. As for the addition layer, theazolium salt is preferably added to the layer on the side having alight-sensitive layer, and more preferably added to an organic silversalt-containing layer.

The timing of adding an azolium salt may be during any steps of thepreparation of a coating solution. When the azolium salt is added in theorganic silver salt-containing layer, the timing may be during any stepsbetween the preparation of the organic silver salt and the preparationof the coating solution, and it is preferably from after the preparationof the organic silver salt until immediately before coating. The azoliumsalt may be added by any process in which it is added in the form of apowder, a solution a fine particle dispersion, or the like.Alternatively, it may also be added in the form of a solution of mixturewith other additives such as a sensitizing dye, a reducing agent, and atoning agent.

The amount of the azolium salt to be added in this embodiment may be anyamount. However, it is preferably 1×10⁻⁶ mol or more and 2 mol or less,and more preferably 1×10⁻³ mol or more and 0.5 mol or less per mole ofsilver.

(Other Additives)

1) Mercapto, Disulfide, and Thiones

The photothermographic material of this embodiment may contain amercapto compound, a disulfide compound, or a thione compound in orderto inhibit or accelerate development, thereby controlling thedevelopment, to enhance the spectral sensitization efficiency, toimprove the storability before and after development, or for otherpurposes. Examples thereof include the compounds disclosed in paragraphNos. 0067 to 0069 of JP-A-10-62899, the compounds represented by theformula (I), and the specific examples thereof described in paragraphNos. 0033 to 0052 of JP-A-10-186572, those described on page 20, lines36 to 56 of EP No. 0803764A1, Japanese Patent Application No. 11-273670,and the like. Out of these, the mercapto-substituted heterocyclicaromatic compounds are preferred.

2) Toning Agent

In the photothermographic material of this embodiment, it is preferableto add a toning agent. The toning agent is described in paragraph Nos.0054 to 0055 of JP-A-10-62899, on page 21, lines 23 to 48 of EP No.0803764A1, JP-A-2000-356317, and Japanese Patent Application No.10-187298. In particular, preferred are phthalazinones (phthalazinone,phthalazinone derivatives, or metal salts; e.g.,4-(1-naphthyl)phthalazinone, 6-chlorophthalazinone,5,7-dimethoxyphthalazinone, and 2,3-dihydro-1,4-phthalazinedion);combinations of phthalazinones and phthalic acids (e.g., phthalic acid,4-methylphthalic acid, 4-nitrophthalic acid, diammonium phthalate,sodium phthalate, potassium phthalate, and tetrachlorophthalicanhydride); phthalazines (phthalazine, phthalazine derivatives, or metalsalts; e.g., 4-(1-naphthyl) phthalazine, 6-isopropyl phthalazine,6-t-butyl phthalazine, 6-chlorophthalazine, 5,7-dimethoxy phthalazine,and 2,3-dihydrophthalazine). Particularly, in the combinations withsilver halides of a composition having a high silver iodide content, thecombinations of phthalazines and phthalic acids are preferred.

The amount of phthalazines to be added is preferably 0.01 mol to 0.3mol, more preferably 0.02 to 0.2 mol, and in particular preferably 0.02to 0.1 mol per mole of an organic silver salt. This amount is animportant factor for development acceleration which is an object for thesilver halide emulsion of a composition with a high silver iodidecontent of this embodiment. Proper selection of the amount can implementboth the sufficient developability and the low fogging.

3) Plasticizer and Lubricant

The plasticizers and the lubricants usable for the light-sensitive layerof this embodiment are described in paragraph No. 0117 of JP-A-11-65021.The slipping agents are described in paragraph Nos. 0061 to 0064 ofJP-A-11-84573 and paragraph Nos. 0049 to 0062 of Japanese PatentApplication No. 11-106881.

4) Dye and Pigment

For the light-sensitive layer of this embodiment, various dyes andpigments (e.g., C.I. Pigment Blue 60, C.I. Pigment Blue 64, and C.I.Pigment Blue 15:6) can be used from the viewpoints of improving thecolor tone, preventing the formation of interference fringes duringlaser exposure, and preventing the irradiation. These are described indetails in WO98/36322, JP-A-10-268465, and JP-A-11-338098.

5) Ultrahigh Contrast Agent

For the formation of an ultrahigh contrast image suitable for printingplate making, an ultrahigh contrast agent is preferably added to theimage forming layer. The ultrahigh contrast agents, the incorporationprocess, and the amount thereof are described in paragraph No. 0118 ofJP-A-11-65021, paragraph Nos. 0136 to 0193 of JP-A-11-223898, as thecompounds of the formula (H), formulae (1) to (3), and formulae (A) and(B) of Japanese Patent Application No. 11-87297, and as the compounds ofthe formulae (III) to (V) described in Japanese Patent Application No.11-91652 (specific compounds: chemical formulae 21 to 24). The hardnessenhancement promoters are described in paragraph No. 0102 ofJP-A-11-65021, and paragraph Nos. 0194 and 0195 of JP-A-11-223898.

In order to use formic acid or a formic acid salt as a strongly foggingsubstance, it is preferably contained on the side having theimage-forming layer containing a light-sensitive silver halide in anamount of 5 mmol or less, and more preferably 1 mmol or less, per moleof silver.

When an ultrahigh contrast agent is used in the photothermographicmaterial of this embodiment, an acid formed by hydration of diphosphoruspentoxide or a salt thereof is preferably used in combination. Examplesof the acid formed by hydration of diphosphorus pentoxide or a saltthereof may include metaphosphoric acid (salt), pyrophosphoric acid(salt), orthophosphoric acid (salt), triphosphoric acid (salt),tetraphosphoric acid (salt), and hexametaphosphoric acid (salt).Examples of acids formed by hydration of diphosphorus pentoxide or saltsthereof, to be in particular preferably used may include orthophosphoricacid (salt) and hexametaphosphoric acid (salt). Specific examples of thesalt include sodium orthophosphate, sodium dihydrogen orthophosphate,sodium hexametaphosphate, and ammonium hexametaphosphate.

The amount of the acid formed by hydration of diphosphorus pentoxide ora salt thereof to be added (the coating amount per square meter of thelight-sensitive material) may be a desired amount according to theperformances including sensitivity, fog, and the like. However, it ispreferably 0.1 to 500 mg/m², and more preferably 0.5 to 100 mg/m².

[Preparation of Coating Solution and Coating]

The preparation temperature of the image-forming layer coating solutionof this embodiment is preferably 30° C. or more and 65° C. or less. Themore preferable temperature is 35° C. or more and less than 60° C. Thefurthermore preferable temperature is 35° C. or more and 55° C. or less.Whereas, the temperature of the image forming layer coating solutionimmediately after the addition of a polymer latex is preferably kept at30° C. or more and 65° C. or less.

2. Layer Configuration and other Layer Components

The photothermographic material of this embodiment may have anon-light-sensitive layer in addition to the image forming layer. Thenon-light-sensitive layers can be classified according to theirpositions into (a) a surface protective layer to be provided on theimage forming layer (on the side more distant from the support); (b) anintermediate layer to be provided between a plurality of image forminglayers or between the image forming layer and a protective layer; (c) anundercoat layer to be provided between the image forming layer and asupport; and (4) a back layer to be provided on the side opposite to theimage forming layer.

Further, a layer serving as an optical filter may be provided, and itmay be provided as the layer (a) or (b). An antihalation layer isprovided in the light-sensitive material as the layer (c) or (d).

1) Surface Protective Layer

The photothermographic material in this embodiment may be provided witha surface protective layer for the purpose of preventing adhesion of theimage forming layer, and for other purposes. The surface protectivelayer may be formed in a monolayered structure or in a multilayeredstructure. The surface protective layer is described in paragraph Nos.0119 to 0120 of JP-A-11-65021, and Japanese Patent Application No.2000-17936.

As the binder for the surface protective layer of this embodiment,gelatin is preferred. It is also preferably to use polyvinyl alcohol(PVA), or to use it in combination. Usable gelatin is inert gelatin(e.g., Nitta gelatin 750), phthalated gelatin (e.g., Nitta gelatin 801),or the like.

As PVA, mention may be made of the ones described in paragraph Nos. 0009to 0020 of JP-A-2000-171936. Preferably, mention may be made of PVA-105of a completely saponified product, PVA-205 and PVA-335 of partiallysaponified products, and MP-203 of modified polyvinyl alcohol (all aretrade names from Kuraray Co., Ltd.), and the like.

The coating amount (per square meter of the support) of polyvinylalcohol of the protective layer (per one layer) is preferably 0.3 to 4.0g/m², and more preferably 0.3 to 2.0 g/m².

The coating amount (per square meter of the support) of the total binder(including a water-soluble polymer and a latex polymer) of theprotective layer (per one layer) is preferably 0.3 to 5.0 g/m², and morepreferably 0.3 to 2.0 g/m².

2) Antihalation Layer

In the photothermographic material of this embodiment, an antihalationlayer can be disposed in a distant position from an exposure lightsource relative to the light-sensitive layer. The antihalation layer isdescribed in paragraph Nos. 0123 to 0124 of JP-A-11-65021,JP-A-11223898, JP-A-9-230531, JP-A-10-36695, JP-A-10-104779,JP-A-11-231457, JP-A-11-352625, JP-A-11-352626, and the like.

The antihalation layer contains an antihalation dye having an absorptionin the exposure wavelength. When the exposure wavelength falls withinthe infrared region, an infrared-absorbing dye is desirably used. Insuch a case, the dye having no absorption in the visible region ispreferred.

When antihalation is achieved using a dye having an absorption in thevisible region, it is preferably configured such that the color of thedye will not substantially remain after image formation; a means forperforming decolorizing by the heat from heat development is preferablyused; and in particular, a heat decolorizable dye and a base precursorare preferably added to a non-light-sensitive layer so that the layerfunctions as an antihalation layer. These techniques are described inJP-A-11-231457, and the like.

The amount of the decolorizable dye to be added is determined accordingto the intended purpose of the dye. In general, the dye is used in anamount such that the optical density (absorbance) measured at anintended wavelength is more than 0.1. The optical density is preferably0.2 to 2. The amount of the dye to be used for obtaining such an opticaldensity is generally about 0.001 to about 1 g/m².

Incidentally, when the dye is decolorized in this manner, it is possibleto lower the optical density after heat development to 0.1 or less. Twoor more kinds of decolorizable dyes may also be used in combination inthe heat decolorizing type recording materials or the photothermographicmaterials. Similarly, two or more kinds of base precursors may also beused in combination.

In heat decolorization using such a decolorizable dye and the baseprecursor, it is preferable to use a substance (e.g., diphenylsulfone,or 4-chlorophenyl (phenyl) sulfone) which decreases the melting point by3° C. or more when mixed with the base precursor as described inJP-A-11-352626, in combination, from the viewpoint of the heatdecolorization property, and the like.

3) Back Layer

The back layer applicable to this embodiment is described in paragraphNos. 0128 to 0130 of JP-A-11-65021.

In this embodiment, a coloring agent having an absorption maximum at 300to 450 nm can be added for the purposes of improving the silver colortone, and the change with time of images. Such coloring agents aredescribed in JP-A-62-210458, JP-A-63-104046, JP-A-63-103235,JP-A-63-208846, JP-A-63-306436, JP-A-63-314535, JP-A-01-61745, andJapanese Patent Application No. 11-276751, and the like. Such a coloringagent is generally added in an amount in the range of 0.1 mg/m² to 1g/m². As a layer to which it is added, a back layer disposed on theopposite side of the light-sensitive layer is preferred.

4) Matting Agent

In this embodiment, it is preferable to add a matting agent to thesurface protective layer and the back layer for improving thetransportability. The matting agents are described in paragraph Nos.0126 to 0127 of JP-A-11-65021.

The matting agent is coated in an amount of preferably 1 to 400 mg/m²,and more preferably 5 to 300 mg/m² when expressed in terms of thecoating amount per square meter of the light-sensitive material.

Further, any matting degree of the emulsion surface is acceptable solong as stardust defects resulting in small spots on the image portionand leading to light leakage will not occur. However, Bekk smoothness ispreferably 30 seconds or more and 2000 seconds or less, and inparticular preferably 40 seconds or more and 1500 seconds or less. Bekksmoothness can be determined with ease by Japanese Industrial Standard(JIS) P8119 “Testing Method for Smoothness of Paper and Paperboard byBekk Tester” and TAPPI Standard Method T479.

As the matting degree of the back layer in this embodiment, the Bekksmoothness is preferably 1200 seconds or less and 10 seconds or more,more preferably 800 seconds or less and 20 seconds or more, andfurthermore preferably 500 seconds or less and 40 seconds or more.

In this embodiment, the matting agent is preferably contained in theoutermost surface layer or a layer functioning as the outermost surfacelayer of the light-sensitive material, or in a layer near the outersurface thereof, or preferably contained in a layer serving as aso-called protective layer.

5) Polymer Latex

A polymer latex can be added to the surface protective layer and theback layer of this embodiment.

Such a polymer latex is described in Gosei Jushi Emulsion, (compiled byTaira Okuda and Hiroshi Inagaki, issued by Kobunshi Kanko Kai (1978));Gosei Latex no Oyo, (compiled by Takaaki Sugimura, Yasuo Kataoka,Souichi Suzuki, and Keishi Kasahara, issued by Kobunshi Kanko Kai(1993)); Gosei Latekkusu No Kagaku (written by Soichi Muroi, issued byKobunshi Kanko Kai (1970)), and the like. Specific example thereof mayinclude latex of methyl methacrylate (33.5 mass %)/ethyl acrylate (50mass %)/methacrylic acid (16.5 mass %) copolymer, latex of methylmethacrylate (47.5 mass %)/butadiene (47.5 mass %)/itaconic acid (5 mass%) copolymer, latex of ethyl acrylate/methacrylic acid copolymer, latexof methyl methacrylate (58.9 mass %)/2-ethylhexyl acrylate (25.4 mass%)/styrene (8.6 mass %)/2-hydroxyethyl methacrylate (5.1 mass %)/acrylicacid (2.0 mass %) copolymer, and latex of methyl methacrylate (64.0 mass%)/styrene (9.0 mass %)/butyl acrylate (20.0 mass %)/2-hydroxyethylmethacrylate (5.0 mass %)/acrylic acid (2.0 mass %) copolymer.

The polymer latex is used in an amount of preferably 10 mass % to 90mass %, and in particular preferably 20 mass % to 80 mass % of the totalbinders (including the water-soluble polymer and the latex polymer) ofthe surface protective layer or the back layer.

6) Film Surface pH

The photothermographic material of this embodiment preferably has a filmsurface pH of 7.0 or less, and more preferably 6.6 or less, before heatdevelopment processing. The film surface pH has no particularrestriction on the lower limit, but it is about 3. The pH is mostpreferably in the range of 4 to 6.2.

For controlling the film surface pH, an organic acid such as a phthalicacid derivative or a nonvolatile acid such as sulfuric acid, and avolatile base such as ammonia are preferably used from the viewpoint ofreducing the film surface pH. In particular, ammonia is preferred toachieve a low film surface pH, because it tends to volatilize, andtherefore it can be removed before the coating step or heat development.Whereas, the process in which a nonvolatile base such as sodiumhydroxide, potassium hydroxide, or lithium hydroxide and ammonia areused in combination is also preferably employed. Incidentally, a methodfor measuring the film surface pH is described in paragraph No. 0123 ofJapanese Patent Application No. 11-87297.

7) Hardening Agent

A hardening agent may also be used for respective layers such as thelight-sensitive layer, the protective layer, and the back layer of thisembodiment.

Examples of the hardening agent are mentioned in each method describedin, THE THEORY OF THE PHOTOGRAPHIC PROCESS, FOURTH EDITION, written byT. H. James, (published by Macmillan Publishing Co., Inc., published in1977), pp. 77–87. Other than chrome alum,2,4-dichloro-6-hydroxy-s-triazine sodium salt,N,N-ethylenebis(vinylsulfonacetamide), andN,N-propylenebis(vinylsulfonacetamide), the polyvalent metal ionsdescribed on page 78 of the above article, and the like, polyisocyanatesdescribed in U.S. Pat. No. 4,281,060 and JP-A-6-208193; epoxy compoundsdescribed in U.S. Pat. No. 4,791,042; vinylsulfone type compoundsdescribed in JP-A-62-89048, and the like may preferably be used.

The hardening agent is added in the form of a solution. The timing ofadding the solution into a protective layer coating solution is from 180minutes before to immediately before coating, and preferably from 60minutes before to 10 seconds before coating. However, there is noparticular restriction as to the mixing process and the mixingconditions so long as the effects of this embodiment satisfactorilyoccur.

As a specific mixing process, there are a method in which the mixing isperformed in a tank configured such that the mean residence time thereincalculated from the addition flow rate and the feeding amount to acoater becomes a desirable time; and a method using a static mixerdescribed in Chapter 8 of Ekitai Kongo Gijutsu written by N. Harnby, M.F. Edwards, and A. W. Nienow, translated by Koji Takahashi, (publishedby Nikkan Kogyo Shinbunsha, 1989), and the like.

8) Surfactant

The surfactant applicable to this embodiment is described in paragraphNo. 0132 of JP-A-11-65021.

In this embodiment, a fluorine-containing surfactant is preferably used.Specific preferred examples of the fluorine-containing surfactant mayinclude the compounds described in JP-A-10-197985, JP-A-2000-19680, andJP-A-2000-214554. Further, the polymer fluorine-containing surfactantsdescribed in JP-A-9-281636 are also preferably used. In this embodiment,the fluorine-containing surfactants described in Japanese PatentApplication No. 2000-206560 are in particular preferably used.

9) Antistatic Agent

Whereas, in this embodiment, the photothermographic material may have anantistatic layer containing various known metal oxides or conductivepolymers. The antistatic layer may also serve as the undercoat layer,the back layer surface protective layer, or the like, or may also beseparately provided. To the antistatic layer, the technologies describedin paragraph No. 0135 of JP-A-11-65021, JP-A-56-143430, JP-A-56-143431,JP-A-58-62646, JP-A-56-120519, paragraph Nos. 0040 to 0051 of JP-A No.11-84573, U.S. Pat. No. 5,575, 957, and paragraph Nos. 0078 to 0084 ofJP-A No. 11-223898 are applicable.

10) Support

For a transparent support, polyester, in particular, polyethyleneterephthalate, subjected to a heat treatment at a temperature in therange of 130 to 185° C. is preferably used in order to relax theinternal distortion remaining in the film during the biaxial stretching,and thereby to eliminate the thermal shrinkage distortion occurringduring the heat development processing.

As a support of a photothermographic material to be used in combinationwith an ultraviolet emission screen, PEN can be preferably used.However, the support is not limited thereto. PEN is preferablypolyethylene-2,6-naphthalate. The polyethylene 2,6-naphthalate asreferred to in this embodiment may be any one of which the repeatingstructural unit is substantially composed of an ethylene 2,6-naphthalenedicarboxylate unit, inclusive of not only a non-copolymerizedpolyethylene 2,6-naphthalene dicarboxylate but also such a copolymer asthat of which 10% or less, preferably 5% or less of the number of therepeating structural units are modified with other components, and amixture with, and a composition of, other polymers.

Polyethylene 2,6-naphthalate is synthesized by linkingnaphthalene-2,6-dicarboxylic acid or its functional derivative, andethylene glycol or its functional derivative in the presence of acatalyst under appropriate reaction conditions. The polyethylene2,6-naphthalate as referred to in this embodiment may also be acopolymerized or mixed polyester obtained by adding one or, two or moreappropriate third components (modifiers) to the polyethylene2,6-naphthalate before the completion of the polymerization. As theappropriate third components, mention may be made of compounds havingbivalent ester-forming functional groups, including, for example,compounds such as: dicarboxylic acids such as oxalic acid, adipic acid,phthalic acid, isophthalic acid, terephthalic acid,naphthalene-2,7-dicarboxylic acid, succinic acid, and diphenyl etherdicarboxylic acid, or lower alkyl esters thereof; oxycarboxylic acidssuch as p-oxybenzoic acid and p-oxyethoxybenzoic acid, or lower alkylesters thereof; or dihydric alcohols such as propylene glycol andtrimethylene glycol. Polyethylene 2,6-naphthalate or a modified polymerthereof may also be the one blocked at its terminal hydroxyl groupand/or carboxyl group with monofunctional compounds such as benzoicacid, benzoylbenzoic acid, benzyloxybenzoic acid, and methoxypolyalkylene glycol. Alternatively, it may also be the one modified witha very small amount of tri-functional or tetra-functional ester-formingcompound such as glycerin or pentaerythritol within such a range as toprovide a substantially linear copolymer.

As for the photothermographic material for medical use, the transparentsupport may be colored by a blue dye (e.g., Dye-1 described in Exampleof JP-A-8-240877), or may be colorless.

Specific examples of the support are described in paragraph No. 0134 ofJP-A-11-65021.

To the support, the undercoating techniques of the water-solublepolyester of JP-A-11-84574, the styrene-butadiene copolymer ofJP-A-10-186565, the vinylidene chloride copolymer of JP-A-2000-39684 andparagraph Nos. 0063 to 0080 of Japanese Patent Application No.11-106881, and the like are preferably applied.

11) Other Additives

To the photothermographic material, further, an antioxidant, astabilizer, a plasticizer, a UV absorber, or a coating aid may also beadded. The solvents described in paragraph No. 0133 of JP-A-11-65021 mayalso be added. Various additives are added to any of light-sensitivelayers or non-light-sensitive layers. With regard to these, WO98/36322,EP No. 803764A1, JP-A-10-186567, JP-A-10-18568, and the like can serveas references.

12) Coating Method

The photothermographic material in this embodiment may be coated by anymethod. Specifically, various coating operations including: extrusioncoating, slide coating, curtain coating, dip coating, knife coating,flow coating, and extrusion coating using a hopper of the type describedin U.S. Pat. No. 2,681,294 are used. Extrusion coating or slide coatingdescribed in LIQUID FILM COATING, written by Stephen F. Kistler, andPetert M. Schweizer, (published by CHAPMAN & HALL Co., Ltd., 1997), pp.399 to 536 are preferably used. In particular, slide coating ispreferably used.

An example of the shape of a slide coater for use in the slide coatingis shown in FIG. 11 b. 1, on page 427 of the same reference. Whereas, ifdesired, two layers or more layers may be applied at the same time withthe method described from page 399 to page 536 of the same reference,and the methods described in U.S. Pat. No. 2,761,791 and GB No. 837,095.

The organic silver salt-containing layer coating solution in thisembodiment is preferably a so-called thixotropy fluid. With regard tothis technique, JP-A-11-52509 can serve as a reference.

The organic silver salt-containing layer coating solution in thisembodiment has a viscosity at a shear rate of 0.1 S⁻¹ of preferably 400mPa·s or more and 100,000 mPa·s or less, and more preferably 500 mPa·sor more and 20,000 mPa·s or less.

Whereas, at a shear rate of 1000 S⁻¹, the viscosity is preferably 1mPa·s or more and 200 mPa·s or less, and further preferably 5 mPa·s ormore and 80 mPa·s or less.

13) Packaging Material

The photothermographic material of this embodiment is preferablypackaged hermetically in a packaging material with a low oxygenpermeability and/or moisture permeability in order to suppress thedegradation in photographic performances during storage before use, orin order to be prevented from falling into a curling or rolling habitfor the product form in a roll state. The oxygen permeability ispreferably 50 ml/atm/m²·day or less, more preferably 10 ml/atm/m²·day orless, and furthermore preferably 1.0 ml/atm/m²·day or less at 25° C. Themoisture permeability is preferably 10 g/atm/m²·day or less, morepreferably 5 g/atm/m²·day or less, and furthermore preferably 1g/atm/m²·day or less. Specific examples of the usable packaging materialwith a low oxygen permeability and/or moisture permeability are the onesdescribed in, for example, JP-A-8-254793 and JP-A-2000-206653.

14) Other Available Techniques

As the techniques usable for the photothermographic material of thisembodiment, mention may also be made of: EP No. 803764A1, EP No.883022A1, WO98/36322, JP-A-56-62648, JP-A-58-62644, JP-A-9-43766,JP-A-9-281637, JP-A-9-297367, JP-A-9-304869, JP-A-9-311405,JP-A-9-329865, JP-A-10-10669, JP-A-10-62899, JP-A-10-69023,JP-A-10-186568, JP-A-10-90823, JP-A-10-171063, JP-A-10-186565,JP-A-10-186567, JP-A-10-186569 to JP-A-10-186572, JP-A-10-197974,JP-A-10-197982, JP-A-10-197983, JP-A-10-197985 to JP-A-10-197987,JP-A-10-207001, JP-A-10-207004, JP-A-10-221807, JP-A-10-282601,JP-A-10-288823, JP-A-10-288824, JP-A-10-307365, JP-A-10-312038,JP-A-10-339934, JP-A-11-7100, JP-A-11-15105, JP-A-11-24200,JP-A-11-24201, JP-A-11-30832, JP-A-11-84574, JP-A-11-65021,JP-A-11-109547, JP-A-11-125880, JP-A-11-129629, JP-A-11-133536 toJP-A-11-133539, JP-A-11-133542, JP-A-11-133543, JP-A-11-223898,JP-A-11-352627, JP-A-11-305377, JP-A-11-305378, JP-A-11-305384,JP-A-11-305380, JP-A-11-316435, JP-A-11-327076, JP-A-11-338096,JP-A-11-358098, JP-A-11-338099, JP-A-11-343420, JP-A-2000-187298,JP-A-2001-200414, JP-A-2001-234635, JP-A-2002-20699, JP-A-2001-275471,JP-A-2001-275461, JP-A-2000-313204, JP-A-2001-292844, JP-A-2000-324888,JP-A-2001-293864, and JP-A-2001-348546.

15) Color Image Formation

A multicolor photothermographic material is configured such that it maycontain a combination of these two layers for each color, or may containall ingredients in a single layer as described in U.S. Pat. No.4,708,928.

As for the multicolor photothermographic material, respective emulsionlayers are kept in such a relation as to be distinct from each other byusing a functional or non-functional barrier layer between therespective light-sensitive layers as described in U.S. Pat. No.4,460,681.

3. Image Formation Method

3-1 Exposure

The photothermographic material of this embodiment may be either of a“single sided type” having an image forming layer only on one side of asupport, or of a “double sided type” having image forming layers onopposite sides.

(Double Sided Type Photothermographic Material)

The photothermographic material of this embodiment can be preferablyused for an image formation method for recording an X-ray image using anX-ray intensifying screen.

The image forming method preferably uses a photothermographic materialrequiring an exposure amount of 1×10⁻⁶ W·sec/m² or more and 1×10⁻³W·sec/m² or less, preferably 6×10⁻⁶ W·sec/m or more and 6×10⁻⁴ W·sec/m²or less necessary for obtaining an image density of adding 0.5 to thelowest density of an image obtained by exposing with a monochromaticlight having an wavelength identical with the wavelength of a peak mainemission light of an X-ray intensifying screen and having a half-valuewidth of 15±5 nm.

The process of forming an image using the photothermographic materialcomprises the following steps:

(a) a step of setting the photothermographic material between a pair ofX-ray intensifying screens, and thereby obtaining an assembly for imageformation;

(b) a step of arranging a specimen between the assembly and an X raysource;

(c) a step of irradiating the specimen with an X ray having an energylevel within a range of 25 kVp to 125 kVp;

(d) a step of taking out the photothermographic material from theassembly; and

(e) a step of heating the photothermographic material taken at atemperature within a range of 90° C. to 180° C.

The photothermographic material for use in the assembly in thisembodiment is preferably prepared so as to provide, when subjected tostepwise exposure with an X ray and heat development, an image having acharacteristic curve on rectangular coordinates equal in coordinate unitlength of the optical density (D) and the exposure (logE), in which themean gamma (γ) formed between the point of the minimum density(Dmin)+density 0.1 and the point of the minimum density (Dmin)+density0.5 is 0.5 to 0.9, and the mean gamma (γ) formed between the point ofthe minimum density (Dmin)+density 1.2 and the point of the minimumdensity (Dmin)+density 1.6 is 3.2 to 4.0. Use of the photothermographicmaterial having such a characteristic curve for the X ray photographingsystem of this embodiment can result in an X-ray image having excellentphotographic characteristics such as a very elongated leg and high gammain the medium density region. The photographic characteristicsadvantageously result in the favorable descriptive property of the lowdensity region such as the mediastinum portion or the shadow of theheart, which allows a small amount of X-rays to be transmittedtherethrough, also the easy-to-view density of the image of the lungfield which allows a large amount of X-rays to be transmittedtherethrough, and the favorable contrast.

The photothermographic material having the foregoing preferredcharacteristic curve can be manufactured with ease in the followingmanner. For example, each of the image forming layers on opposite sidesis composed of two or more layers of silver halide emulsion layershaving mutually different sensitivities. Particularly, each imageforming layer is preferably formed by using a high sensitivity emulsionfor the upper layer, and using an emulsion having a low sensitivity anda hard photographic characteristic for the lower layer. The differencein sensitivity of the silver halide emulsion between the respectivelayers when such image forming layers composed of two layers are used is1.5 times or more and 20 times or less, and preferably 2 times or moreand 15 times or less. Incidentally, the ratio of the emulsions to beused for the respective layers varies according to the difference insensitivity between the emulsions to be used and the covering power. Ingeneral, the larger the sensitivity difference is, the more the ratio ofthe emulsion on the high sensitivity side to be used is reduced. Forexample, the preferred ratio of the respective emulsions to be used whenthe sensitivity difference is two times is controlled so as to be avalue within a range of 1:20 or more and 1:50 or less in terms of theratio of high sensitivity emulsion to low sensitivity emulsion in thesilver equivalent amount in the case where the covering powers areroughly equal.

For the techniques of crossover cut (double-sided light-sensitivematerial) and antihalation (single-sided light-sensitive material), thedyes or the mordants described in JP-A-2-68539, line 1 in the lower leftcolumn, page 13, to line 9 in the lower left column, page 14, may beused.

The fluorescent intensifying paper (radiation intensifying screen) ofthis embodiment will be described. The radiation intensifying screen iscomposed, as a basic structure, of a support and a phosphor layer formedon one side thereof. The phosphor layer is a layer containing a phosphordispersed in a binder. Incidentally, a transparent protective layer isgenerally provided on the surface of the phosphor layer opposite to thesupport (the surface on the side not facing the support) to protect thephosphor layer from chemical change in quality and physical impact.

In this embodiment, as preferred phosphors, mention may be made of thefollowing ones: tungstate type phosphors (CaWO₄, MgWO₄, CaWO₄:Pb, andthe like), terbium-activated rare earth element oxysulfide typephosphors [Y₂O₂S:Tb, Gd₂O₂S:Tb, La₂O₂S:Tb, (Y,Gd)₂O₂S:Tb, (Y,Gd)O₂S:Tb,Tm, and the like], terbium-activated rare earth element phosphate typephosphors (YPO₄:Tb, GdPO₄:Tb, LaPO₄:Tb, and the like) terbium-activatedrare earth element oxyhalide type phosphors [LaOBr:Tb, LaOBr:Tb, Tm,LaOCl:Tb, LaOCl:Tb, Tm, LaOBr:Tb, GdOBr:Tb, GdOCi:Tb, and the like],thulium-activated rare earth element oxyhalide type phosphors [LaOBr:Tm,LaOCl:Tm, and the like], a barium sulfate type phosphors [BaSO₄:Pb,BaSO₄:Eu²⁺, (Ba, Sr)SO₄:Eu²⁺, and the like], bivalent europium-activatedalkaline earth metal phosphate type phosphors [(Ba₂PO₄)₂:Eu²⁺,(Ba₂PO₄)₂:Eu²⁺, and the like], bivalent europium-activated alkalineearth metal fluorohalide type phosphors [BaFCl:Eu²⁺, BaFBr:Eu²⁺,BaFCl:Eu²⁺, Tb, BaFBr:Eu²⁺, Tb, BaF₂.BaCl.KCl:Eu²⁺, (Ba,Mg)F₂.BaCl.KCl:Eu²⁺, and the like], iodide type phosphors (CsI:Na,CsI:Tl, NaI, KI:Tl, and the like), sulfide type phosphors [ZnS:Ag, (Zn,Cd)S:Ag, (Zn, Cd)S:Cu, (Zn, Cd)S:Cu, Al, and the like], hafniumphosphate type phosphors (HfP₂O₇:Cu, and the like), and YTaO₄, and theones obtained by adding various activators thereto as luminescentcenters. However, the phosphors for use in this embodiment are notlimited thereto, and any phosphors are usable so long as they are thephosphors showing light emission in the visible or near-ultravioletregion through irradiation with a radiation.

In the X-ray fluorescence intensifying screen used preferably in theinvention, 50% or more of emission light is in a range from 350 nm to420 nm wavelength. Particularly, the fluorescent material is preferablya bivalent Eu-activated fluorescent material and, more preferably,bivalent Eu-activated barium halide series fluorescent material. Theemission wavelength region is, preferably, from 360 nm to 420 nm and,more preferably, 370 nm to 420 nm. Further, a more preferred fluorescentscreen has emission of 70% or more and, more preferably. 85% or more inthe region described above.

The ratio of the emission light is calculated by the following method.That is, the emission spectrum is measured while taking the emissionwavelength at an equal distance as the anti-logarithm on the abscissaand taking the number of emitted photons on the ordinate. The valueobtained by dividing the area from 350 nm or more and 420 nm or less bythe area for the entire emission spectrum on the chart is defined as theemitting ratio at a wavelength of 350 nm or more and 420 nm or less.When the emission light is present in such wavelength region, highsensitivity is attained by the combination with the photothermographicmaterial of the invention.

In order that most of emission light of the fluorescent material existin the wavelength region described above, the half-value width of theemission light is preferably narrower. A preferred half-value width is 1nm or more and 70 nm or less, more preferably, 5 nm or more and 50 nm orless and, further preferably, 10 nm or more and 40 nm or less.

There is no particular restriction on the fluorescent material to beused so long as the light emission described above is obtained. For theimprovement of the sensitivity as an object of the invention, thefluorescent material is preferably an Eu-activated fluorescent materialhaving bivalent Eu as an emission center.

Specific examples of such fluorescent material are shown below but theinvention is not limited thereto.

They include, for example, BaFCl:Eu, BaFBr:Eu, BaFI:Eu and halogencompositions modified therefrom, BaSO₄:Eu, SrFBr:Eu, SrFCl:Eu, SrFI:Eu,(Sr, Ba)Al₂Si₂O₈:Eu, SrB₄O₇F:Eu, SrMgP₂O₇:Eu, Sr₃(PO₄)₂:Eu, andSr₂P₂O₇:Eu.

A more preferred fluorescent material is a bivalent Eu activated bariumhalide fluorescent material represented by the formula: MX₁X₂:Eu. Mcomprises Ba as a main ingredient which can preferably contain a smallamount of other compounds such as Mg, Ca and Sr. X₁ and X₂ eachrepresents a halogen atom which can be selected optionally from F, Cl,Br and I. X₁ is preferably fluorine. X₂ can be selected from Cl, Br andI, and a composition comprising several of the halogen compounds inadmixture can also be used preferably.

More preferably, X=Br. Eu is europium. Eu as the emission center iscontained at a ratio to Ba preferably of 10⁻⁷ or more and 0.1 or less,more preferably, 10⁻⁴ or more and 0.05 or less. A small amount of othercompound may also be mixed preferably. Most preferred fluorescentmaterial includes BaFCl:Eu, BaFBr:Eu, and BaFBr_(1-X)I_(x):Eu.

<Fluourescence Intensifying Screen>

The fluorescence intensifying screen comprises, preferably, a support,an undercoat layer on the support, a fluorescent material layer, and asurface protective layer.

The fluorescent material layer can be formed by dispersing particles ofthe fluorescent material into a solution of an organic solventcontaining a binder resin to prepare a liquid dispersion, and thendirectly coating the liquid dispersion on a support (or on an undercoatlayer in a case where the undercoat layer such as a light reflectionlayer is formed on the support), followed by drying. Alternatively, theliquid dispersion may be coated on a separately prepared provisionalsupport, followed by drying to prepare a fluorescent body sheet, andthen the fluorescent material may be peeled from the provisional supportand appended on a usual support by using an adhesive.

The grain size of the fluorescent material particles is not limitedparticularly and it is usually within a range about from 1 μm to 15 μmand, preferably, within a range about from 2 μm to 10 μm. The volumetricpackaging rate of the fluorescent material particles in the fluorescentmaterial layer is preferably higher. It is usually within a range from60 to 85%, preferably, within a range from 65 to 80% and, particularlypreferably, within a range from 68 to 75% (the ratio of the fluorescentmaterial particles in the fluorescent material layer is usually 80 mass% or more, preferably, 90 mass % or more and, particularly preferably,95 mass % or more). The binder resin, the organic solvent, and variouskinds of optional additives used for forming the fluorescent materiallayer are described in various known literatures. The thickness of thefluorescent material layer can be set optionally depending on the aimedsensitivity. Preferably, it is within a range from 70 μm to 150 μm forthe screen on the front side, and within a range from 80 μm to 400 μmfor the screen on the back side. The X-ray absorbability of thefluorescent material layer is determined depending on the coating amountof the fluorescent material particles.

The fluorescent material layer may be a single layer or may comprise twoor more layers. It is preferably one to three layers and, morepreferably, one or two layers. For example, layers each comprisingfluorescent material particles of different grain size with a relativelynarrow grain size distribution may be stacked, in which the grain sizemay be smaller in the layer nearer to the support. It is particularlypreferred to coat fluorescent material particles of larger grain size onthe side of a surface protective layer and to coat fluorescent materialparticles of smaller grain size on the side of the support. Preferably,those of the smaller grain size are within a range from 0.5 μm to 2.0 μmand those of the larger grain size are within a range from 10 μm to 30μm. Further, the fluorescent material layer may be formed by mixingfluorescent material particles of different grain size. Alternatively,as described in JP-B No. 55-33560, page 3, left column, line 3 to page4, left column, line 39, a fluorescent material layer may be of astructure in which the grain size distribution of the fluorescentmaterial particles has a gradient. Usually, the fluctuation coefficientfor the grain size distribution of the fluorescent material is within arange from 30 to 50% but mono-dispersed fluorescent material particleswith the fluctuation coefficient of 30% or less may also be usedpreferably.

It has been attempted to provide a preferred sharpness by dying thefluorescent material layer to the emission wavelength. However, a layerdesign to retain the dying as less as possible is used preferably. Theabsorption length of the fluorescent material layer is, preferably, 100μm or more and, more preferably, 1000 μm or more.

The scattering length is designed, preferably, to 0.1 μm or more and 100μm or less and, more preferably, 1 μm or more and 100 μm or less. Thescattering length and the absorption length can be calculated accordingto the calculation formula based on the Kubelka-Munk's theory.

The support can be appropriately selected for use depending on thepurpose from various kinds of supports used for known radiationintensifying screens. For example, a polymer film containing a whitepigment such as titanium dioxide or a polymer film containing a blackpigment such as carbon black can be used preferably. An undercoat layersuch as a light reflection layer containing a light reflection materialmay also be provided to the surface of the support (surface on the sideprovided with the fluorescent material layer). A light reflection layeras described in JP-A No. 2001-124898 can also be used preferably.Particularly, a light reflection layer using yttrium oxide as describedin Example 1 of the above mentioned patent document or a lightreflection layer as described in Example 4 of this patent document isused preferably. For the preferred light reflection layer, descriptionsin JP-A No. 2001-124898, from page 3, right column, line 15 to page 4,right column, line 23 can be referred to.

A surface protective layer is provided preferably on the surface of thefluorescent material layer. The light scattering length measured at themain emission wavelength of the fluorescent material is preferablywithin a range from 5 μm to 80 μm and, more preferably, within a rangefrom 10 μm to 70 μm and, particularly preferably, within a range from 10μm to 60 μm. The light scattering length represents a mean distance forthe straight propagation of light till scattering for once, and shorterscattering length means higher light scattering property. Further, whilethe light absorption length expressing the mean free distance till theabsorption of light is optional, it is preferred that the surfaceprotective layer has no adsorption with a view point of the screensensitivity since this results in less desensitization. In order tocompensate the insufficiency of scattering, a slight absorbability maybe provided. The absorption length is, preferably, 800 μm or more and,particularly preferably, 1200 μm or more. The light scattering lengthand the light absorption length can be calculated according to thecalculation formula based on the Kubelka-Munk's theory by using thevalues measured by the following method.

At first, three or more film specimens each having a compositionidentical with that of the surface protective layer to be measured andhaving thickness different from each other are prepared. Then, thethickness (μm) and the diffuse transmittance factor (%) for each of thefilm specimens is measured. The diffusion transmittance can be measuredby a device in which an integrating sphere is attached to a usualspectrophotometer. Upon measurement in the invention, a self-recordingspectrophotometer (Model U-3210, manufactured by Hitachi Ltd.) providedwith a 150 φ integrating sphere (150-0901) is used. It is necessary thatthe measuring wavelength is aligned with the peak wavelength of the mainemission light of the fluorescent material in the fluorescent materiallayer as an object to which the surface protective layer is attached.Then, the measured values for the thickness (μm) and the diffusetransmittance (%) of the film are introduced into the following formula(A) derived from the Kubelka-Munk Is theoretical formula. The formula(A) can be introduced simply, for example, from the formulae in 5.1.12to 5.1.15, page 403, in “Fluorescent Material Handbook” (edited byFluorescent Material Dogakukai, published from Ohm Co in 1987) under theboundary condition for the diffuse transmittance factor T (%).T/100=4β[(1+β)²·exp(αd)−(1−β)²·exp(−αd)]  formula (A)In the formula, T represents diffuse a transmittance factor (%), drepresents a film thickness (μm), and each of α and β is defined by thefollowing formulae:α=[K·(K+2S)]^(1/2)β=[K/(K+2S)]^(1/2)

T (diffuse transmittance factor %) and d (film thickness: μm) measuredfor three or more films are introduced respectively into the formula (A)above to calculate K and S that satisfy the formula (A). The scatteringlength (μm) is defined by 1/S and the absorption wavelength (μm) isdefined by 1/K.

It is preferred that the surface protective layer has a constitution inwhich the light scattering particles are dispersed and contained in theresin material. The optical refractive index of the light scatteringparticles is usually 1.6 or more and, preferably, 1.9 or more. Further,the grain size of the light scattering particles is usually within arange from 0.1 μm to 1.0 μm. Examples of the light scattering particlescan include, for example, fine particles of aluminum oxide, magnesiumoxide, zinc oxide, zinc sulfide, titanium oxide, niobium oxide, bariumsulfate, lead carbonate, silicon oxide, polymethyl methacrylate,styrene, and melamine.

The resin material used for forming the surface protective layer has noparticular restriction, and polyethylene terephthalate, polyethylenenaphthalate, polyamide, alamide, fluoro resin and polyester resin can beused preferably. The surface protective layer can be formed bydispersing the light scattering particles into a solution of an organicsolvent containing a resin material (binder resin) to prepare a liquiddispersion and directly coating the liquid dispersion on the fluorescentmaterial layer (or by way of an optional auxiliary layer), followed bydrying. Alternatively, a sheet for use in the protective layer formedseparately may be attached onto the fluorescent material layer by usingan adhesive. The thickness of the surface protective layer is usuallywithin a range from 2 μm to 12 μm and, preferably, within a range from3.5 μm to 10 μm.

Further, preferred manufacturing methods for radiation-intensifyingscreens and materials used therefor are described specifically, forexample, in JP-A No. 9-21899, page 6, left column, line 47 to page 8,left column, line 5, JP-A No. 6-347598, page 2, right column, line 17 topage 3, left column line 33, and page 3, left column line 42 to page 4,left column, line 22 thereof, and the descriptions of them can bereferred to.

The fluorescent intensifying paper for use in this embodiment ispreferably filled with a phosphor in a gradient particle diameterstructure. In particular, preferably, large-diameter phosphor particlesare applied on the surface protective layer side, and small-diameterphosphor particles are applied on the support side. Preferably, thediameter of the small-diameter particle is in the range of 0.5 to 2.0μm, and the diameter of the large-diameter particle is in the range of10 to 30 μm.

(Single-Sided Photothermographic Material)

The single-sided photothermographic material in this embodiment is inparticular preferably used as a mammographic X-ray sensitive material.

It is important that the single-sided photothermographic material to beused for the object of the invention is designed so as to provide animage with a contrast within a proper range.

As for the preferred constituent features as the mammographic X-raysensitive material, JP-A-5-45807, JP-A-10-62881, JP-A-10-54900, andJP-A-11-109564 can serve as references.

(Combination with Ultraviolet Fluorescent Screen)

As an image formation method using the photothermographic material ofthis embodiment, a method for forming an image by the combination with aphosphor having a main peak at 400 nm or less may be preferably used. Amethod for forming an image by the combination with a phosphor having amain peak at 380 nm or less is further preferably used. Either of thedouble-sided light-sensitive material and the single-sidedlight-sensitive material may be used in the form of an assembly. As thescreen having a main light emission peak at 400 nm or less, the screensdescribed in JP-A-6-11804 and WO 93/01521, and the like are used, butthe usable screens are not limited thereto. As the techniques ofultraviolet crossover cut (double-sided light-sensitive material) andantihalation (single-sided light-sensitive material), the techniquesdescribed in JP-A-8-76307 are usable. The ultraviolet absorbing dyes arein particular preferably the dyes described in Japanese PatentApplication No. 2000-320809.

3-2 Heat Development

The photothermographic material of this embodiment may be developed inany manner. However, in general, the imagewise exposedphotothermographic material is developed by heating. The preferreddevelopment temperature is 80 to 250° C., and further preferably 100 to140° C.

The development time is preferably 1 to 60 seconds, further preferably 5to 30 seconds, and in particular preferably 5 to 20 seconds.

As a system for heat development, a plate type heater system may be usedother than the system by the heat development apparatus in accordancewith the invention. For a heat development system by the plate heatersystem, the method described in JP-A-11-133572 is preferred. The systemis a heat development apparatus whereby a photothermographic material onwhich a latent image has been formed is brought into contact with aheating unit in a heat development unit to obtain a visible image. Theheat development apparatus is characterized in that the heating unitcomprises a plate heater, a plurality of presser rollers are disposedalong one surface of the plate heater and in positions opposite thereto,and that heat development is performed by allowing thephotothermographic material to pass between the presser rollers and theplate heater. Preferably, the plate heater is sectioned into 2 to 6stages, and the tip is reduced in temperature by about 1 to 10° C.

Such a method is also described in JP-A-54-30032. This can remove themoisture and the organic solvent contained in the photothermographicmaterial out of the system, and can suppress the change in shape of thesupport of the photothermographic material caused by rapidly heating thephotothermographic material.

3-3. System

Other than the heat development apparatus in accordance with theinvention, as a laser imager having an exposure part and a heatdevelopment part for the medical use, Fuji Medical Dry Laser ImagerFM-DP L can be mentioned. The system is described in Fuji Medical ReviewNo. 8, pp. 39 to 55. The techniques are applicable. Whereas, thesetechniques are also applicable as the photothermographic material forthe laser imager in “AD network” proposed by Fuji Medical System, Co.,Ltd., as a network system adapted to the DICOM Standards.

4. Application of this Embodiment

The photothermographic material using the high silver iodidephotographic emulsion of this embodiment forms a black and white imagebased on a silver image. It is preferably used as a photothermographicmaterial for the medical diagnosis, as a photothermographic material forthe industrial photography, as a photothermographic material for theprinting use, and as a photothermographic material for the COM use.

EXAMPLES

Below, a specific description will be given to the photothermographicmaterial by way of examples, which should not be construed as liming thephotothermographic material of this embodiment.

1. Preparation of PET Support and Undercoating

1-1. Film Formation

PET having an intrinsic viscosity IV=0.66 (measured at 25° C. inphenol/tetrachloroethane=6/4 (weight ratio)) was obtained according toan ordinary method by using terephthalic acid and ethylene glycol. Thiswas pelletized, and then dried at 130° C. for 4 hours. The dried PET wascolored in blue by a blue dye(1,4-bis(2,6-diethylanilino)anthraquinone), and then extruded through aT-die, and cooled rapidly to prepare an unstreched film.

Using rolls different in circumferential speed, this was longitudinallystretched to 3.3 times, and then laterally stretched to 4.5 times bymeans of a tenter. The temperatures at this step were 110° C. and 130°C., respectively. Thereafter, the stretched film was thermally fixed at240° C. for 20 seconds, and then subjected to relaxation in the lateraldirection by 4% at the same temperature. Then, after slitting the chuckportion of the tenter, the opposite ends were subjected to knurlprocessing, and the film was wound at 4 kg/cm² to obtain a 175 μm-thickroll.

1-2. Surface Corona Treatment

Using a 6-KVA model of solid state corona treatment apparatusmanufactured by Pillar Corporation, the opposite surfaces of the supportwere treated at 20 m/minute under room temperature. From the read valuesof current and voltage at this step, it was confirmed that the supportwas treated at 0.375 kV·A·minute/m². The treatment frequency at thisstep was 9.6 kHz, and the gap clearance between the electrode and adielectric roll was 1.6 mm.

1-3 Preparation of Undercoated Support

(1) Preparation of an Undercoat Layer Coating Solution

Formulation (1) (for undercoat layer on the side of light sensitivelayer) SnO₂/SbO (9/1 mass ratio, average particle size 0.5 μm, 17 84 gmass % dispersion) PESRESIN A-520 (30 mass % solution) manufactured by46.8 g Takamatsu Yushi. Co. Baironal MD-1200 manufactured by Toyo BosekiK.K. 10.4 g Polyethylene glycol monononylphenyl ether (average ethylene11.0 g oxide number = 8.5) 1 mass % solution MP-1000 (fine PMMA polymerparticles, average particle size 0.91 g 0.4 μm) manufactured by SokenChemical Co. Distilled water 847 ml

Both surfaces of the 175 μm-thick biaxially stretched polyethyleneterephthalate support were respectively subjected to the coronadischarge treatment. Then, one surface was coated with the undercoatingsolution formulation (1) by a wire bar in a wet coating amount of 6.6ml/m² (per side), and dried at 180° C. for 5 minutes. This operation wascarried out on both the surfaces, thereby to prepare an undercoatedsupport.

2. Preparation of Materials for Coating

1) Silver Halide Emulsion

(Preparation of Silver Halide Emulsion A)

To 1421 ml of distilled water, 4.3 ml of a 1 mass % potassium iodidesolution was added, and further, 3.5 ml of 0.5 mol/L sulfuric acid, 36.5g of phthalated gelatin, and 160 ml of a 5 mass % methanol solution of2,2′-(ethylenedithio)diethanol were added. The resulting solution waskept at a temperature of 75° C. with stirring in a reaction jar made ofstainless steel. Solution A was prepared by diluting 22.22 g of silvernitrate with the addition of distilled water to 218 ml, and Solution Bwas prepared by diluting 36.6 g of potassium iodide with the addition ofdistilled water to a volume of 366 ml. The whole amount of Solution Awas added thereto at a constant flow rate over 16 minutes. Solution Bwas added thereto while keeping the pAg at 10.2 with a controlled doublejet method. Then, 10 ml of a 3.5 mass % hydrogen peroxide aqueoussolution was added thereto, and further, 10.8 ml of a 10 mass % aqueoussolution of benzimidazole was added thereto. Further, Solution C wasprepared by diluting 51.86 g of silver nitrate with the addition ofdistilled water to 508.2 ml, and Solution D was prepared by diluting63.9 g of potassium iodide to a volume of 639 ml with distilled water.The whole amount of Solution C was added at a given flow rate over 80minutes. Whereas, Solution D was added while keeping the pAg at 10.2with a controlled double jet method. Potassium hexachloroiridate (III)was added in an amount of 1×10⁻⁴ mol per mole of silver all at onceafter 10 minutes from the start of addition of Solutions C and D.Whereas, an aqueous solution of potassium iron (II) hexacyanide wasadded in an amount of 3×10⁻⁴ mol per mole of silver all at once after 5seconds from the completion of addition of Solution C. The pH wasadjusted to 3.8 using a sulfuric acid with a concentration of 0.5 mol/L,and stirring was stopped. Then, steps of sedimentation/desalting/washingwith water were carried out. The resulting mixture was adjusted to a pHof 5.9 with sodium hydroxide with a concentration of 1 mol/L. Thus, asilver halide dispersion with a pAg 11.0 was prepared.

Silver halide emulsion A was a pure silver iodide emulsion. The tabulargrains having a mean projected area diameter of 0.93 μm, a variationcoefficient of the mean projected area diameter of 17.7%, a meanthickness of 0.057 μm, and a mean aspect ratio of 16.3 accounted for 80%or more of the whole projected area. The sphere equivalent diameter was0.42 μm. The results of an X-ray powder diffraction analysis indicatedthat 30% or more of the silver iodide was present in the γ phase form.

(Preparation of Silver Halide Emulsion B)

One mole of a tabular grain AgI emulsion prepared with Silver halideemulsion A was placed in a reaction vessel. The pAg was measured at 38°C., and found to be 10.2. Then, by double jet addition, a 0.5 mol/l KBrsolution and a 0.5 mol/l AgNO₃ solution were added at 10 ml/min over 20minutes, thereby to substantially precipitate a 10 mol % silver bromidein the epitaxial form on a AgI host emulsion. During the operation, thepAg was maintained at 10.2. Further, the pH was adjusted to 3.8 using asulfuric acid with a concentration of 0.5 mol/L, and stirring wasstopped. Then, steps of sedimentation/desalting/washing with water werecarried out. The resulting mixture was adjusted to a pH of 5.9 withsodium hydroxide with a concentration of 1 mol/L. Thus, a silver halidedispersion with a pAg of 11.0 was prepared.

The silver halide dispersion was kept at 38° C. with stirring, to whichwas added 5 ml of a 0.34 mass % methanol solution of1,2-benzisothiazolin-3-one, and the mixture was heated to 47° C. after40 minutes. After 20 minutes from the heating, sodiumbenzenethiosulfonate was added in an amount of 7.6×10⁻⁵ mol per mole ofsilver in the form of methanol solution. Further, after 5 minutes,Tellurium sensitizer C was added thereto in an amount of 2.9×10⁻⁵ molper mole of silver in the form of methanol solution, followed by agingfor 91 minutes. Then, 1.3 ml of a 0.8 mass % methanol solution ofN,N′-dihydroxy-N″-diethylmelamine was added thereto, and after another 4minutes, thereto were added 5-methyl-2-mercaptobenzimidazole in the formof methanol solution in an amount of 4.8×10⁻³ mol per mole of silver,1-phenyl-2-heptyl-5-mercapto-1,3,4-triazole in the form of methanolsolution in an amount of 5.4×10⁻³ mol per mole of silver, and1-(3-methylureidophenyl)-5-mercaptotetrazole in the form of aqueoussolution in an amount of 8.5×10⁻³ mol per mole of silver. As a result,Silver halide emulsion B was prepared.

<Preparation of Silver Halide Emulsion C>

A solution A was prepared by forming a solution by adding 8 ml of 10mass % potassium iodide solution to 1421 ml of distilled water andfurther 4.6 g of gelatin phthalide and 160 ml of a 5 mass % methanolsolution of 2,2′-(ethylenedithio) diethanol, keeping the liquidtemperature at 75° C. in a stainless steel reaction pot while stirringand adding distilled water to 22.7 g of silver nitrate to dilute to 223ml, and a solution B was formed by diluting 36.6 g of potassium iodidewith distilled water to 366 ml volume. The solution A was added entirelyat a constant flow rate for 15 min. 22 sec, and the solution B was addedby a controlled double jet method while keeping pAg to 9.96. Then, 10 mlof an aqueous 3.5 mass % solution of hydrogen peroxide was added and,further, 10.8 ml of an aqueous 10 mass % solution of benzoimidazole wasadded. Further, a solution C formed by adding distilled water to 53.1 gof silver nitrate to dilute to 520.2 ml and a solution D formed byadding distilled water to 63.9 g of potassium iodide to dilute to 639 mlwere added such that the solution C was added entirely at a constantflow rate for 80 min and the solution D was added by a controlled bubblejet method while keeping pAg at 9.96. Potassium hexachloroiridate (III)was added by the entire amount so as to be 1×10⁻⁴ per one mol of silver10 min after the start of addition of the solution C and the solution D.Further, an aqueous solution of potassium hexacyano ferrate (II) wasadded by 3×10⁻⁴ mol per one mol of silver by the entire amount 5 secafter the completion of addition of the solution C. pH was adjusted to3.8 using sulfuric acid at 0.5 mol/L concentration, stirring was stoppedand settling/desalting/water washing step was carried out. pH wasadjusted to 5.9 using sodium hydroxide at 1 mol/L concentration toprepare a silver halide dispersion at pAg of 11.0.

The obtained host particles are a pure silver iodide emulsion,comprising 80% or more, for the entire projection area, of tabularparticles having an average projection area diameter of 0.93 μm, afluctuation coefficient of average projection area diameter of 17.7%, anaverage thickness of 0.057 μm and an average aspect ratio of 16.3. Thesphere equivalent diameter was 0.42 μm. As a result of analysis by X-raypowder diffraction analysis, 90% or more of silver iodide was present asthe γ-phase.

Preparation of Silver Halide Emulsion D

One mol of AgI particles was put in a reaction vessel. pAg was 10.2 asmeasured at 40° C. Then, a halogen solution containing 0.088 mol of KBrand 0.038 mol of NaCl in one liter and 0.125 mol/L of an AgNO₃ solutionwere added at 28.7 ml/min for 31 min by a double jet addition and silverchlorobromide was precipitated epitaxially in an amount of 10 mol % baseon entire silver amount at 6 point corners on the AgI host emulsion. pAgwas kept at 7.13 during operation.

Further, pH was adjusted to 3.8 using sulfuric acid at 0.5 mol/Lconcentration, stirring was stopped and precipitation/desalting/washingstep was carried out. pH was adjusted to 5.9 using sodium hydroxide at 1mol/L concentration and silver halide dispersion at pAg of 11.0 wasprepared. When the average halogen composition for the epitaxial portionwas determined by preparing a micro thin slice for the silver halideparticle epitaxial portion and determining by a field emission typeanalysis electron microscope, it was 80 mol % of bromine, 17 mol % ofchlorine and 3 mol % of iodine.

The silver halide dispersion was kept at 38° C. while stirring, 5 ml ofa 0.34 mass % methanol solution of 1,2-benzoisothiazoline-3-one wasadded and, 40 min after, temperature was elevated to 60° C. 20 min afterthe temperature elevation, sodium benzenethiosulfonate in a methanolsolution was added by 7.6×10⁻⁵ mol per one mol of silver and, further 5min after, a methanol solution of a tellurium sensitizer C was added by2.9×10⁻⁵ mol per one mol of silver and aged for 91 min. Then, 1.3 ml of0.8 mass % methanol solution of N,N′-dihydroxy-N″,N″-diethylmelamine wasadded. Further 4 min after, 5-methyl-2-mercaptobenzoimidazole as amethanol solution was added by 4.8×10⁻³ mol per one mol of silver and1-phenyl-2-heptyl-5-mercapto-1,3,4-triazole as a methanol solution wasadded by 5.4×10⁻³ mol per one mol of silver and1-(3-methylureido-5-mercapto-tetrazole as an aqueous solution was addedby 8.5×10⁻³ mol per one mol of silver to prepare silver halide emulsionD.

(Preparation of Mixed Emulsion for Coating Solution)

Silver halide emulsion B and Silver halide emulsion D were mixed anddissolved together in a silver molar ratio of 5:1. Thereto,benzothiazolium iodide was added in the form of a 1 mass % aqueoussolution in an amount of 7×10⁻³ mol per mole of silver. Further,Compounds 1, 2, and 3 capable of being one-electron oxidized to become aone-electron oxidation product, and releasing one or more electrons wereeach added in an amount of 2×10⁻³ mol per mole of silver of the silverhalide.

Whereas, Compounds 1, 2, and 3 having an adsorbing group and a reducinggroup were each added in an amount of 8×10⁻³ mol per mole of silver ofthe silver halide.

Further, water was added so that the content of the silver halide perliter of the mixed emulsion for coating solution became 15.6 g.

2) Preparation of Fatty Acid Silver Dispersion

(Preparation of Recrystallized Behenic Acid)

100 Kg of behenic acid (trade name: Edenor C22-85R) manufactured byHenckel Co., was mixed with 1200 Kg of isopropyl alcohol, and dissolvedat 50° C. The resulting mixture was filtrated through a 10-μm filter,and then cooled to 30° C. to perform recrystallization. The coolingspeed for performing recrystallization was controlled to 3° C./hour. Theobtained crystals were subjected to centrifugal filtration, and appliedand washed with 100 Kg of isopropyl alcohol, followed by drying. Theobtained crystals were subjected to esterification and a GC-FIDmeasurement. This indicated that the silver behenate content was 96%,and that, other than this, lignoceric acid in an amount of 2%, arachidicacid in an amount of 2%, and erucic acid in an amount of 0.001% werecontained therein.

(Preparation of Fatty Acid Silver Dispersion)

88 Kg of recrystallized behenic acid, 422 L of distilled water, 49.2 Lof an aqueous solution of NaOH with a concentration of 5 mol/L, and 120L of t-butyl alcohol were mixed, and stirred at 75° C. for 1 hour toeffect the reaction, thereby obtaining Sodium behenate solution B.Separately, 206.2 L of an aqueous solution of 40.4 kg of silver nitrate(pH 4.0) was prepared, and kept at a temperature of 10° C. A reactionvessel containing 635 L of distilled water and 30 L of t-butyl alcoholtherein was kept at a temperature of 30° C., and the whole amount ofSodium behenate solution previously prepared and the whole amount of theaqueous solution of silver nitrate were added with sufficient stirringthereto at a constant flow rate over 93 minutes and 15 seconds and over90 minutes, respectively. This step was carried out in the followingmanner. Only the aqueous solution of silver nitrate was added for 11minutes after the start of addition of the aqueous solution of silvernitrate. Thereafter, addition of the sodium behenate solution wasstarted, and only the sodium behenate solution was added for 14 minuteand 15 seconds after completion of the addition of the aqueous solutionof silver nitrate. At this step, the temperature in the reaction vesselwas set at 30° C., and the temperature of the outside was controlled sothat the liquid temperature was maintained constant. Further, the pipingof the addition system for the sodium behenate solution washeat-insulated by circulating warm water outside the double pipe, andadjusted so that the liquid temperature at the outlet of the tip of theaddition nozzle became 75° C. Whereas, the piping of the addition systemfor the aqueous solution of silver nitrate was heat-insulated bycirculating cool water outside the double pipe. The position of addingthe sodium behenate solution and the position of adding the aqueoussolution of silver nitrate were arranged symmetrically with respect tothe stirring shaft as the center, and adjusted at such a height as notto cause contact with the reaction solution.

After completion of the addition of the sodium behenate solution, themixture was allowed to stand with stirring for 20 minutes with thetemperature unchanged, and heated to 35° C. over 30 minutes, followed byaging for 210 minutes. Immediately after completion of aging, the solidcontent was separated by centrifugal filtration, and then the solidcontent was washed with water until the conductivity of the filtratewater became 30 μS/cm. A fatty acid silver salt was obtained in thismanner. The obtained solid content was not dried, and stored in the formof a wet cake.

The shapes of the obtained silver behenate grains were evaluated by anelectron microscopic photography, so that the grains were found to becrystals having a=0.21 μm, b=0.4 μm, and c=0.4 μm, in average values, anaverage aspect ratio of 2.1, and a variation coefficient of sphereequivalent diameter of 11% (a, b, and c are defined in thisspecification).

To the wet cake corresponding to 260 kg of the dry solid content, 19.3Kg of polyvinyl alcohol (trade name: PVA-217) and water were added tomake the total amount 1000 Kg. Then, the resulting mixture was made intoa slurry by means of a dissolver blade, and further pre-dispersed bymeans of a pipeline mixer (PM-10 model: manufactured by MIZUHOIndustrial Co., Ltd.).

Then, the pre-dispersed stock dispersion was treated three times bymeans of a dispersing machine (trade name: Microfluidizer M-610,manufactured by Microfluidex International Corporation, using a Z modelinteraction chamber) with the pressure controlled to be 1150 kg/cm² toobtain a silver behenate dispersion. During the cooling operation, thedispersion temperature was set at 18° C. by providing coiled heatexchangers fixed before and after the interaction chamber, andcontrolling the temperature of the refrigerant.

(3) Preparation of Reducing Agent Dispersion

Preparation of Reducing Agent-1 Dispersion

10 kg of water was added to 10 kg of a reducing agent-1(1,1-bis(2-hydroxy-3,5-dimethylphenyl)-3,5,5-trimethylhexane) and 16 kgof an aqueous 10 mass % solution of modified polyvinyl alcohol (PovalMP203, manufactured by Kuraray Co.) and mixed thoroughly to form aslurry. The slurry was fed by a diaphragm pump, dispersed for 3 hours bya horizontal sand mil (UVM-2; manufactured by Imex Co.) filled withzirconia beads of an average diameter of 0.5 mm, then 0.2 g of sodiumsalt of benzoisothiazolinon and water were added to control such thatthe concentration of the reducing agent was 25 mass %. The liquiddispersion was heat treated at 60° C. for 5 hrs to obtain a reducingagent-1 dispersion. The reducing agent particles contained in the thusobtained reducing agent dispersion had a median diameter of 0.40 μm anda maximum grain size of 1.4 μm or less. The thus obtained reducing agentdispersion was filtered through a polypropylene filter of 3.0 μm poresize to remove obstacles such as dusts and then stored.

4) Preparation of Hydrogen Bonding Compound Dispersion

(Preparation of Hydrogen Bonding Compound-1)

To 10 Kg of Hydrogen bonding compound-1 (tri(4-t-butylphenyl)phosphineoxide), and 16 Kg of a 10 mass % aqueous solution of modified polyvinylalcohol (POVAL MP203 manufactured by Kuraray Co., Ltd.), 10 Kg of waterwas added, and well mixed, resulting in a slurry. The slurry was fedthrough a diaphragm pump to a sand mill of horizontal type (UVM-2:manufactured by Imex Co., Ltd.) filled with zirconia bead shaving anaverage diameter of 0.5 mm, and dispersed therein for 4 hours. Then, 0.2g of benzothiazolinone sodium salt and water were added thereto, so thatthe concentration of the hydrogen bonding compound was adjusted to 25mass %. The dispersion was heated at 40° C. for 1 hour, and subsequentlyfurther warmed at 80° C. for another hour to obtain Hydrogen bondingcompound-1 dispersion. The hydrogen bonding compound grains contained inthe hydrogen bonding compound dispersion thus obtained had a mediandiameter of 0.45 μm and a maximum grain diameter of 1.3 μm or less. Thehydrogen bonding compound dispersion obtained was filtered through afilter made of polypropylene, having a pore size of 3.0 μm, to removeforeign matters such as dusts, and stored.

5) Preparation of Development Accelerator Dispersion and Tone ModifierDispersion

(Preparation of Development Accelerator-1 Dispersion)

To 10 Kg of Development accelerator-1, and 20 Kg of a 10 mass % aqueoussolution of modified polyvinyl alcohol (POVAL MP203 manufactured byKuraray Co., Ltd.), 10 Kg of water was added, and well mixed, resultingin a slurry. The slurry was fed through a diaphragm pump to a sand millof horizontal type (UVM-2, manufactured by Imex Co., Ltd.) filled withzirconia bead shaving an average diameter of 0.5 mm, and dispersedtherein for 3 hours and 30 minutes. Then, 0.2 g of benzothiazolinonesodium salt and water were added thereto, so that the concentration ofthe development accelerator was adjusted to 20 mass %. Thus, Developmentaccelerator-1 dispersion was obtained. The development acceleratorgrains contained in the development accelerator dispersion thus obtainedhad a median diameter of 0.48 μm and a maximum grain diameter of 1.4 μmor less. The development accelerator dispersion obtained was filteredthrough a filter made of polypropylene, having a pore size of 3.0 μm, toremove foreign matters such as dusts, and stored.

Also for the solid dispersions of Development accelerator-2 and Tonemodifier-1, dispersion was carried out in the same manner as withDevelopment accelerator-1, to obtain 20 mass % and 15 mass %dispersions, respectively.

6) Preparation of Polyhalogen Compound Dispersion

(Preparation of Organic Polyhalogen Compound-1 Dispersion)

10 Kg of Organic polyhalogen compound-1 (tribromomethanesulfonylbenzene), 10 Kg of a 20 mass % aqueous solution of modifiedpolyvinyl alcohol (POVAL MP203 manufactured by Kuraray Co., Ltd.), 0.4Kg of a 20 mass % aqueous solution of sodium triisopropyl naphthalenesulfonate, and 14 Kg of water were added together, and well mixed,resulting in a slurry. The slurry was fed through a diaphragm pump to asand mill of horizontal type (UVM-2, manufactured by Imex Co., Ltd.)filled with zirconia beads having an average diameter of 0.5 mm, anddispersed therein for 5 hours. Then, 0.2 g of benzothiazolinone sodiumsalt and water were added thereto, so that the concentration of theorganic polyhalogen compound was adjusted to 30 mass %. Thus, Organicpolyhalogen compound-1 dispersion was obtained. The organic polyhalogencompound grains contained in the organic polyhalogen compound dispersionthus obtained had a median diameter of 0.41 μm and a maximum graindiameter of 2.0 μm or less. The organic polyhalogen compound dispersionobtained was filtered through a filter made of polypropylene having apore size of 10.0 μm to remove foreign matters such as dusts, andstored.

(Preparation of Organic Polyhalogen Compound-2 Dispersion)

10 Kg of Organic polyhalogen compound-2 (N-butyl-3-tribromomethanesulfonyl benzamide), 20 Kg of a 10 mass % aqueous solution of modifiedpolyvinyl alcohol (POVAL MP203 manufactured by Kuraray Co., Ltd.), and0.4 Kg of a 20 mass % aqueous solution of sodium triisopropylnaphthalene sulfonate, were added together, and well mixed, resulting ina slurry. The slurry was fed through a diaphragm pump to a sand mill ofhorizontal type (UVM-2, manufactured by Imex Co., Ltd.) filled withzirconia beads having an average diameter of 0.5 mm, and dispersedtherein for 5 hours. Then, 0.2 g of benzothiazolinone sodium salt andwater were added thereto, so that the concentration of the organicpolyhalogen compound was adjusted to 30 mass %. The resulting dispersionwas warmed at 40° C. for 5 hours to obtain Organic polyhalogencompound-2 dispersion. The organic polyhalogen compound grains containedin the polyhalogen compound dispersion thus obtained had a mediandiameter of 0.40 μm and a maximum grain diameter of 1.3 μm or less. Theorganic polyhalogen compound dispersion obtained was filtered through afilter made of polypropylene, having a pore size of 3.0 μm, to removeforeign matters such as dusts, and stored.

7) Preparation of Silver Iodide Complex Forming Agent

8 Kg of modified polyvinyl alcohol MP203 was dissolved in 174.57 Kg ofwater. Then, 3.15 Kg of a 20 mass % aqueous solution of sodiumtriisopropyl naphthalene sulfonate and 14.28 Kg of a 70 mass % aqueoussolution of 6-isopropylphthalazine were added thereto to prepare a 5mass % solution of a silver iodide complex forming agent compound.

8) Preparation of Mercapto Compound

(Preparation of Mercapto Compound)

(Preparation of Mercapto Compound-1 Aqueous Solution)

7 g of Mercapto compound-1 (1-(3-sulfophenyl)-5-mercaptotetrazole sodiumsalt) was dissolved in 993 g of water, resulting in a 0.7 mass % aqueoussolution.

(Preparation of Mercapto Compound-2 Aqueous Solution)

20 g of Mercapto compound-2(1-(3-methylureidephenyl)-5-mercaptotetrazole) was dissolved in 980 g ofwater, resulting in a 2.0 mass % aqueous solution.

9-1) Preparation of SBR Latex Liquid

SBR latex (TP-1) was prepared as described below.

287 g of distilled water, 7.73 g of a surfactant (Pionin A-43-S(manufactured by Takemoto Yushi Co.): solid content, 48.5 mass %), 14.06ml of 1 mol/L NaOH, 0.15 g of tetrasodium ethylenediamine tetraacetate,255 g of styrene, 11.25 g of acrylic acid and 3.0 g oftert-dodecylmercaptane were charged in a polymerization vessel of a gasmonomer reaction device (model TAS-2J, manufactured by Taiatsu GlassIndustry Co.), the reaction vessel was tightly closed and they werestirred at a stirring speed of 200 rpm. After evacuating by a vacuumpump and repeating nitrogen gas substitution for several times, 108.75 gof 1,3-butadiene was charged under pressure and the temperature waselevated to an internal temperature of 60° C. A solution containing1.875 g of ammonium persulfate dissolved in 50 ml of water was added andstirred for 5 hours as it was. Further, stirring was conducted for threehours under temperature elevation to 90° C., and after lowering theinternal temperature to a room temperature after the completion of thereaction, pH was adjusted to 8.4 by using LiOH at 1 mol/L. Then, thefiltration was carry out by a polypropylene filter with a pore size of1.0 μm to remove obstacles such as dusts and stored to obtain 774.7 g ofan SBR latex. When halogen ions were measured by ion chromatography,chloride concentration was 3 ppm. As a result of measuring theconcentration of the chelating agent by high speed liquidchromatography, it was 145 ppm.

The latex had an average particle size of 90 nm, Tg=17° C., a solidconcentration of 44 mass %, an equilibrium water content of 0.6 mass %at 25° C. and 60% RH, and an ionic conductivity of 4.80 mS/cm (ionicconductivity was measured by using a conductivity meter CM-30Smanufactured by Toa Denpa Industry Co. for the stock latex solution (44mass %) at 25° C.).

9-2) Preparation of Isoprene Latex Liquid

Isoprene latex (TP-2) was prepared as described below.

1500 g of distilled water was added to a polymerization vessel of a gasmonomer reaction device (model TAS-2J, manufactured by Taiatsu GlassIndustry Co.) and heated at 90° C. for 3 hours to form passivaterd filmson the stainless surface of the polymerization vessel or members of astirring device made of stainless steel. To the thus treatedpolymerization vessel, 582.28 g of distilled water bubbled with anitrogen gas for one hour, 9.49 g of a surfactant (Pionin A-43-S,manufactured by Takemoto Yushi Co.), 19.5 g of NaOH of 1 mol/L, 0.20 gof tetrasodium ethylenediamine tetraacetate, 314.99 g of styrene, 190.87g of isoprene, 10.43 g of acrylic acid, and 2.09 g of tert-dodecylmercaptane were charged, the reaction vessel was tightly closed and theywere stirred at a stirring speed of 225 rpm and the internal temperaturewas elevated to 65° C. A solution containing 2.61 g of ammoniumpersulfate dissolved in 40 ml of water was added and stirred for 6 hoursas it was. The polymerization conversion ratio at this time was 90%based on the measurement for solid content. Then, a solution containing5.22 g of acrylic acid dissolved in 46.98 g of water was added and,successively, 10 g of water was added and a solution containing 1.30 gof ammonium persulfate dissolved in 50.7 ml of water was further added.After addition, temperature was elevated to 90° C., and they werestirred for 3 hours. After completion of the reaction and lowering theinternal temperature to the room temperature, pH was adjusted to 8.4 byusing 1 mol/L LiOH. Then, they were filtered by a filter made ofpolypropylene having 1.0 μm pore size removed with obstacles such asdusts and stored, to obtain 1248 g of isoprene latex TP-1. When halogenions were measured by ion chromatography, the chloride ion concentrationwas 3 ppm. As a result of measuring the concentration of chelating agentby high speed liquid chromatography, it was 142 ppm.

The latex had an average particle size of 113 nm, Tg=15° C., a solidconcentration of 41.3 mass %, an equilibrium water content at 25° C. and60% RH of 0.4 mass %, and an ionic conductivity of 5.23 mS/cm (ionicconductivity was measured by using a conductivity meter CM-30Smanufactured by To a Denpa Industry Co).

10) Preparation of Nucleating Agent Dispersion

2.5 g of polyvinyl alcohol (PVA-217 manufactured by Kuraray) and 87.5 gof water were added to 10 g of a compound No. SH-7 as the nucleatingagent and stirred thoroughly to form a slurry which was left for 3hours. Then, 240 g of 0.5 mm zirconia beads were charged in a vesseltogether with the slurry, and dispersed for 10 hours by a dispersingmachine (1/4 G sand grinder mill: manufactured by Imex Co.), to preparea fine solid particle dispersion of the nucleating agent. 80 mass % ofthe particles had grain size of 0.1 μm to 1.0 μm, and the average grainsize was 0.5 μm.

1-3-2 Preparation of Coating Solution

1) Preparation of Emulsion Layer (Light Sensitive Layer) CoatingSolution-1

To 1,000 g of the fatty acid silver salt dispersion obtained asdescribed above and 276 ml of water, were added organic polyhalogencompound-1 dispersion, organic polyhalogen compound-2 dispersion, SBRlatex (TP-1) solution, isoprene latex (TP-2) solution, reducing agent-1dispersion, nucleating agent dispersion, hydrogen bonding compound-1dispersion, development promotor-1 dispersion, development promoter-2dispersion, color toning agent-1 dispersion, aqueous mercapto compound-1solution, and aqueous mercapto compound-2 solution, successively, and,after adding the silver iodide complex forming agent, the silver halideemulsion mixture for silver halide coating solution was added justbefore coating by 0.22 mol as the amount of silver per 1 mol of a silversalt of a fatty acid, thoroughly mixed and fed as it was to a coatingdye and coated.

The viscosity of the emulsion layer coating solution was determined bymeans of a B-model viscometer from Tokyo Instrument Co., Ltd., and wasfound to be 25 [mPa·s] at 40° C. (No. 1 rotor, 60 rpm).

The viscosities of the coating solution at 25° C. determined by means ofa RFS fluid spectrometer produced by Rheometrics Far East Co., Ltd.,were 242, 65, 48, 26, and 20 [mPa·s] at shear rates of 0.1, 1, 10, 100,and 1000 [1/sec], respectively.

The amount of zirconium in the coating solution was 0.38 mg per gram ofsilver.

2) Preparation of Emulsion-Side Intermediate Layer Coating Solution

To 1000 g of polyvinyl alcohol PVA-205 (manufactured by Kuraray Co.,Ltd.), 4200 ml of a 19 mass % solution of methylmethacrylate/styrene/butyl acrylate/hydroxyethyl methacrylate/acrylicacid copolymer (copolymerization weight ratio 64/9/20/5/2) latex, 27 mlof a 5 mass % aqueous solution of Aerosol OT (manufactured by AmericanCyanamide Co.) and 135 ml of a 20% mass % aqueous solution of diammoniumphthalate, water was added to make the total amount 10000 g. The mixturewas adjusted to pH 7.5 with NaOH, resulting in an intermediate layercoating solution. The solution was fed to a coating die so as to achieve9.1 ml/m².

The viscosity of the coating solution was determined by means of aB-model viscometer, and found to be 58 [mPa·s] at 40° C. (No. 1 rotor,60 rpm).

3) Preparation of Emulsion-Side Protective-Layer First Layer CoatingSolution

64 g of inert gelatin was dissolved in water. To the resulting solution,112 g of a 19.0 mass % solution of methyl methacrylate/styrene/butylacrylate/hydroxyethyl methacrylate/acrylic acid copolymer(copolymerization weight ratio 64/9/20/5/2) latex, 30 ml of a 15 mass %methanol solution of phthalic acid, 23 ml of a 10 mass % aqueoussolution of 4-methylphthalic acid, 28 ml of sulfuric acid with aconcentration of 0.5 ml/L, 5 ml of a 5 mass % aqueous solution ofAerosol OT (manufactured by American Cyanamide Co.), 0.5 g of phenoxyethanol, and 0.1 g of benzisothiazolinone were added. To the mixture,water was added to make the total amount 750 g, resulting in a coatingsolution. 26 ml of 4 mass % chrome alum was mixed therein by a staticmixer immediately before coating. The resulting mixture was fed to acoating die so as to achieve 18.6 ml/m².

The viscosity of the coating solution was determined by means of aB-model viscometer, and found to be 20 [mPa·s] at 40° C. (No. 1 rotor,60 rpm).

4) Preparation of Emulsion-Side Protective-Layer Second Layer CoatingSolution

80 g of inert gelatin was dissolved in water. To the resulting solution,102 g of a 27.5 mass % solution of methyl methacrylate/styrene/butylacrylate/hydroxyethyl methacrylate acrylic acid copolymer(copolymerization weight ratio 64/9/20/5/2) latex, 5.4 ml of a 2 mass %solution of fluorine-containing surfactant (F-1), 5.4 ml of a 2 mass %aqueous solution of fluorine-containing surfactant (F-2), 23 ml of a 5mass % solution of Aerosol OT (manufactured by American Cyanamide Co.),4 g of polymethyl methacrylate fine particles (average particle diameter0.7 μm, and body weighted mean distribution 30%), 21 g of polymethylmethacrylate fine particles (average particle diameter 4.5 μm, and bodyweighted mean distribution 60%), 1.6 g of 4-methylphthalic acid, 4.8 gof phthalic acid, 44 ml of sulfuric acid with a concentration of 0.5mol/L, and 10 mg of benzisothiazolinone were added. To the mixture,water was added to make the total amount 650 g. 445 ml of an aqueoussolution containing 4 mass % chrome alum and 0.67 mass % phthalic acidwere mixed therein by a static mixer immediately before coating,resulting in a surface protective layer coating solution. The solutionwas fed to a coating die so as to achieve 8.3 ml/m².

The viscosity of the coating solution was determined by means of aB-model viscometer, and found to be 19 [mPa·s] at 40° C. (No. 1 rotor,60 rpm).

1-4 Preparation of Photothermographic Material-1

An image forming layer, an intermediate layer, a first surfaceprotective layer, and a second surface protective layer were coated inthis order from the undercoat surface by simultaneous stack coating by aslide bead coating method to prepare specimens 1 to 7 for thephotothermographic material. The temperature was controlled to 31° C.for the image forming layer and the intermediate layer, to 36° C. forthe first surface protective layer and to 37° C. for the second surfaceprotective layer.

The coating amount of silver as the total of the silver fatty acid saltand the silver halide was 0.821 g/m² per one surface and 1.72 g/m² forboth surfaces in total in the image forming layer.

The coating amount (g/m²) for each of the compounds in the image forminglayer per one surface is as described below.

Silver fatty acid salt (as silver) 0.686 Polyhalogen compound-1 0.028Polyhalogen compound-2 0.094 Silver iodide complex forming agent 0.46SBR latex 5.20 SBR latex (TP-1) 2.09 Isoprene latex (TP-2) 3.13 Reducingagent-1 0.46 Nucleating agent 0.036 Hydrogen bonding compound-1 0.15Development promoter-1 0.005 Development promoter-2 0.035 Color toningagent-1 0.002 Mercapto compound-1 0.001 Mercapto compound-2 0.003 Silverhalide (as Ag) 0.175

The coating and drying conditions were as follows.

Electrostatic charges were eliminated from the support by ionic airbefore coating, and the coating was carried out at a speed of 160 m/min.The coating and drying conditions were controlled within the followingranges for each sample, and set to be the conditions capable ofproviding the most stable surface conditions.

The clearance between the tip of the coating die and the support was setat 0.10 to 0.30 mm;

The pressure in a reduced pressure chamber was set at a pressure lowerthan atmospheric pressure by 196 to 882 Pa;

In a subsequent chilling zone, the coating solutions were cooled by airhaving a dry-bulb temperature of 10 to 20° C.;

Through non-contact type transfer, the sample was dried by dry airhaving a dry-bulb temperature of 23 to 45° C., and a wet-bulbtemperature of 15 to 21° C. in a helical non-contact type dryingapparatus;

After drying, the sample was subjected to moisture conditioning at 25°C. and humidify 40% to 60% RH; and

Subsequently, the sample was heated so that the temperature of the filmsurface was elevated to 70 to 90° C. After heating, the film surface wascooled to 25° C.

The prepared photothermographic material showed matting degrees of 250seconds, in terms of Bekk smoothness. Whereas, the pH of the filmsurface on the light-sensitive layer surface side was determined, andfound to be 6.0.

Below, the chemical structures of the compounds used in this examplewill be shown.

Compound 1 capable of being one-electron oxidized to become aone-electron oxidation product, and releasing one or more electrons:

Compound 2 capable of being one-electron oxidized to become aone-electron oxidation product, and releasing one or more electrons:

Compound 3 capable of being one-electron oxidized to become aone-electron oxidation product, and releasing one or more electrons:

Compound 1 having an adsorbing group and a reducing group

Compound 2 having an adsorbing group and a reducing group

Compound 3 having an adsorbing group and a reducing group

(Evaluation of Photographic Performances)

Each sample obtained was cut into a half size, and each cut sample waspackaged in the following packaging material under the environment of25° C. and 50% RH, and stored at ordinary temperatures for 2 weeks.Then, the following evaluations were carried out.

(Packaging Material)

PET 10μ/PE 12μ/aluminum foil 9μ/Ny 15μ/3 mass % carbon-containingpolyethylene 50μ, Oxygen permeability: 0.02 ml/atm·m²·25° C.·day,Moisture permeability: 0.10 g/atm·m²·25° C.·day.

The thus prepared double-sided coated light sensitive materials wereevaluated as described below.

Two sheets of fluorescence intensifying screen A were used and aspecimen was put therebetween to prepare an image forming assembly. Theassembly was put to X-ray exposure for 0.05 sec and X-ray sensitometrywas carried out. The X-ray apparatus used was DRX-3724HD; trade name ofproducts manufactured by Toshiba Co., in which a tungsten target wasused. X-rays obtained by applying a voltage at 80 kVp to three phases bya pulse generator and passing through a 7 cm water filter havingabsorption substantially equivalent with a human body were used as alight source. The X-ray exposure amount was changed by a distance methodand stepwise exposure was carried out at a notch of logE=0.15. Afterexposure, heat development was carried out under the following heatdevelopment conditions. The obtained images were evaluated by adensitometer.

1. Preparation of Fluorescence Intensifying Screen A

(1) Preparation of Undercoat Layer

A light reflection layer made of an alumina powder having a filmthickness of 50 μm after dying was formed on a 250 μm polyethyleneterephthalate (support) in the same manner as in Example 2 of JP-A No.2001-0124898, and.

(2) Preparation of Fluorescent Material Sheet

250 g of BaFBr:Eu fluorescent material (average grain size 3.5 μm), 8 gof a polyurethane binder resin (trade name: Pandex T 5265M, manufacturedby Dai Nippon Ink Chemical Industry), 2 g of an epoxy binder resin(trade name: Epicoat 1001, manufactured by Yuka Shell Epoxy Co.) and 0.5g of an isocyanate compound (trade name: Colonate HX, manufactured byNippon Polyurethane Industry) were added to methyl ethyl ketone, whichwere dispersed by a propeller mixer to prepare a coating solution forforming a fluorescent material layer having a viscosity of 25 PS (at 25°C.). The coating solution was coated on a surface of a provisionalsupport (a polyethylene terephthalate sheet previously coated with asilicone releasing agent) and dried to form a fluorescent materiallayer. The fluorescent material layer was peeled off from theprovisional support to obtain a fluorescent material sheet.

(3) Provision of Fluorescent Material Sheet on Light Reflection Layer

The fluorescent material described above was overlaid on the surface ofthe light reflection layer of a support with a light reflection layermanufactured in the step 1) described above, which was pressed by acalendar roll under a pressure of 400 kgw/cm² at a temperature of 80°C., to form a fluorescent material layer on the light reflection layer.The thickness of the fluorescent material layer was 125 μm and thevolume filling ratio of the fluorescent particles in the fluorescentmaterial layer was 68%.

(4) Formation of Surface Protective Layer

A polyester adhesive was coated on one surface of a polyethyleneterephthalate (PET) having a thickness of 6 μm, and a surface protectivelayer was formed on the fluorescent material layer by a laminationmethod. Thus, a fluorescence intensifying screen A comprising thesupport, the light reflection layer, the fluorescent material layer andthe surface protection layer was obtained.

(5) Light Emitting Characteristics

FIG. 7 shows emission spectra of the intensifying screen A measured byX-rays at 40 kVp. The fluorescent intensifying screen A showed emissionof narrow half-value width with a peak at 390 nm.

On the other hand, a regular light-sensitive material RX-U of a wetdevelopment system manufactured by Fuji Photo Co., Ltd., was exposed byuse of two sheets of X-ray regular screen HI-SCREEN B3 (light-emissionpeak wavelength: 425 nm; CaWO₄ being used as a phosphor) (manufacturedby Fuji Photo Film Co., Ltd.) under the same conditions, and subjectedto the processing for 45 seconds in a processing solution CE-D1 by meansof an automatic development processing apparatus CEPROS-M2 manufacturedby Fuji Photo Co., Ltd.

The photographic characteristics of the images obtained with thephotothermographic materials of this embodiment and the images obtainedwith the wet development system were compared with each other. As aresult, both the images exhibited the same favorable performances.

This application is based on Japanese Patent application JP 2003-310406,filed Sep. 2, 2003, and Japanese Patent application JP 2004-196853,filed Jul. 2, 2004, the entire contents of which are hereby incorporatedby reference, the same as if set forth at length.

1. A heat development apparatus for heat developing a heat-developablerecording material from one surface side by a heating unit, whiletransporting the heat-developable recording material by a transportationunit, the apparatus comprising: an inversion processing mechanism forinverting the heat-developable recording material discharged from aheating region in which the heat developing is made by the heating unit,and returning it to the heating region; and a transportation routeswitching unit for selectively switching a route of the heat-developablerecording material discharged from the heating region to a side of theinversion processing mechanism or a discharge-side transportation route.2. The heat development apparatus according to claim 1, wherein theinversion processing mechanism includes a heat insulation unit forpreventing a temperature lowering of the heat-developable recordingmaterial.
 3. The heat development apparatus according to claim 1,wherein a recording paper accommodating case in which theheat-developable recording material before a heat development processingis accommodated is utilized as a temporary storage part for allowing,the heat-developable recording material to be inverted, to waittemporarily.
 4. The heat development apparatus according to claim 1,wherein the transportation unit is configured to be speed-adjustable. 5.A heat development method for heat developing a heat-developablerecording material containing recording layers on its opposite sides,using the heat development apparatus according to claim 1, the methodcomprising: heat developing the heat-developable recording material onits one side by the heating unit; inverting the heat-developablerecording material heat developed on its one side with the inversionprocessing mechanism; returning the inverted heat-developable recordingmaterial to the heating region; and heat developing the returnedheat-developable recording material on its other side, and dischargingit, by operations of the heating unit and the transportation unit. 6.The heat development method according to claim 5, wherein time requiredin the inversion processing mechanism is set such that the inverting bythe inversion processing mechanism and a heat developing on anotherheat-developable recording material by the heating unit and thetransportation unit are carried out concurrently.
 7. The heatdevelopment method according to claim 5, wherein the heat developing ofthe other side of the heat-developable recording material, to which theheat developing on its one side is made, is carried out by increasingtransportation speed by the transportation unit higher than with theheat developing of the one side, or reducing a heating amount by theheating unit smaller than with the heat developing of the one side.